초록 ▼

A method and apparatus for preventing particles from dislodging from the interior of a process chamber by preventing DC bias spikes. Such DC bias spikes can be caused by variations in the power or pressure in a process chamber. DC bias spikes are prevented by ramping changes in the pressure at a rat

A method and apparatus for preventing particles from dislodging from the interior of a process chamber by preventing DC bias spikes. Such DC bias spikes can be caused by variations in the power or pressure in a process chamber. DC bias spikes are prevented by ramping changes in the pressure at a rate which avoids the creation of such spikes. RF power is ramped down at a rate which avoids spikes.

대표청구항 ▼

[ What is claimed is:] [1.] A method for preventing contamination of a substrate by particles in a substrate processing chamber, the method comprising:introducing said substrate into said chamber;flowing processing gases into said chamber;applying an RF field to the chamber to form a plasma; andredu

[ What is claimed is:] [1.] A method for preventing contamination of a substrate by particles in a substrate processing chamber, the method comprising:introducing said substrate into said chamber;flowing processing gases into said chamber;applying an RF field to the chamber to form a plasma; andreducing the power of the RF field applied to said chamber at a first selected ramping rate while ramping the pressure in said chamber to a desired value at a second selected ramping rate slow enough to avoid a direct-current ("DC") bias spike.