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Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement s 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-015/06
  • G01N-021/00
출원번호 US-0711781 (1996-09-10)
발명자 / 주소
  • McAndrew James
  • Wang Hwa-Chi
  • Jurcik
  • Jr. Benjamin J.
출원인 / 주소
  • American Air Liquide Inc.
대리인 / 주소
    Burns, Doane, Swecker & Mathis, L.L.P.
인용정보 피인용 횟수 : 40  인용 특허 : 22

초록

Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorptio

대표청구항

[ What is claimed is:] [1.] A chamber effluent monitoring system, comprising:a chamber having an exhaust line connected thereto, the exhaust line including a sample region, wherein substantially all of a chamber effluent passes through the sample region;an absorption spectroscopy measurement system

이 특허에 인용된 특허 (22)

  1. Wieboldt Richard C. (Verona WI) Adams Gregory E. (Madison WI), Cold trapping apparatus for infrared transmission analysis including a method and substrate therefor.
  2. Wong Jacob Y. (4589 Camino Molinero Santa Barbara CA 93110), Concentration detector.
  3. Heinz Tony F. (Chappaqua NY) Selwyn Gary S. (Hopewell Junction NY) Singh Syothi (Hopewell Junction NY) Spinetti ; Jr. John A. (Endicott NY), Detection of interfaces with atomic resolution during material processing by optical second harmonic generation.
  4. Wong Jacob Y. (Santa Barbara CA), Enhanced pathlength gas sample chamber.
  5. Doyle Walter M. (Laguna Beach CA), Gas sample analysis provided by light pipe radiation structure.
  6. Silver Joel A. (Sante Fe NM) Stanton Alan C. (Sante Fe NM), Laser absorption detection enhancing apparatus and method.
  7. Puumalainen Pertti (Kuopio FIX) Kuusela Reijo (Kuopio FIX), Method and apparatus for measuring of humidity.
  8. Tell Robert (Gteborg SEX) Andersson Torbjrn (Gteborg SEX) Lundqvist Stefan (Askim SEX) Ahlberg Henrik (Gteborg SEX), Method and apparatus for spectroscopic measurement of the concentration of a gas.
  9. Aoki Kazutsugu (Kanagawa JPX), Method for controlling plasma surface-treatments with a plurality of photodetectors and optical filters.
  10. Lee Peter S. (Troy MI) Majkowski Richard F. (Southfield MI) Schreck Richard M. (Bloomfield Hills MI), Method for determining fuel and engine oil comsumption using tunable diode laser spectroscopy.
  11. Tapp Frederick (Hillsborough NC) Berger Henry (Durham NC), Method of performing an instantaneous moisture concentration measurement and for determining the drydown characteristics.
  12. Bien Fritz (Concord MA) Gersh Michael (Bedford MA) Goldstein Neil (Belmont MA) Lee Jamine (Burlington MA), Multi-pass optical cell species concentration measurement system.
  13. Harvey Robert J. (Capistrano Beach CA), Multiple-path gas-absorption cell.
  14. Lee Jamine (Burlington MA) Goldstein Neil (Belmont MA) Richtsmeier Steven (Tewksbury MA) Bien Fritz (Concord MA) Gersh Michael (Bedford MA), Off-line-locked laser diode species monitor system.
  15. Talasek Robert T. (Plano TX) Hogan Jeremiah D. (Dallas TX), On-line monitor for moisture contamination in HCL gas and copper contamination in NH4OH solutions.
  16. Wallin Svante (Bjrred SEX), Optical analysing equipment for determining parameters of gaseous substances flowing through a duct.
  17. Krone-Schmidt Wilfried (Fullerton CA) Slattery Michael J. (Gardena CA) Brandt Werner V. (Redondo Beach CA), Optical sensing apparatus for CO2jet spray devices.
  18. Zajac John (1137 Angmar Ct. San Jose CA 95121), Reactor monitoring system and method.
  19. Hagans Karla (Livermore CA) Berzins Leon (Livermore CA) Galkowski Joseph (Livermore CA) Seng Rita (Tracy CA), Self-tuning method for monitoring the density of a gas vapor component using a tunable laser.
  20. Kawada Hiroki (Ishioka JPX) Takahashi Kazue (Kudamatsu JPX) Edamura Manabu (Ibaraki-ken JPX) Kanai Saburo (Hikari JPX) Tamura Naoyuki (Kudamatsu JPX), Semiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamber.
  21. Traina John E. (303 N. Rose Dr. Glenshaw PA 15116), Transmissometer having solid state light source.
  22. Thurtell George (38 University Ave. West Guelph ; Ontario CAX N1G 1N4) Kidd Gary (11 Batterswood Ct. Kitchener ; Ontario CAX N2A 3S3) Edwards Grant (378 Willard Ave. Toronto ; Ontario CAX M6S 3R5), Tunable diode laser gas analyzer.

