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Treating substrates by producing and controlling a cryogenic aerosol 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/02
출원번호 US-0872958 (1997-06-11)
발명자 / 주소
  • Patrin John C.
  • Heitzinger John M.
출원인 / 주소
  • FSI International, Inc
대리인 / 주소
    Vidas, Arrett & Steinkraus, P.A.
인용정보 피인용 횟수 : 47  인용 특허 : 51

초록 ▼

A substrate may be treated by impinging the substrate with a cryogenic aerosol spray wherein the cryogenic aerosol spray is formed by expanding a pressurized liquid or liquid/gaseous stream of one or more cryogens through a nozzle at a given distance from the substrate into a process chamber with a

대표청구항 ▼

[ What is claimed is as follows:] [1.] A method for treating a substrate by impinging the substrate with a cryogenic aerosel spray wherein said cryogenic aerosol spray is formed byforming a first aerosol spray comprising liquid particles and gas bubbles by expanding a pressurize liquid stream or liq

이 특허에 인용된 특허 (51)

  1. Srikrishnan Kris V. (Wappingers Falls NY) Wu Jin J. (Ossining NY), Aerosol cleaning method.
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  2. Ogawa Mitsuhiro (Yao JPX) Ouno Toshiki (Fukuoka JPX) Ejima Taizou (Fukuoka JPX) Kotou Satoru (Amagasaki JPX), Apparatus and method for cleaning semiconductor wafers.
    상세보기
  3. Whitlock Walter H. (Peapack NJ) Weltmer ; Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ), Apparatus and method for removing minute particles from a substrate.
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  4. Bauer Tibor L. (Hopewell Junction NY) Cavaliere William A. (Verbank NY) Dart ; II Charles R. (Coral Springs FL) Freebern Timothy H. (LaGrangeville NY) Linnell David C. (Poughkeepsie NY) Miller James , Apparatus for producing cryogenic aerosol.
    상세보기
  5. Hayashi Chikara (Chigasaki JPX), Apparatus for removing covering film.
    상세보기
  6. Layden Lawrence M. (Stanton NJ), Apparatus for removing small particles from a substrate.
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  7. McDermott Wayne T. (Allentown PA) Wu Jin J. (Ossining NY) Ockovic Richard C. (Northampton PA), Apparatus to clean solid surfaces using a cryogenic aerosol.
    상세보기
  8. Fong Calvin C. (Beverly Hills CA) Altizer John W. (Simi Valley CA) Arnold Vernon E. (Fillmore CA) Lawson John K. (Granada Hills CA), Blasting machine utilizing sublimable particles.
    상세보기
  9. Goenka Lakhi Nandlal (Ann Arbor MI), CO2 cleaning nozzle and method with enhanced mixing zones.
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  10. Swain Eugene A. (Webster NY) Carter Stephen R. (Tucson AZ) Hoenig Stuart A. (Tucson AZ), Carbon dioxide snow agglomeration and acceleration.
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  11. Ichinoseki Tsuyoshi ((Yoshizawa Jutaku E-206) No. 844-2 ; Yoshizawa-cho Mito-shi ; Ibaragi-ken JPX) Kato Hirobumi ((Hyakujuen Jutaku D-302) No. 2617-2 ; Motoyoshida-cho Mito-shi ; Ibaragi-ken JPX) Mi, Cleaning method.
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  12. Miyahara Shuji (Yokohama JPX) Kimuro Harumi (Yokohama JPX) Yamashita Saburo (Ayase JPX), Cleaning method for apparatus.
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  13. Goffnett David M. (Alma MI) Richardson Mark D. (Hemlock MI) Bielby Eugene F. (Saginaw MI), Cleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pellets.
    상세보기
  14. Rattan William D. (San Jose CA) Walwyn Craig M. (San Jose CA), Disc cleaning machine.
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  15. Mastrangelo Carlos H. (Ann Arbor MI), Dry-release method for sacrificial layer microstructure fabrication.
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  16. Cherry Roger L. (2636 Maria Ct. West Linn OR 97068), High-purity cleaning system, method, and apparatus.
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  17. Tada Masuo (Yao JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Ice particle forming and blasting device.
    상세보기
  18. Hoy Kenneth L. (St. Albans WV) Nielsen Kenneth A. (Charleston WV) Lee Chinsoo (Charleston WV), Liquid spray application of coatings with supercritical fluids as diluents and spraying from an orifice.
    상세보기
  19. Shortes Samuel R. (Plano TX) Millis Edwin Graham (Dallas TX), Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water.
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  20. Pickering Raymond E. (Vassalboro ME) Waitkus Patricia E. (Rockport MA) Parsons Delmar R. (Greenfield MA) Soule Lincoln (Wendell MA) Walker William T. (South Deerfield MA) Bedaw Robert E. (Turner Fall, Method and apparatus for the aqueous cleaning of populated printed circuit boards.
