$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Method for fabricating with ultrasonic vibration a carbon coating 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/06
  • C23C-016/26
  • B06B-001/00
출원번호 US-0909573 (1997-08-13)
우선권정보 JP-0119632 (1994-05-09)
발명자 / 주소
  • Yamazaki Shunpei,JPX
  • Itoh Kenji,JPX
  • Hayashi Shigenori,JPX
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd., JPX
대리인 / 주소
    Sixbey, Friedman, Leedom & Ferguson, PCRobinson
인용정보 피인용 횟수 : 75  인용 특허 : 12

초록

In a process for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequenc

대표청구항

[ What is claimed is:] [1.] A method for fabricating a carbon coating or a coating mainly containing carbon comprising the steps of:forming the carbon coating or the coating mainly containing carbon on a substrate by using plasma while said substrate is ultrasonic-vibrated,wherein said carbon coatin

이 특허에 인용된 특허 (12)

  1. Kaneko Shiro (Kanagawa JPX) Takei Masao (Kanagawa JPX) Yasunaga Tadashi (Kanagawa JPX), Apparatus for manufacturing magnetic recording medium.
  2. Felts John T. (Alameda CA) Chatham ; III Hood (Fairfield CA) Countrywood Joseph (Napa CA) Nelson Robert J. (Walnut Creek CA), Apparatus for rapid plasma treatments and method.
  3. Yamazaki Shumpei (Tokyo JPX), Carbon deposition by ECR CVD using a catalytic gas.
  4. Koinuma Hideomi (Tokyo JPX) Kawasaki Masashi (Kanagawa JPX) Sumiya Masatomo (Tokyo JPX), Film formation apparatus and method for forming a film.
  5. Hey H. Peter W. (Phoenix AZ) Mazak William A. (Mesa AZ) Aggarwal Ravinder K. (Mesa AZ) Curtin John H. (Phoenix AZ), High throughput multi station processor for multiple single wafers.
  6. Mitani Tsutomu (Akashi) Nakaue Hirokazu (Higashiosaka) Kurokawa Hideo (Katano JPX), Method of and apparatus for synthesizing diamondlike thin film.
  7. Matsuyama Jinsho (Nagahama JPX), Microwave plasma CVD apparatus for the formation of a large-area functional deposited film.
  8. Cannella Vincent D. (Detroit MI) Izu Masatsugu (Birmingham MI) Hudgens Stephen J. (Southfield MI), Multiple chamber deposition and isolation system and method.
  9. Kurokawa Hideo (Katano JPX) Mitani Tsutomu (Akashi JPX) Nakaue Hirokazu (Higashiosaka JPX), Plasma CVD apparatus and method therefor.
  10. Yamada Yuichiro (Osaka JPX) Matusita Yosinari (Osaka JPX) Tutui Yuji (Osaka JPX), Plasma processing apparatus.
  11. Chen Lee (Poughkeepsie NY) Hendricks Charles J. (Wappingers Falls NY) Mathad Gangadhara S. (Poughkeepsie NY) Poloncic Stanley J. (Wappingers Falls NY), Single wafer plasma etch reactor.
  12. Louks John W. (North Hudson WI) Pochardt Donald L. (Hastings MN) Secor Robert B. (Stillwater MN) Warren Karl J. (Hudson WI), Ultrasonically assisted coating method.

이 특허를 인용한 특허 (75)

