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Apparatus and method for comparing and aligning two digital representations of an image 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06K-009/00
출원번호 US-0701485 (1996-08-22)
우선권정보 IL-0102659 (1992-07-27)
발명자 / 주소
  • Yolles Joel,ILX
  • Aloni Meir,ILX
  • Eran Yair,ILX
  • Kaplan Haim,ILX
출원인 / 주소
  • Orbot Instruments Ltd., ILX
대리인 / 주소
    Darby & Darby
인용정보 피인용 횟수 : 36  인용 특허 : 8

초록

A method for comparing first and second digital representations of an image, the method comprising the steps of: for each individual translation from among a plurality of translations from the first digital representation to the second digital representation: for each individual image location from

대표청구항

[ We claim:] [1.] A method for aligning first and second digital representations of an image, the method comprising, for each individual large location from among a plurality of relatively large locations covering the first digital representation:for each individual translation from among a pluralit

이 특허에 인용된 특허 (8)

  1. Specht Donald F. (Los Altos CA) Wihl Tim S. (San Jose CA) Young Scott A. (Scotts Valley CA) Hager ; Jr. James J. (San Jose CA) Lutzker Matthew B. (Menlo Park CA), Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-sys.
  2. Deering Michael F. (Mountain View CA), Bitplane area correlator.
  3. Deering Michael F. (Mountain View CA), Image correlation system.
  4. Yasuye Toshikazu (Hachiouji JPX) Kashioka Seiji (Hachiouji JPX) Shima Yoshihiro (Kokubunji JPX), Method and device for inspecting the defect of a pattern represented on an article.
  5. Nishio Masami (Kagawa JPX), Method of matching patterns and apparatus therefor.
  6. Maeda Kenichi (Yokohama JPX), Pattern recognition apparatus and method.
  7. Wihl Tim S. (San Jose CA) Wihl Mark J. (San Jose CA), Photomask inspection apparatus and method using corner comparator defect detection algorithm.
  8. Levy Kenneth (Saratoga CA) Buchholz Steve (San Jose CA) Broadbent William H. (Sunnyvale CA) Wihl Mark J. (San Jose CA), Photomask inspection apparatus and method with improved defect detection.

이 특허를 인용한 특허 (36)

  1. Monden, Akira, Abnormality detection system, abnormality detection method, and abnormality detection program storage medium.
  2. Duvdevani,Sharon; Gilat Bernshtein,Tally; Klingbell,Eyal; Mayo,Meir; Rippa,Shmuel; Smilansky,Zeev, Apparatus and methods for the inspection of objects.
  3. Duvdevani,Sharon; Gilat Bernshtein,Tally; Klingbell,Eyal; Mayo,Meir; Rippa,Shmuel; Smilansky,Zeev, Apparatus and methods for the inspection of objects.
  4. Furman, Dov; Neumann, Gad; Wagner, Mark; Dotan, Noam; Segal, Ram; Silberstein, Shai, Apparatus for determining optimum position of focus of an imaging system.
  5. Matsusita,Kouzou; Matsumura,Yukinori; Tanuki,Tomikazu; Terada,Mitsuo; Hori,Kotaro; Miyakawa,Kiyoharu; Nisi,Akira; Miwa,Hirobumi, Apparatus for inspecting wafer surface, method for inspecting wafer surface, apparatus for judging defective wafer, method for judging defective wafer, and apparatus for processing information on wafer surface.
  6. Gilat Bernshtein,Tally; Gutman,Zeev, Cam reference for inspection of contour images.
  7. Kyoji Yamashita JP, Defect inspection method and defect inspection apparatus.
  8. Yonezawa, Eiji, Defect inspection method and defect inspection apparatus.
  9. Furman, Dov; Neumann, Gad; Dotan, Noam, Fiber optical illumination system.
  10. Furman,Dov, Fiber optical illumination system.
  11. Furman,Dov; Neumann,Gad; Dotan,Noam, Fiber optical illumination system.
  12. Kondoh, Makio, Image reading device and shading correcting method for the same.
  13. Takarada, Shinichi, Image recognition method and image recognition apparatus.
  14. Furman, Dov; Kaner, Roy; Gonen, Ori; Mandelik, Daniel; Tal, Eran; Silberstein, Shai, Image splitting in optical inspection systems.
  15. Furman, Dov; Silberstein, Shai; Miklatzky, Effy; Mandelik, Daniel; Abraham, Martin, Image splitting in optical inspection systems.
  16. Obara, Eiki, Information processing apparatus and image processing method.
  17. Sali, Erez; Yanir, Tomer; Wagner, Mark; Dotan, Noam; Dorfan, Yuval; Zaslavsky, Ran, Method and apparatus for detecting defects in wafers.
  18. Dorphan, Yuval; Zaslavsky, Ran; Wagner, Mark; Furman, Dov; Silberstein, Shai, Method and apparatus for detecting defects in wafers including alignment of the wafer images so as to induce the same smear in all images.
  19. Weiss,Adam; Saranli,Afsar, Method and apparatus for flat patterned media inspection.
  20. Weiss,Adam; Saranli,Afsar; Lopatin,Oleksiy; Obotnine,Alexandre, Method and apparatus for high-throughput inspection of large flat patterned media using dynamically programmable optical spatial filtering.
  21. Weiss,Adam; Saranli,Afsar; Lopatin,Oleksiy; Obotnine,Alexandre, Method and apparatus for high-throughput inspection of large flat patterned media using dynamically programmable optical spatial filtering.
  22. Ben-Yishay, Michael; Gvirtzer, Ophir, Method and system for defect detection.
  23. Tobin, Jr., Kenneth W.; Karnowski, Thomas P.; Ferrell, Regina K., Method for localizing and isolating an errant process step.
  24. Furman,Dov; Dotan,Noam; Miklatzky,Efraim, Multi mode inspection method and apparatus.
  25. Isomura, Ikunao, Photomask inspection apparatus comparing optical proximity correction patterns to minimum and maximum limits.
  26. Fuchs, Dan T.; Silberstein, Shai, Printed fourier filtering in optical inspection tools.
  27. Breeuwer,Marcel, Reliability measure concerning the registration of cardiac MR perfusion measurements.
  28. Lane, Fred P.; Chang, Hoyoung, Solution and methodology for detecting surface damage on capacitive sensor integrated circuit.
  29. Chen, Wayne; Zeng, Andrew; Akbulut, Mustafa, System and methods for classifying anomalies of sample surfaces.
  30. Chen,Wayne; Zeng,Andrew; Akbulut,Mustafa, System and methods for classifying anomalies of sample surfaces.
  31. Chen,Wayne; Zeng,Andrew; Akbulut,Mustafa, System and methods for classifying anomalies of sample surfaces.
  32. Chen,Wayne; Zeng,Andrew; Akbulut,Mustafa, System and methods for classifying anomalies of sample surfaces.
  33. Furman, Dov; Neumann, Gad; Wagner, Mark; Dotan, Noam; Segal, Ram; Silberstein, Shai, System for detection of wafer defects.
  34. Furman,Dov; Neumann,Gad; Wagner,Mark; Dotan,Noam; Segal,Ram; Silberstein,Shai, System for detection of wafer defects.
  35. Neumann,Gad; Dotan,Noam, System for detection of wafer defects.
  36. Furman, Dov; Neumann, Gad; Wagner, Mark; Dotan, Noam; Segal, Ram; Silberstein, Shai, System for detection of water defects.
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