초록 ▼

Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: [ STR 1 ] in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, meth

Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: [ STR 1 ] in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, methyl or halogen, R.sub.5 and R.sub.6 independently of one another are C.sub.1 -C.sub.6 alkyl, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 independently of one another are hydrogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or halogen, and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient ]EQU1 ] which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10.ltoreq.Q.ltoreq.0.50, are suitable as binders for DUV photoresists of high processing stability and flow resistance.

대표청구항 ▼

[ What is claimed is:] [1.] A radiation-sensitive composition comprising, based on the overall quantity of components A) and B),A) from 80 to 99.9% by weight of a polymer having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), co

[ What is claimed is:] [1.] A radiation-sensitive composition comprising, based on the overall quantity of components A) and B),A) from 80 to 99.9% by weight of a polymer having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: [ STR 6 ] in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, methyl or halogen; R.sub.5 and R.sub.6 independently of one another are C.sub.1 -C.sub.6 alkyl; R.sub.7, R.sub.8, R.sub.9 and R.sub.10 independently of one another are hydrogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or halogen; and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient [ STR 7 ] which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10.ltoreq.Q.ltoreq.0.50; andB) from 0.1 to 20% by weight of a substance which forms an acid under the action of actinic radiation. [14.] A radiation-sensitive composition according to claim 1, comprising as component B) a sulfonium trifluoromethane sulfonate, nitrobenzyl sulfonate, a disulfone or an .alpha.-(sulfonyloxy)-acetophenone derivative. A process for the production of positive images byI.) coating a substrate with a radiation-sensitive composition according to claim 1,II.) exposing the coated substrate to actinic radiation in a predetermined pattern, andIII.) developing the exposed substrate with a developer for positive-working photoresists. A printing plate, printed circuit or integrated circuit according to the process of claim 15.