  1. Shunpei Yamazaki JP; Kenji Itoh JP; Shigenori Hayashi JP, Apparatus for fabricating coating and method of fabricating the coating.
  2. Yamazaki, Shunpei; Itoh, Kenji; Hayashi, Shigenori, Apparatus for fabricating coating and method of fabricating the coating.
  3. Yamazaki, Shunpei; Itoh, Kenji; Hayashi, Shigenori, Apparatus for fabricating coating and method of fabricating the coating.
  4. Gilmour, Steven B.; Harvey, Keith A., Biosensor and ultrasonic method of making a biosensor.
  5. Yamazaki, Shunpei; Ichijo, Mitsuhiro; Tanaka, Tetsuhiro; Ohtsuki, Takashi; Yasumoto, Seiji; Okazaki, Kenichi, Display device comprising an antioxidant film formed on a microcrystalline semiconductor film wherein the antioxidant film has a recessed portion overlapping a channel region.
  6. Lewis, Stuart Martin; Winter, Nicholas John, Electrothermal heater mat.
  7. Sasagawa, Shinya; Fujiki, Hiroshi; Furukawa, Shinobu; Miyairi, Hidekazu, Etching method using mixed gas and method for manufacturing semiconductor device.
  8. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S.; Thomas, Kurt, Faucet.
  9. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S., Faucet component with coating.
  10. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S., Faucet component with coating.
  11. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S., Faucet component with coating.
  12. Brondum, Klaus, Faucet with wear-resistant valve component.
  13. Yamazaki Shunpei,JPX ; Itoh Kenji,JPX ; Hayashi Shigenori,JPX, Hard carbon coating for magnetic recording medium.
  14. Tanaka,Koichiro; Yamamoto,Yoshiaki, Laser processing unit, laser processing method, and method for manufacturing semiconductor device.
  15. Yamazaki,Shunpei; Maruyama,Junya; Ogura,Keiichi; Takayama,Toru, Light emitting device and electronic equipment.
  16. Yamazaki, Shunpei; Suzuki, Yukie; Kuwabara, Hideaki, Light-emitting device.
  17. Yamazaki, Shunpei; Suzuki, Yukie; Kuwabara, Hideaki; Kimura, Hajime, Liquid crystal display device.
  18. Yamazaki, Shunpei; Suzuki, Yukie; Kuwabara, Hideaki; Kimura, Hajime, Liquid crystal display device.
  19. Yamazaki, Shunpei; Suzuki, Yukie; Kuwabara, Hideaki; Kimura, Hajime, Liquid crystal display device.
  20. Yamazaki, Shunpei; Suzuki, Yukie; Kuwabara, Hideaki; Kimura, Hajime, Liquid crystal display device.
  21. Yamazaki, Shunpei; Suzuki, Yukie; Kuwabara, Hideaki; Kimura, Hajime, Liquid crystal display device.
  22. Yamazaki, Shunpei; Suzuki, Yukie; Kuwabara, Hideaki; Kimura, Hajime, Liquid crystal display device.
  23. Yamazaki, Shunpei; Arai, Yasuyuki, Manufacturing method of display device.
  24. Yamazaki, Shunpei; Jinbo, Yasuhiro, Manufacturing method of thin film transistor by controlling generation of crystal nuclei of microcrystalline semiconductor film.
  25. Sasagawa, Shinya; Kurata, Motomu; Osada, Sho, Manufacturing method of thin film transistor having altered semiconductor layer.
  26. Lee, Wook-Seong; Baik, Young-Joon; Jeong, Jeung-Hyun; Chae, Ki-Woong, Method for DC plasma assisted chemical vapor deposition in the absence of a positive column.
  27. Toriumi, Satoshi, Method for forming crystalline semiconductor film, method for manufacturing thin film transistor, and method for manufacturing display device.
  28. Miyairi, Hidekazu; Jinbo, Yasuhiro; Nei, Kosei, Method for manufacturing display device.
  29. Tanaka, Tetsuhiro; Yokoi, Tomokazu; Dairiki, Koji, Method for manufacturing microcrystalline semiconductor film and method for manufacturing semiconductor device.
  30. Yamazaki, Shunpei; Suzuki, Yukie; Arai, Yasuyuki; Inoue, Takayuki; Kikuchi, Erumu, Method for manufacturing microcrystalline semiconductor film and thin film transistor.
  31. Jinbo, Yasuhiro; Miyairi, Hidekazu; Dairiki, Koji, Method for manufacturing microcrystalline semiconductor film, thin film transistor having microcrystalline semiconductor film, and photoelectric conversion device having microcrystalline semiconductor film.
  32. Ohnuma, Hideto; Hirose, Takashi, Method for manufacturing photoelectric conversion device.
  33. Yamazaki, Shunpei; Arai, Yasuyuki, Method for manufacturing photoelectric conversion device.
  34. Yamazaki, Shunpei, Method for manufacturing semiconductor device and display device.
  35. Takahashi, Erika; Kato, Takayuki; Miyairi, Hidekazu; Jinbo, Yasuhiro; Ichijo, Mitsuhiro; Yokoi, Tomokazu, Method for manufacturing thin film transistor.
