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특허 상세정보

MyON담기
내보내기 페이스북 공유 카카오톡 공유

Linkage assembly with extruded hole member

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) A47C-010/22    F16M-013/00   
미국특허분류(USC) 248/429 ; 248/421
출원번호 US-0625936 (1996-04-01)
발명자 / 주소
  • Gauger Derek K.
  • Grajewski Joseph J.
출원인 / 주소
  • Lear Corporation
대리인 / 주소
    MacMillan, Sobanski and Todd, LLC
인용정보 피인용 횟수 : 50  인용 특허 : 13
초록
▼

A linkage assembly for use with kinetic mechanisms such as an automotive seat assembly having an elongated torsion rod made of either a solid bar or a hollow cylindrical tube, and at least one linkage member having an aperture corresponding to the cross-sectional profile of the torsion rod and adapted to receive the torsion rod therethrough. The linkage member includes an essentially flat sheet of metal extending from and coplanar to the aperture and an outwardly extending extruded metal flange which projects upward from the flat surface of the linkage m...

대표
청구항
▼

[ What is claimed is:] [1.] A linkage assembly for use in kinetic mechanisms such as an automotive seat assembly, comprising:at least one linkage member, the linkage member having a flat body region and a flange member extending outward therefrom, the flange member having a continuous wall with an outer peripheral surface, an opposed inner surface and a terminal surface distal to the flat body region extending between the outer peripheral surface and the opposed inner surface, the outwardly extending flange member defining an aperture extending through t...

이 특허에 인용된 특허 (13)

  1. Harwood Jon (Toledo OH) Kohler Donald (Fenton MI), Method for manufacturing an exhaust manifold.
  2. Lema Leo A. (Racine WI), Method of attaching a tube to a wall.
  3. Veit Ernst-Ludwig (Solms DEX) Klee Jrgen (Braunfels DEX), Method of soldering the outer sleeve of a coaxial cable connector to a housing.
  4. Erickson Ernest A. (Sturtevant WI) Hanson Rodger D. (Jackson MI) Mews Lance D. (Clark Lake MI), Muffler with three part welded joint.
  5. Gauger Derek K. (Ann Arbor MI) Horvet Kirk K. (Royal Oak MI) Chaban Phillip (Grass Lake MI), One-piece upper track for a power seat adjuster.
  6. Gauger Derek K. (Ann Arbor MI) Horvet Kirk K. (Royal Oak MI) Chaban Phillip (Grass Lake MI), Power seat adjuster with drive gear force bypass.
  7. Heesch Max Otto (Brooklyn MI), Seat adjustment mechanism.
  8. Moradell Pierre G. R. (Saint Gregoire Du Vievre FRX) Jaudouin Paul J. G. (Saint Georges Des Groseillers FRX), Systems for adjusting vehicle seats.
  9. Crout James O. (330 Crosspark Dr. ; Apt. 8 Jackson MS 39208) Sanne Sreemukh (100 Appleridge Dr. Branson MS 39042), Unitary brazed tubing fitting assembly with deformed sealing web.
  10. Russo Vincenzo (Jackson MI) Heesch Max O. (Brooklyn MI), Vehicle seat track apparatus.
  11. Wahls Robert J. (Pickney MI), Vehicle seat track apparatus.
  12. Chinomi Isamu (Ayase JPX), Vehicular seat adjuster.
  13. Kanne ; Jr. William R. (Aiken SC) Kelker ; Jr. John W. (North Augusta SC) Alexander Robert J. (Aiken SC), Weld braze technique.

이 특허를 인용한 특허 (50)

  1. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  2. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  3. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  4. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  5. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  6. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  7. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  8. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  9. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  10. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  11. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
  12. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens using a pad member or second stage during wafer exchange in an immersion lithography machine.
  13. Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the protection lens during wafer exchange in an immersion lithography machine.
  14. Binnard, Michael, Apparatus for maintaining immersion fluid in the gap under the projection lens during wafer exchange using a co-planar member in an immersion lithography machine.
  15. Ebihara, Akimitsu, Exposure apparatus and device manufacturing method.
  16. Ebihara, Akimitsu, Exposure apparatus and device manufacturing method.
  17. Ebihara, Akimitsu, Exposure apparatus and device manufacturing method.
  18. Ebihara, Akimitsu, Exposure apparatus and device manufacturing method.
  19. Ebihara, Akimitsu, Exposure apparatus and device manufacturing method.
  20. Ebihara, Akimitsu, Exposure apparatus and device manufacturing method.
  21. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  22. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  23. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  24. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  25. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  26. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  27. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  28. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  29. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  30. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  31. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  32. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  33. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  34. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  35. Ebihara, Akimitsu, Exposure apparatus, and device manufacturing method.
  36. Shibazaki, Yuichi, Lithographic apparatus and method having substrate and sensor tables.
  37. Shibazaki, Yuichi, Lithographic apparatus and method having substrate and sensor tables.
  38. Shibazaki, Yuichi, Lithographic apparatus and method having substrate and sensor tables.
  39. Shibazaki, Yuichi, Lithographic apparatus and method having substrate table and sensor table to hold immersion liquid.
  40. Shibazaki, Yuichi, Lithographic apparatus having substrate table and sensor table to measure a patterned beam.
  41. Koga Yoshitaka,JPX, Power seat device.
  42. Shibazaki, Yuichi, Stage drive method and stage unit, exposure apparatus, and device manufacturing method.
  43. Shibazaki, Yuichi, Stage drive method and stage unit, exposure apparatus, and device manufacturing method.
  44. Shibazaki, Yuichi, Stage drive method and stage unit, exposure apparatus, and device manufacturing method.
  45. Shibazaki, Yuichi, Stage drive method and stage unit, exposure apparatus, and device manufacturing method.
  46. Shibazaki, Yuichi, Stage drive method and stage unit, exposure apparatus, and device manufacturing method.
  47. Shibazaki, Yuichi, Stage drive method and stage unit, exposure apparatus, and device manufacturing method.
  48. Shibazaki, Yuichi, Stage drive method and stage unit, exposure apparatus, and device manufacturing method.
  49. Shibazaki, Yuichi, Stage drive method and stage unit, exposure apparatus, and device manufacturing method.
  50. Rowley, Henry Allan; Baluja, Shumeet, Transportation routing.

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