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Method of mitigating electrostatic charge during cleaning of electronic circuit boards 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-005/00
출원번호 US-0113027 (1998-07-13)
발명자 / 주소
  • Goenka Lakhi Nandlal
출원인 / 주소
  • Ford Motor Company
대리인 / 주소
    Hodges
인용정보 피인용 횟수 : 19  인용 특허 : 14

초록

A method is provided for cleaning an electronic circuit board having first and second opposing surfaces. The method includes directing a stream of carbon dioxide particles against the first surface. Steam is sprayed toward the first and second surfaces such that condensation of the steam caused by c

대표청구항

[ What is claimed is:] [1.] A method of cleaning an electronic circuit board having first and second opposing surfaces, comprising:a) directing a stream of carbon dioxide (CO.sub.2) particles against the first surface;b) spraying steam towards the first surface;c) condensing the steam by cooling sai

이 특허에 인용된 특허 (14)

  1. Blackwood Robert S. (Chanhassen MN), Apparatus for and method of cleaning and removing static charges from substrates.
  2. Shank ; Jr. James D. (Vestal NY), Blast nozzle for preventing the accumulation of static electric charge during blast cleaning operations.
  3. Goenka Lakhi Nandlal (Ann Arbor MI), CO2 cleaning nozzle and method with enhanced mixing zones.
  4. Goenka Lakhi N. (Ann Arbor MI), CO2 cleaning system and method.
  5. Goenka Lakhi N. (Ann Arbor MI), CO2 nozzle and method for cleaning pressure-sensitive surfaces.
  6. Gao Guilian (Novi MI) Goenka Lakhi N. (Ann Arbor MI), Carbon dioxide-based fluxing media for non-VOC, no-clean soldering.
  7. Krone-Schmidt Wilfried (Fullerton CA) Di Milia Edward S. (Gardena CA) Slattery Michael J. (Gardena CA), Electrostatic discharge control during jet spray.
  8. Tada Masuo (Yao JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Ice particle forming and blasting device.
  9. Jon Min-Chung (Princeton Junction NJ) Nicholl Hugh (Berthoud CO) Read Peter Hartpence (Morrisville PA), Method and apparatus for CO2 cleaning with mitigated ESD.
  10. Sneed John D. (Long Beach CA) Krone-Schmidt Wilfried (Fullerton CA) Slattery Michael J. (Gardena CA) Bowen Howard S. (Los Angeles CA), Method for cleaning surface by heating and a stream of snow.
  11. Yamashita Hiromi (Tokyo JPX) Wada Toshio (Tokyo JPX), Method of cleaning a photo-mask.
  12. Goenka Lakhi N. (Ann Arbor MI), Nozzle for enhanced mixing in CO2 cleaning system.
  13. Heyns Garrett J. (Boulder CO) McClure Terry R. (Kersey CO) Nicholl Hugh (Berthoud CO) Read Peter H. (Morrisville PA) Schulte Steven M. (Westminster CO) Tabrizi Mohammad F. (Westminster CO), Probemat cleaning system using CO2 pellets.
  14. Kneisel Lawrence L. (Novi MI) Baker Jay D. (Dearborn MI) Goenka Lakhi N. (Ann Arbor MI), Silicon micromachined CO2 cleaning nozzle and method.

이 특허를 인용한 특허 (19)

  1. Lewis, Paul E.; Ahmadi, Goodarz; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Apparatus for cleaning surfaces substantially free of contaminants.
  2. Mase, Keiji; Sakuma, Katsuyuki; Fujinori, Shigeru, Blasting method and apparatus having abrasive recovery system, processing method of thin-film solar cell panel, and thin-film solar cell panel processed by the method.
  3. Ben Kim, Cleaning with liquified gas and megasonics.
  4. Spalteholz,Bernhard Alexander; Nielsen,Geoffrey Paul, Dry ice blasting cleaning apparatus.
  5. D'Arcy H. Lorimer, Method and apparatus for cleaning flat workpieces.
  6. Jurgen Lohmuller DE, Method and apparatus for cleaning substrates.
  7. Yamamoto,Ryoichi, Method and apparatus for manufacturing liquid drop ejecting head.
  8. Unagami,Masaki, Method and assembly for static elimination of cleaning object in clearing apparatus.
  9. Said, Mohd Hanafi Mohd, Method and system for deflashing mold compound.
  10. Lorimer, D'Arcy Harold, Method of cleaning a wafer in an IC fabrication.
  11. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants.
  12. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
  13. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
  14. Boumerzoug, Mohamed; Tannous, Adel George; Makhamreh, Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  15. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  16. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  17. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  18. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  19. Banerjee, Souvik; Chung, Harlan Forrest, Vapor-assisted cryogenic cleaning.
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