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  21. Kawai Akira (Itami) Uoya Shigeo (Itami JPX), Method for applying a treatment liquid on a semiconductor wafer.
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  22. Sneed John D. (Long Beach CA) Krone-Schmidt Wilfried (Fullerton CA) Slattery Michael J. (Gardena CA) Bowen Howard S. (Los Angeles CA), Method for cleaning surface by heating and a stream of snow.
    상세보기
  23. Williford ; Jr. John F. (7155 NE. 126th St. Kirkland WA 98034), Method for removing particulate matter.
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  24. Brock James R. (Austin TX) Trachtenberg Isaac (Austin TX), Method of aerosol jet etching.
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  25. Ohmori Toshiaki (Itami JPX) Kanno Itaru (Itami JPX) Fukumoto Takaaki (Itami JPX), Method of cleaning a surface by blasting the fine frozen particles against the surface.
    상세보기
  26. Moriya Kozo (Ibaragi JPX) Ookatsu Tadashi (Kobe JPX), Method of cleaning wafers or the like.
    상세보기
  27. Orsen Mikael (Kungalv SEX), Method of removing paint.
    상세보기
  28. Cavaliere William A. (Verbank NY) Kuder ; II Robert P. (Hopewell Junction NY) Wu Jin J. (Ossining NY), Mounting apparatus for cryogenic aerosol cleaning.
    상세보기
  29. Bauer Tibor L. (Hopewell Junction NY) Cavaliere William A. (Verbank NY) Linnell David C. (Poughkeepsie NY) Wu Jin J. (Ossining NY), Nozzle apparatus for producing aerosol.
    상세보기
  30. Moore David E. (212 Southampton Rd. Louisville KY 40223) Crane Newell D. (5988 Woodridge Dr. Milford OH 45150), Particle-blast cleaning apparatus and method.
    상세보기
  31. Anderson Max F. (R.R. #1 Stewardson IL 62463), Portable cleaning apparatus.
    상세보기
  32. Gifford George G. (Poughkeepsie NY) Lii Yeong-Jyh T. (Peekskill NY) Wu Jin J. (Ossining NY), Process for fabricating a semiconductor structure having sidewalls.
    상세보기
  33. Hayashi Chikara (Chigasaki JPX), Process for removing covering film and apparatus therefor.
    상세보기
  34. Lampert Ingolf (Burghausen DEX) Gratzl Christa (Neuotting DEX), Process for the wet-chemical surface treatment of semiconductor wafers.
    상세보기
  35. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Processing apparatus for semiconductor wafers.
    상세보기
  36. Tada, Masuo; Hata, Takeki; Fukumoto, Takaaki; Ohmori, Toshiaki, Processing method for semiconductor wafers.
    상세보기
  37. Fong Calvin C. (Beverly Hills CA), Sandblasting with pellets of material capable of sublimation.
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  38. Hatton Derald R. (Middletown OH) Chupka David E. (Middletown OH), Self-sealing valve assembly to facilitate unplugging of a centrifugal cleaner.
    상세보기
  39. Menon Venugopal B. (Austin TX), Submicron particle removal using liquid nitrogen.
    상세보기
  40. Menon Venugopal B. (Austin TX), Submicron particle removal using liquid nitrogen.
    상세보기
  41. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Allentown PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Millwood NY) Schwarz Alexander (Allentown PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using a cryogenic aerosol.
    상세보기
  42. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Northampton PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Milwood NY) Schwarz Alexander (Bethlehem PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using an argon or nitrogen aerosol.
    상세보기
  43. Tamai Tadamoto (Tokyo JPX) Ikeya Yoichiro (Houya JPX), Surface cleaning with argon.
    상세보기
  44. Peterson Ronald V. (Thousand Oaks CA) Krone-Schmidt Wilfried (Fullerton CA), System for precision cleaning by jet spray.
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  45. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), System for surface and fluid cleaning.
    상세보기
  46. Hodge Robert J. (Colorado Springs CO), Vehicle cleansing method.
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  47. Levi Mark W. (Utica NY), Wafer cleaning method.
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  48. Tanaka Masato (Hikone JPX) Nishizawa Hisao (Hikone JPX) Hirai Nobuyuki (Hikone JPX) Shinbara Kaoru (Hikone JPX) Yoshioka Hitoshi (Hikone JPX), Wafer cleaning method and apparatus therefor.
    상세보기
  49. Tanaka Masato (Hikone JPX) Nishizawa Hisao (Hikone JPX) Hirai Nobuyuki (Hikone JPX) Shinbara Kaoru (Hikone JPX) Yoshioka Hitoshi (Hikone JPX), Wafer cleaning method and apparatus therefore.
    상세보기
  50. Roger Tanguy (Villeneuve d\Ascq FRX), Washing device.
    상세보기
  51. Goff James R. (Seminole OK), Washing device for machine parts and method of using the device.
    상세보기

