초록 ▼

Various embodiments of a power supply are disclosed for generating plasmas. Current controlled power sources are disclosed that are capable of generating currents in low resistance, high temperature plasmas that are regulated to prevent the generation of excessive currents in the plasma. Current rev

Various embodiments of a power supply are disclosed for generating plasmas. Current controlled power sources are disclosed that are capable of generating currents in low resistance, high temperature plasmas that are regulated to prevent the generation of excessive currents in the plasma. Current reversing switches are provided that control the flow of a direct current in a plasma chamber between various electrodes. A single current controlled power source capable of providing a substantially constant direct current can be utilized with various switch configurations to provide current that is delivered through three or more electrodes in a plasma chamber. Multiple power sources are also provided in association with shunt switches for delivering a plurality of sources of direct current in various directions between electrodes in a plasma chamber. In another embodiment of the present invention, inductive impedance can be provided in switch paths to cause a source of direct current to flow through a plasma chamber in various directions between electrodes. The use of multiple electrodes in association with a single voltage controlled power source is also disclosed.

대표청구항 ▼

[ What is claimed is:] [1.] A power supply for generating a pulsed direct current having alternating polarities to be applied to a plasma chamber to generate plasmas comprising:a power source that generates a substantially constant supply of said direct current;current connections for delivering sai

[ What is claimed is:] [1.] A power supply for generating a pulsed direct current having alternating polarities to be applied to a plasma chamber to generate plasmas comprising:a power source that generates a substantially constant supply of said direct current;current connections for delivering said pulsed direct current to said plasma chamber;current reversing switches having at least two predetermined positions, said current reversing switches coupled to said power source and said current connections that cause said substantially constant supply of said direct current to flow in a first direction through said current connections whenever said current reversing switches are set in a first predetermined position, and in a second direction through said current connections whenever said current reversing switches are set in a second predetermined position;wherein said current reversing switches comprise a first pair of switches connected in series across said power source and connected to a first current connection at a point where said first pair of switches are connected in series, and a second pair of switches connected in series across said power source and connected to a second current connection at a point where said second pair of switches are connected in series; andat least one additional pair of switches connected in series across said power source and connected to an additional current connection at a point where said additional pair of switches are connected in series.