이 특허를 인용한 특허 (40)

  1. Akiyama, Osamu; Akimoto, Masashi; Moriya, Tsuyoshi; Yamawaku, Jun, Absorption spectrometric apparatus for semiconductor production process.
  2. Gealy, Dan; Weimer, Ronald A., Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers.
  3. Mardian, Allen P.; Rodriguez, Santiago R., Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes.
  4. Carpenter,Craig M.; Dando,Ross S.; Mardian,Allen P., Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces.
  5. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  6. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  7. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  8. Minami, Masakazu, Decomposition detecting unit, concentration measuring unit, and concentration control apparatus.
  9. Rulkens, Ron; Florin, Didier, Endpoint detection for high density plasma (HDP) processes.
  10. Killich, Frank, Gas analyser.
  11. Jacksier, Tracey; Benesch, Robert, Increased stability low concentration gases, products comprising same, and methods of making same.
  12. Powell, Gary, Inductively coupled plasma spectrometer for process diagnostics and control.
  13. Smith,Stevie Horton, Measuring trace components of complex gases using gas chromatography/absorption spectrometry.
  14. Zhou, Xin, Measuring water vapor in hydrocarbons.
  15. Powell,Gary B.; Litvak,Herbert E., Method and apparatus for chemical monitoring.
  16. Davey, Peter, Method and apparatus for detecting a gas leak using nuclear magnetic resonance.
  17. McMillin, Brian K.; Hudson, Eric; Marks, Jeffrey, Method and apparatus for detecting endpoint during plasma etching of thin films.
  18. Mettes, Jacob, Method and apparatus for implementing an afterglow emission spectroscopy monitor.
  19. Powell, Gary; Hazard, Richard L., Method and device utilizing plasma source for real-time gas sampling.
  20. Powell,Gary; Hazard,Richard L., Method and device utilizing plasma source for real-time gas sampling.
  21. Powell, Gary, Method and device utilizing real-time gas sampling.
  22. Powell, Gary, Method and device utilizing real-time gas sampling.
  23. Guldi,Richard L.; Grobelny,J. Michael, Method for intelligent sampling of particulates in exhaust lines.
  24. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  25. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  26. Reis Kenneth P., Methods of monitoring and maintaining concentrations of selected species in solutions during semiconductor processing.
  27. Liu,Xiang; Zhou,Xin; Feitisch,Alfred; Sanger,Greg, Pressure-invariant trace gas detection.
  28. Zhou, Xin; Liu, Xiang; Feitisch, Alfred; Sanger, Gregory M., Reactive gas detection in complex backgrounds.
  29. Jacksier, Tracey; Benesch, Robert; Haouchine, Malik, Reactive gases with concentrations of increased stability and processes for manufacturing same.
  30. Jacksier, Tracey; Benesch, Robert; Haouchine, Malik, Reactive gases with concentrations of increased stability and processes for manufacturing same.
  31. Carpenter,Craig M.; Dando,Ross S.; Dynka,Danny, Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  32. Dando, Ross S., Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  33. Miller, Matthew W.; Basceri, Cem, Reactors, systems and methods for depositing thin films onto microfeature workpieces.
  34. Jacksier,Tracey; Benesch,Robert; Kuhn,John, Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same.
  35. Jacksier,Tracey; Benesch,Robert; Kuhn,John, Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same.
  36. Hasegawa,Hiroyuki; Yamaoka,Tomonori; Ishihara,Yoshio; Masusaki,Hiroshi, Semiconductor manufacturing method and semiconductor manufacturing apparatus.
  37. May,Randy Dean, System and method for detecting water vapor within natural gas.
  38. May,Randy Dean, System and method for detecting water vapor within natural gas.
  39. May,Randy Dean, System and method for detecting water vapor within natural gas.
  40. Arno, Jose I.; Despres, Joseph R.; Letaj, Shkelqim; Lurcott, Steven M.; Baum, Thomas H.; Zou, Peng, TPIR apparatus for monitoring tungsten hexafluoride processing to detect gas phase nucleation, and method and system utilizing same.
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