초록 ▼

A (method using a composition) for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent. The chelating agent is preferred to be includ

A (method using a composition) for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

대표청구항 ▼

[ It is claimed:] [1.] A method of removing etching residue, residual photoresist, and photoresist byproducts from a substrate, the method comprising:contacting a substrate having resist or etching residue present thereon with a composition comprising:(a) from about 5 to about 50 percent by weight o

[ It is claimed:] [1.] A method of removing etching residue, residual photoresist, and photoresist byproducts from a substrate, the method comprising:contacting a substrate having resist or etching residue present thereon with a composition comprising:(a) from about 5 to about 50 percent by weight of at least one nucleophilic amine compound having oxidation and reduction potentials selected from the group consisting ofcompounds of formula I and salts thereof, [ STR 8 ] wherein R.sub.1, R.sub.2, and R.sub.3 are independently hydrogen; a hydroxyl group; a substituted C.sub.1 -C.sub.6 straight, branched or cyclo alkyl, alkenyl, or alkynyl group, a substituted acyl group, straight or branched alkoxy group, amidyl group, carboxyl group, alkoxyalkyl group, alkylamino group, alkylsulfonyl group, or sulfonic acid group, or salts or derivatives thereof, wherein at least one of R.sub.1, R.sub.2, and R.sub.3 is selected from the group consisting of a hydroxyl group; substituted C.sub.1 -C.sub.6 straight, branched, and cyclo alkyl, alkenyl, and alkynyl groups, substituted acyl groups, straight and branched alkoxy groups, amidyl groups, carboxyl groups, alkoxyalkyl groups, alkylamino groups, alkylsulfonyl groups, sulfonic acid groups, and salts and derivatives thereof; andcompounds of formula II and salts thereof, [ STR 9 ] wherein R.sub.7, R.sub.8, R.sub.9, and R.sub.10 are independently hydrogen; a hydroxyl group; a substituted C.sub.1 -C.sub.6 straight, branched or cyclo alkyl, alkenyl, or alkynyl group; a substituted acyl group, straight or branched alkoxy group, amidyl group, carboxyl group, alkoxyalkyl group, alkylamino group, alkylsulfonyl group, or sulfonic acid group, wherein at least one of R.sub.7, R.sub.8, R.sub.9, and R.sub.10 is selected from the group consisting of a hydroxyl group; substituted C.sub.1 -C.sub.6 straight, branched, and cyclo alkyl, alkenyl, and alknyl group; substituted acyl groups, straight and branched alkoxy groups, amidyl groups, carboxyl groups, alkoxyalkyl groups, alkylamino groups, alkylsulfonyl groups, sulfonic acid groups, and salts and derivatives thereof;(b) from about 10 to about 80 percent by weight of at least one alkanolamine which is miscible with the at least one nucleophilic amine compound;(c) an effective amount of up to about 30 percent by weight of at least one compound selected from the group consisting of a compound of formula III, [ STR 10 ] wherein R.sub.15 and R.sub.16 can be either H, t-butyl, OH, or COOH, a compound of formula IV, [ STR 11 ] where R.sub.17 is OH or COOH, and an ethylene diamine tetracarboxylic acid of formula V, [ STR 12 ] where R.sub.18, R.sub.19, R.sub.20 and R.sub.21 can be either H or NH.sub.4, and an ammonium salt thereof; and(d) a balance of water, at a temperature and for a time sufficient to remove resist or etching residue from the substrate.