초록 ▼

A sputtering target for forming a magnetic thin film includes iron powder and at least one first oxide powder selected from the oxides of barium, strontium and lead. The fabrication method of a sputtering target for forming a magnetic thin film comprises the steps of molding a mixture comprising an

A sputtering target for forming a magnetic thin film includes iron powder and at least one first oxide powder selected from the oxides of barium, strontium and lead. The fabrication method of a sputtering target for forming a magnetic thin film comprises the steps of molding a mixture comprising an iron-first oxide powder, or an iron-first and second oxide powder to form a compact by a cold hydrostatic pressing and of sintering the compact either in a vacuum or in a non-oxygen atmosphere. The sputtering target with a high thermal conductivity improves the deposition rate by a raised input voltage.

대표청구항

[ What is claimed is:] [1.] A sputtering target for forming a magnetic thin film, comprising an iron powder and at least one first oxide powder selected from oxides of barium, strontium and lead.

[ What is claimed is:] [1.] A sputtering target for forming a magnetic thin film, comprising an iron powder and at least one first oxide powder selected from oxides of barium, strontium and lead.