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Method of producing silicon carbide single crystal 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C30B-029/36
출원번호 US-0820888 (1997-03-21)
우선권정보 JP-0103719 (1996-03-29)
발명자 / 주소
  • Sugiyama Naohiro,JPX
  • Okamoto Atsuto,JPX
  • Tani Toshihiko,JPX
  • Kamiya Nobuo,JPX
출원인 / 주소
  • Kabushiki Kaisha Toyota Chuo Kenkyusho, JPX
대리인 / 주소
    Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보 피인용 횟수 : 23  인용 특허 : 3

초록

An easy and low-cost method of producing a large-size and high-purity silicon carbide (SiC) single crystal includes reacting silicon vapor directly with a carbon-containing compound gas under a heated atmosphere (growth space 14) to grow a silicon carbide single crystal (15) on a silicon carbide see

대표청구항

[ What is claimed is:] [1.] A method of producing a silicon carbide single crystal comprising the step of:generating silicon vapor from molten silicon; andreacting the silicon vapor directly with a carbon-containing compound gas under a heated atmosphere to grow a silicon carbide single crystal on a

이 특허에 인용된 특허 (3)

  1. Eshita Takashi (Inagi JPX) Mieno Fumitake (Kawasaki JPX) Furumura Yuji (Kawasaki JPX) Itoh Kikuo (Yokohama JPX), Method of growing a single crystalline b 상세보기
  • Addamiano Arrigo (Alexandria VA) Klein Philipp H. (Washington DC), Recovery of fragile layers produced on substrates by chemical vapor deposition.
  • Davis Robert F. (Raleigh NC) Carter ; Jr. Calvin H. (Raleigh NC) Hunter Charles E. (Durham NC), Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide.
  • 이 특허를 인용한 특허 (23)

    1. Balakrishna Vijay ; Augustine Godfrey ; Gaida Walter E. ; Thomas R. Noel ; Hopkins Richard H., Advanced physical vapor transport method and apparatus for growing high purity single crystal silicon carbide.
    2. Chen, Zhizhan; Shi, Erwei; Yan, Chengfeng; Xiao, Bing, Apparatus with two-chamber structure for growing silicon carbide crystals.
    3. Powell,Adrian; Brady,Mark; Tsvetkov,Valeri F., Low basal plane dislocation bulk grown SiC wafers.
    4. Vodakov, Yury Alexandrovich; Mokhov, Evgeny Nikolaevich; Ramm, Mark Grigorievich; Roenkov, Alexandr Dmitrievich; Makarov, Yury Nikolaevich; Karpov, Sergei Yurievich; Ramm, Mark Spiridonovich; Temkin,, Low defect axially grown single crystal silicon carbide.
    5. Kordina, Olle Claes Erik; Paisley, Michael James, Method and apparatus for growing silicon carbide crystals.
    6. Shigeto, Masashi; Yano, Kotaro; Nagato, Nobuyuki, Method and apparatus for producing silicon carbide single crystal.
    7. Shigeto, Masashi; Yano, Kotaro; Nagato, Nobuyuki, Method and apparatus for producing silicon carbide single crystal.
    8. Vodakov, Yury Alexandrovich; Mokhov, Evgeny Nikolaevich; Ramm, Mark Grigorievich; Roenkov, Alexandr Dmitrievich; Makarov, Yury Nikolaevich; Karpov, Sergei Yurievich; Ramm, Mark Spiridonovich; Temkin,, Method for growing single crystal silicon carbide.
    9. Chen, Wei-Yu; Hwang, Jenn-Chang; Huang, Chih-Fang; Chen, Chien-Cheng, Method of fabricating silicon carbide (SiC) layer.
    10. Hiromu Shiomi JP; Shigehiro Nishino JP, Method of making SiC single crystal and apparatus for making SiC single crystal.
    11. Shiomi Hiromu,JPX ; Nishino Shigehiro,JPX, Method of making SiC single crystal and apparatus for making SiC single crystal.
    12. Nagasawa, Hiroyuki; Kawahara, Takamitsu; Yagi, Kuniaki, Method of manufacturing silicon carbide, silicon carbide, composite material, and semiconductor element.
    13. Mueller, Stephan, Methods of fabricating silicon carbide crystals.
    14. Mueller,Stephan, Methods of fabricating silicon carbide crystals.
    15. Mueller,Stephan, Methods of fabricating silicon carbide crystals.
    16. Nakabayashi, Masashi; Fujimoto, Tatsuo; Sawamura, Mitsuru; Ohtani, Noboru, Monocrystalline silicon carbide ingot, monocrystalline silicon carbide wafer and method of manufacturing the same.
    17. Nakabayashi, Masashi; Fujimoto, Tatsuo; Sawamura, Mitsuru; Ohtani, Noboru, Monocrystalline silicon carbide ingot, monocrystalline silicon carbide wafer and method of manufacturing the same.
    18. Nakabayashi, Masashi; Fujimoto, Tatsuo; Sawamura, Mitsuru; Ohtani, Noboru, