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In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical po

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-049/12
출원번호 US-0401229 (1995-03-09)
발명자 / 주소
  • Tang Wallace T. Y.
대리인 / 주소
    Foley & Lardner
인용정보 피인용 횟수 : 193  인용 특허 : 25

초록

A technique and apparatus is disclosed for the optical monitoring and measurement of a thin film (or small region on a surface) undergoing thickness and other changes while it is rotating. An optical signal is routed from the monitored area through the axis of rotation and decoupled from the monitor

대표청구항

[ I claim:] [7.] In a chemical mechanical polishing device for planarizing a film on a substrate comprising a polishing table, the improvement comprising(i) a bifurcated fiber-optic cable having a common leg and two bifurcated legs,(ii) a rotating fiber-optic cable with two ends,(iii) a light source

이 특허에 인용된 특허 (25)

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