초록 ▼

Methods are provided to prepare photoresists without isolation of various components, i.e. in a "one-pot" procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from t

Methods are provided to prepare photoresists without isolation of various components, i.e. in a "one-pot" procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from the solvent, adding a photoactive component and any other desired photoresist materials to the resin binder in solution to thereby provide a liquid photoresist composition in the solvent in which the resin binder was prepared. The invention also provides novel methods for synthesizing resist resin binders, particularly phenolic polymers that contain phenolic OH groups covalently bonded to another moiety such as acid labile groups or inert blocking groups.

대표청구항 ▼

[ What is claimed is:] [1.] A method for preparation of a photoresist composition comprising:(a) preparing a photoresist resin binder in a selected photoresist solvent which comprises reacting a phenolic polymer with a compound that forms a covalent linkage to hydroxyl groups of the resin, and(b) wi

[ What is claimed is:] [1.] A method for preparation of a photoresist composition comprising:(a) preparing a photoresist resin binder in a selected photoresist solvent which comprises reacting a phenolic polymer with a compound that forms a covalent linkage to hydroxyl groups of the resin, and(b) without isolation of the resin binder from the solvent, adding a photoactive component to the resin binder to thereby provide the photoresist composition in the solvent. [26.] A method for preparation of a photoresist composition comprising:(a) preparing a photoresist resin binder in a selected photoresist solvent, the resin binder comprising a phenolic polymer with acid labile groups or a phenolic polymer with pendant inert blocking groups, and(b) without isolation of the resin binder from the solvent, adding a photoactive component to the resin binder to thereby provide the photoresist composition in the solvent. [27.] A method for preparation of a photoresist composition comprising:(a) preparing a photoresist resin binder in a photoresist solvent that comprises one or more solvents selected from the group consisting of a propionate, a glycol and a lactate, and(b) without isolation of the resin binder from the solvent, adding a photoactive component to the resin binder to thereby provide the photoresist composition in the solvent.