초록 ▼

A method and apparatus are disclosed for forming thin polymer layers on semiconductor substrates. In one embodiment, the method and apparatus include the sublimation of stable dimer parylene material, the pyrolytic conversion of such gaseous dimer material into reactive monomers, and for the optiona

A method and apparatus are disclosed for forming thin polymer layers on semiconductor substrates. In one embodiment, the method and apparatus include the sublimation of stable dimer parylene material, the pyrolytic conversion of such gaseous dimer material into reactive monomers, and for the optional blending of the resulting gaseous parylene monomers with one or more polymerizable materials in gaseous form capable of copolymerizing with the parylene monomers to form a low dielectric constant polymerized parylene material. An apparatus is also disclosed which provides for the distribution of the polymerizable gases into the deposition chamber, for cooling the substrate down to a temperature at which the gases will condense to form a polymerized dielectric material, for heating the walls of the deposition chamber to inhibit formation and accumulation of polymerized residues thereon, and for recapturing unreacted monomeric vapors exiting the deposition chamber. An apparatus is further provided downstream of the deposition chamber to control both the flow rate or residence time of the reactive monomer in the deposition chamber as well as to control the pressure of the deposition chamber. Provision is further made for an electrical bias to permit the apparatus to function as a plasma etch chamber, for in situ plasma cleaning of the chamber between depositions, for enhancing cracking of polymerizable precursor material, for heating the walls of the chamber and for providing heat sufficient to prevent polymerization in the gas phase.

대표청구항 ▼

[ What is claimed is:] [1.] An apparatus for forming a thin polymer layer on the surface of an object, comprising:a vaporization chamber adapted to vaporize a polymerizable material into a carrier gas stream; anda deposition chamber in fluid communication with the vaporization chamber and adapted to

[ What is claimed is:] [1.] An apparatus for forming a thin polymer layer on the surface of an object, comprising:a vaporization chamber adapted to vaporize a polymerizable material into a carrier gas stream; anda deposition chamber in fluid communication with the vaporization chamber and adapted to receive the carrier gas and vaporized polymerizable material, the deposition chamber having:a support member adapted to receive an object;a chiller adapted to cool the object below the condensation temperature of the polymerizable material;a heater adapted to maintain one or more walls of the deposition chamber at a temperature above the polymerization temperature of the polymerizable material; and a magnet assembly adapted to provide a B field to enhance the deposition rate of the polymerizable material onto the object. [20.] A process of forming a thin polymer layer on the surface of an object, comprising:positioning an object within a deposition chamber;vaporizing a polymerizable material into a carrier gas stream;maintaining one or more walls of the deposition chamber at a temperature above the polymerization temperature of the polymerizable material;maintaining the object at a temperature below the condensation temperature of the polymerizable material,flowing the vaporized polymerizable material and the carrier gas stream into the deposition chamber; maintaining a B field within the deposition chamber; anddepositing a thin polymer layer onto the object.