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Growth of bulk single crystals of aluminum nitride from a melt 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C30B-025/02
출원번호 US-0944393 (1997-10-06)
발명자 / 주소
  • Hunter Charles Eric
대리인 / 주소
    Faust
인용정보 피인용 횟수 : 43  인용 특허 : 13

초록

Large diameter single crystals of aluminum nitride (AlN) are grown isotropically by injecting a nitrogen-containing gas into liquid aluminum at elevated temperatures. A seed crystal that is maintained at a temperature below that of the surrounding liquid aluminum is pulled from the melt, while the A

대표청구항

[ That which is claimed is:] [1.] A method for producing a bulk single crystal of AlN comprising the steps of:contacting nitrogen with a melt of liquid Al to form AlN in the melt; whiledepositing the AlN so formed in single crystalline form on a seed crystal that is in physical contact with the melt

이 특허에 인용된 특허 (13)

  1. Jasinski Thomas J. (Medford MA) Witt August F. (Winchester MA), Apparatus for growing crystals.
  2. Rutz, Richard F., Epitaxial crystal fabrication of SiC:AlN.
  3. Hunter Charles Eric, Growth of bulk single crystals of aluminum nitride.
  4. Suzuki Akira (Nara JPX) Furukawa Katsuki (Sakai JPX) Shigeta Mitsuhiro (Joyo JPX) Fujii Yoshihisa (Nara JPX), Light emitting diode.
  5. Vodakov Jury A. (prospekt Engelsa ; 69/1 ; kv. 35 Leningrad SU) Mokhov Evgeny N. (prospekt Energetikov ; 54 ; korpus 2 ; kv. 59 Leningrad SU), Method for epitaxial production of semiconductor silicon carbide utilizing a close-space sublimation deposition techniqu.
  6. Iyechika Yasushi (Ibaraki JPX) Takada Tomoyuki (Ibaraki JPX), Method for manufacturing group III-V compound semiconductor crystals.
  7. Suzuki Akira (Nara JPX) Furukawa Katsuki (Sakai JPX) Shigeta Mitsuhiro (Tenri JPX), Method of fabricating single-crystal substrates of silicon carbide.
  8. Nii Keita (Kyoto JPX), Method of manufacturing a hetero-junction bi-polar transistor.
  9. Furukawa Katsuki (Sakai JPX) Tajima Yoshimitsu (Nara JPX) Suzuki Akira (Nara JPX), Method of producing silicon-carbide single crystals by sublimation recrystallization process using a seed crystal.
  10. Kim Sung C. (Boise ID) Yu Chris C. (Boise ID) Doan Trung T. (Boise ID), Process for depositing aluminum nitride (AlN) using nitrogen plasma sputtering.
  11. Rutz Richard F. (Cold Spring NY), Process for producing electronic grade aluminum nitride films utilizing the reduction of aluminum oxide.
  12. Rutz Richard F. (Cold Spring NY), Structure containing epitaxial crystals on a substrate.
  13. Davis Robert F. (Raleigh NC) Carter ; Jr. Calvin H. (Raleigh NC) Hunter Charles E. (Durham NC), Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide.

이 특허를 인용한 특허 (43)

