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Vaporizer apparatus and film deposition apparatus therewith 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01F-003/04
출원번호 US-0861516 (1997-05-22)
우선권정보 JP-0151588 (1996-05-23)
발명자 / 주소
  • Horie Kuniaki,JPX
  • Suzuki Hidenao,JPX
  • Nakada Tsutomu,JPX
  • Kuriyama Fumio,JPX
  • Murakami Takeshi,JPX
  • Abe Masahito,JPX
  • Araki Yuji,JPX
출원인 / 주소
  • Ebara Corporation, JPX
대리인 / 주소
    Wenderoth, Lind & Ponack, L.L.P.
인용정보 피인용 횟수 : 127  인용 특허 : 2

초록

A vaporizer apparatus efficiently vaporizes difficult-to-vaporize materials such as complex feed materials for producing a high dielectric or ferroelectric material. The vaporizer apparatus includes a vaporizing passage formed by a pair of opposed walls separated by a minute spacing to a liquid feed

대표청구항

[ What is claimed is:] [1.] An apparatus for vaporizing a liquid feed material, said apparatus comprising:a pair of opposed walls separated by a minute spacing defining a vaporizing passage having first and second ends;a liquid feed material entrance at said first end of said vaporizing passage to i

이 특허에 인용된 특허 (2)

  1. Kirlin Peter S. (Brookfield) Binder Robin L. (Bethlehem) Gardiner Robin A. (Bethel CT), Method for delivering an involatile reagent in vapor form to a CVD reactor.
  2. Boer Hendrik J. (Lochem NLX), Method for transforming a liquid flow into a gas flow and a device for implementing the method.

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  67. McLaurin, Melvin; Raring, James W.; Sztein, Alexander; Hsu, Po Shan, Manufacturable laser diode formed on C-plane gallium and nitrogen material.
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