  36. Yamazaki, Shunpei; Jinbo, Yasuhiro; Furuno, Makoto, Method for manufacturing thin film transistor and display device including the thin film transistor.
  37. Miyairi, Hidekazu; Dairiki, Koji; Egi, Yuji; Jinbo, Yasuhiro; Isa, Toshiyuki, Method for manufacturing thin film transistor having microcrystalline semiconductor film.
  38. Toriumi, Satoshi; Furukawa, Shinobu, Method for manufacturing transistor.
  39. Yamazaki Shunpei,JPX ; Itoh Kenji,JPX ; Hayashi Shigenori,JPX, Method of fabricating the coating.
  40. Savas, Stephen E.; Galewski, Carl; Wiesnoski, Allan B.; Mantripragada, Sai; Joh, Sooyun, Methods for plasma processing.
  41. Yamazaki, Shunpei; Jinbo, Yasuhiro, Microcrystalline semiconductor film, thin film transistor, and display device including thin film transistor.
  42. Savas, Stephen Edward; Galewski, Carl; Wiesnoski, Allan B.; Mantripragada, Sai; Joh, Sooyun, Plasma generating units for processing a substrate.
  43. Takeuchi, Hiroaki; Okuda, Tohru, Plasma processing method.
  44. Aota, Yukito; Kanai, Masahiro, Plasma processing method and apparatus.
  45. Aota, Yukito; Kanai, Masahiro, Plasma processing method and apparatus.
  46. Yamazaki,Shunpei; Arai,Yasuyuki; Watanabe,Yasuko, Plasma treatment apparatus and method for plasma treatment.
  47. Yamazaki,Shunpei; Arai,Yasuyuki; Watanabe,Yasuko, Plasma treatment apparatus and method for plasma treatment.
  48. Yamazaki,Shunpei; Arai,Yasuyuki; Watanabe,Yasuko, Plasma treatment apparatus and method for plasma treatment.
  49. Kubacki, Ronald M., Poled plasma deposition.
  50. Koulik,Pavel; Samsonov,Mikhail; Cherepanov,Alexander; Petrov,Evguenii, Process for plasma surface treatment and device for realizing the process.
  51. Miyairi, Hidekazu, Semiconductor device and manufacturing method thereof.
  52. Miyairi, Hidekazu, Semiconductor device and manufacturing method thereof.
  53. Dairiki, Koji; Miyairi, Hidekazu; Isa, Toshiyuki; Miyanaga, Akiharu; Hirohashi, Takuya; Yamazaki, Shunpei; Watabe, Takeyoshi, Thin film transistor.
  54. Egi, Yuji; Tanaka, Tetsuhiro; Isa, Toshiyuki; Miyairi, Hidekazu; Dairiki, Koji; Kurosawa, Yoichi; Suzuki, Kunihiko, Thin film transistor.
  55. Isa, Toshiyuki; Jinbo, Yasuhiro; Tezuka, Sachiaki; Dairiki, Koji; Miyairi, Hidekazu; Yamazaki, Shunpei; Hirohashi, Takuya, Thin film transistor.
  56. Miyairi, Hidekazu; Sasagawa, Shinya; Kurata, Motomu, Thin film transistor.
  57. Miyairi, Hidekazu; Watabe, Takeyoshi; Shimazu, Takashi, Thin film transistor.
  58. Miyairi, Hidekazu; Watabe, Takeyoshi; Shimazu, Takashi, Thin film transistor.
  59. Takahashi, Erika; Kato, Takayuki; Miyairi, Hidekazu; Jinbo, Yasuhiro, Thin film transistor.
  60. Sasagawa, Shinya; Ishizuka, Akihiro; Furukawa, Shinobu; Kurata, Motomu, Thin film transistor and manufacturing method thereof.
  61. Yamazaki, Shunpei; Egi, Yuji; Sasagawa, Shinya; Kurata, Motomu, Thin film transistor and manufacturing method thereof.
  62. Miyairi, Hidekazu; Dairiki, Koji; Egi, Yuji; Jinbo, Yasuhiro; Isa, Toshiyuki, Thin film transistor and method for manufacturing the same.
  63. Miyairi, Hidekazu; Kato, Erika; Suzuki, Kunihiko, Thin film transistor including silicon nitride layer and manufacturing method thereof.
  64. Miyairi, Hiekazu; Sasagawa, Shinya; Kurata, Motomu; Tadokoro, Asami, Thin film transistor with channel including microcrystalline and amorphous semiconductor regions.
  65. Yamazaki, Shunpei; Jinbo, Yasuhiro, Thin film transistor, and display device having the thin film transistor.
  66. Miyairi, Hidekazu; Jinbo, Yasuhiro; Godo, Hiromichi; Mizoguchi, Takafumi; Furukawa, Shinobu, Thin film transistor, display device, and electronic appliance.
  67. Isa, Toshiyuki; Jinbo, Yasuhiro; Tezuka, Sachiaki; Dairiki, Koji; Miyairi, Hidekazu; Yamazaki, Shunpei, Thin film transistor, semiconductor device and electronic device.
  68. Brondum, Klaus; Welty, Richard P.; Richmond, Douglas S.; Jonte, Patrick B.; Thomas, Kurt, Valve component for faucet.
  69. Brondum, Klaus; Welty, Richard P.; Richmond, Douglas S.; Jonte, Patrick B.; Thomas, Kurt, Valve component for faucet.
  70. Yamazaki, Shunpei; Izumi, Konami, Wireless chip.
  71. Yamazaki, Shunpei; Izumi, Konami, Wireless chip.
  72. Yamazaki, Shunpei; Izumi, Konami, Wireless chip.
  73. Yamazaki, Shunpei; Izumi, Konami, Wireless chip.
  74. Yamazaki, Shunpei; Izumi, Konami, Wireless chip.
  75. Yamazaki, Shunpei; Izumi, Konami, Wireless chip.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로