이 특허를 인용한 특허 (47)

  1. Chen, Dongmin; Xiong, Fulin, Anti-stiction gas-phase lubricant for micromechanical systems.
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  2. Furusawa Masami,JPX ; Harano Riichiro,JPX, Apparatus and method for cleaning substrate.
    상세보기
  3. Lewis, Paul E.; Ahmadi, Goodarz; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Apparatus for cleaning surfaces substantially free of contaminants.
    상세보기
  4. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for surface abrasion with frozen particles.
    상세보기
  5. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for surface abrasion with frozen particles.
    상세보기
  6. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for surface abrasion with frozen particles.
    상세보기
  7. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for surface abrasion with frozen particles.
    상세보기
  8. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for surface abrasion with frozen particles.
    상세보기
  9. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for surface abrasion with frozen particles.
    상세보기
  10. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for surface abrasion with frozen particles.
    상세보기
  11. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for surface abrasion with frozen particles.
    상세보기
  12. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for therapeutic delivery with frozen particles.
    상세보기
  13. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for therapeutic delivery with frozen particles.
    상세보기
  14. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for therapeutic delivery with frozen particles.
    상세보기
  15. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for therapeutic delivery with frozen particles.
    상세보기
  16. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for therapeutic delivery with frozen particles.
    상세보기
  17. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for therapeutic delivery with frozen particles.
    상세보기
  18. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Compositions and methods for therapeutic delivery with frozen particles.
    상세보기
  19. Uziel, Yoram, Contaminant removal by laser-accelerated fluid.
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  20. Eliasson, Bertil; Hallberg, Per-Åke; Carlsson, Lennart; Engman, Fredrik, Device and use in connection with measure for combating.
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  21. Endisch, Denis H., Edge bead removal for spin-on materials containing low volatility solvents fusing carbon dioxide cleaning.
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  22. Roy, Indranil; Marya, Manuel; Bhavsar, Rashmi; Wilkinson, Chris, High frequency surface treatment methods and apparatus to extend downhole tool survivability.
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  23. Banerjee, Souvik; Chung, Harlan Forrest, Liquid-assisted cryogenic cleaning.
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  24. Banerjee,Souvik; Chung,Harlan Forrest, Liquid-assisted cryogenic cleaning.
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  25. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Method and system for comparing tissue ablation or abrasion data to data related to administration of a frozen particle composition.
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  26. Wagener Thomas J. ; Patrin John C. ; Inhofer William P. ; Siefering Kevin L., Method for transferring a microelectronic device to and from a processing chamber.
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  27. Chen,Dongmin; Xiong,Fulin, Method of operating a micromechanical device that contains anti-stiction gas-phase lubricant.
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  28. Chen,Dongmin; Xiong,Fulin, Method of using a preferentially deposited lubricant to prevent anti-stiction in micromechanical systems.
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  29. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L., Methods and systems for ablation or abrasion with frozen particles and comparing tissue surface ablation or abrasion data to clinical outcome data.
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  30. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants.
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  31. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
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  32. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
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  33. Boumerzoug, Mohamed; Tannous, Adel George; Makhamreh, Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
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  34. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
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  35. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
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  36. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
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  37. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
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  38. Chen, Dongmin; Xiong, Fulin; Worley, Spencer, Preferentially deposited lubricant to prevent anti-stiction in micromechanical systems.
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  39. Chen, Dongmin; Xiong, Fulin; Worley, Spencer, Preferentially deposited lubricant to prevent anti-stiction in micromechanical systems.
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  40. Chen,Dongmin; Xiong,Fulin, Process of forming a micromechanical system containing an anti-stiction gas-phase lubricant.
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  41. Cotte, John M.; Ivers, Catherine; McCullough, Kenneth J.; Moreau, Wayne M.; Purtell, Robert J.; Simons, John P.; Syverson, William A.; Taft, Charles J., Solid CO2 cleaning.
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  42. Bellis, Matthew William; Chen, Dongmin; Miller, Gregory Allen, Spatially offset multi-imager-panel architecture for projecting an image.
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  43. Watanabe, Tsukasa; Shindo, Naoki; Ohno, Hiroki; Sekiguchi, Kenji, Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage medium.
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  44. Butterbaugh, Jeffery W.; Mbanaso, Chimaobi W.; Becker, David Scott, Systems and methods for treating substrates with cryogenic fluid mixtures.
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  45. Butterbaugh, Jeffery W.; Mbanaso, Chimaobi W.; Becker, David Scott, Systems and methods for treating substrates with cryogenic fluid mixtures.
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  46. Mbanaso, Chimaobi W.; Butterbaugh, Jeffery W.; Becker, David Scott, Systems and methods for treating substrates with cryogenic fluid mixtures.
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  47. Weber, Paul J.; Da Silva, Luiz B.; Rubenchik, Alexander M., Tissue removal using biocompatible materials.
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