  1. Schujman, Sandra B.; Rao, Shailaja P.; Bondokov, Robert T.; Morgan, Kenneth E.; Slack, Glen A.; Schowalter, Leo J., Aluminum nitride bulk crystals having high transparency to ultraviolet light and methods of forming them.
  2. Schujman, Sandra B.; Rao, Shailaja P.; Bondokov, Robert T.; Morgan, Kenneth E.; Slack, Glen A.; Schowalter, Leo J., Aluminum nitride bulk crystals having high transparency to untraviolet light and methods of forming them.
  3. Katou, Tomohisa; Nagai, Ichirou; Miura, Tomonori; Kamata, Hiroyuki, Apparatus for manufacturing aluminum nitride single crystal, method for manufacturing aluminum nitride single crystal, and aluminum nitride single crystal.
  4. Tischler, Michael A.; Kuech, Thomas F.; Vaudo, Robert P., Bulk single crystal gallium nitride and method of making same.
  5. Tischler, Michael A.; Kuech, Thomas F.; Vaudo, Robert P., Bulk single crystal gallium nitride and method of making same.
  6. Tischler, Michael A.; Kuech, Thomas F.; Vaudo, Robert P., Bulk single crystal gallium nitride and method of making same.
  7. Tischler,Michael A.; Kuech,Thomas F.; Vaudo,Robert P., Bulk single crystal gallium nitride and method of making same.
  8. Hunter Charles Eric, Bulk single crystals of aluminum nitride.
  9. Kimbel, Steven Lawrence; Meyer, Benjamin Michael; Zepeda, Salvador; Ferguson, Steven John, Crystal puller for inhibiting melt contamination.
  10. Slack, Glen A.; Schujman, Sandra B., Deep-eutectic melt growth of nitride crystals.
  11. Bondokov, Robert T.; Morgan, Kenneth E.; Schowalter, Leo J.; Slack, Glen A., Defect reduction in seeded aluminum nitride crystal growth.
  12. Bondokov, Robert T.; Morgan, Kenneth E.; Schowalter, Leo J.; Slack, Glen A., Defect reduction in seeded aluminum nitride crystal growth.
  13. Bondokov, Robert T.; Morgan, Kenneth E.; Schowalter, Leo J.; Stack, Glen A., Defect reduction in seeded aluminum nitride crystal growth.
  14. Bondokov, Robert T.; Morgan, Kenneth E.; Schowalter, Leo; Slack, Glen A., Defect reduction in seeded aluminum nitride crystal growth.
  15. Bondokov, Robert T.; Schowalter, Leo J.; Morgan, Kenneth; Slack, Glen A.; Rao, Shailaja P.; Gibb, Shawn Robert, Defect reduction in seeded aluminum nitride crystal growth.
  16. Slack, Glen A.; Schowalter, Leo J., Doped aluminum nitride crystals and methods of making them.
  17. Slack, Glen A.; Schowalter, Leo J., Doped aluminum nitride crystals and methods of making them.
  18. Slack, Glen A.; Schowalter, Leo J., Doped aluminum nitride crystals and methods of making them.
  19. Vaudo, Robert P.; Brandes, George R.; Tischler, Michael A.; Kelly, Michael K., Free-standing (Al, Ga, In)N and parting method for forming same.
  20. Bondokov, Robert T.; Rao, Shailaja P.; Gibb, Shawn R.; Schowalter, Leo J., Growth of large aluminum nitride single crystals with thermal-gradient control.
  21. Bondokov, Robert T.; Rao, Shailaja P.; Gibb, Shawn Robert; Schowalter, Leo J., Growth of large aluminum nitride single crystals with thermal-gradient control.
  22. Flynn, Jeffrey S.; Brandes, George R.; Vaudo, Robert P.; Keogh, David M.; Xu, Xueping; Landini, Barbara E., III-V nitride homoepitaxial material of improved quality formed on free-standing (Al,In,Ga)N substrates.
  23. Vaudo, Robert P.; Flynn, Jeffrey S.; Brandes, George R.; Redwing, Joan M.; Tischler, Michael A., III-V nitride substrate boule and method of making and using the same.
  24. Vaudo, Robert P.; Flynn, Jeffrey S.; Brandes, George R.; Redwing, Joan M.; Tischler, Michael A., III-V nitride substrate boule and method of making and using the same.
  25. Bondokov, Robert T.; Morgan, Kenneth; Slack, Glen A.; Schowalter, Leo J., Large aluminum nitride crystals with reduced defects and methods of making them.
  26. Bondokov, Robert; Morgan, Kenneth E.; Slack, Glen A.; Schowalter, Leo J., Large aluminum nitride crystals with reduced defects and methods of making them.
  27. Cuomo, Jerome J.; Williams, N. Mark; Hanser, Andrew David; Carlson, Eric Porter; Thomas, Darin Taze, MIIIN based materials and methods and apparatus for producing same.
  28. Cuomo, Jerome J.; Williams, N. Mark; Hanser, Andrew David; Carlson, Eric Porter; Thomas, Darin Taze, Method and apparatus for producing MIIIN columns and MIIIN materials grown thereon.
  29. Schowalter, Leo J.; Slack, Glen A.; Rojo, J. Carlos, Method and apparatus for producing large, single-crystals of aluminum nitride.
  30. Schowalter, Leo; Slack, Glen A.; Rojo, Juan Carlos; Bondokov, Robert T.; Morgan, Kenneth E.; Smart, Joseph A., Method and apparatus for producing large, single-crystals of aluminum nitride.
  31. Kobayashi,Yoshimasa; Hayase,Toru; Yamada,Naohito, Method for manufacturing aluminum nitride single crystal.
  32. Morgan, Kenneth E.; Schowalter, Leo J.; Slack, Glen A., Methods for controllable doping of aluminum nitride bulk crystals.
  33. Mueller, Stephan, Methods of fabricating silicon carbide crystals.
  34. Mueller,Stephan, Methods of fabricating silicon carbide crystals.
  35. Mueller,Stephan, Methods of fabricating silicon carbide crystals.
  36. Schowalter, Leo J.; Smart, Joseph A.; Liu, Shiwen; Morgan, Kenneth E.; Bondokov, Robert T.; Bettles, Timothy J.; Slack, Glen A., Nitride semiconductor heterostructures and related methods.
  37. Schowalter, Leo J.; Smart, Joseph A.; Liu, Shiwen; Morgan, Kenneth E.; Bondokov, Robert T.; Bettles, Timothy J.; Slack, Glen A., Nitride semiconductor heterostructures and related methods.
  38. Cuomo, Jerome J.; Williams, N. Mark, Non-thermionic sputter material transport device, methods of use, and materials produced thereby.
  39. Schowalter, Leo J.; Chen, Jianfeng; Grandusky, James R., Photon extraction from nitride ultraviolet light-emitting devices.
  40. Schowalter, Leo J.; Chen, Jianfeng; Grandusky, James R., Photon extraction from nitride ultraviolet light-emitting devices.
  41. Grandusky, James R.; Schowalter, Leo J.; Jamil, Muhammad; Mendrick, Mark C.; Gibb, Shawn R., Pseudomorphic electronic and optoelectronic devices having planar contacts.
  42. Hunter Charles Eric, Simulated diamond gemstones formed of aluminum nitride and aluminum nitride: silicon carbide alloys.
  43. Schowalter, Leo J.; Smart, Joseph A.; Grandusky, James R.; Liu, Shiwen, Thick pseudomorphic nitride epitaxial layers.
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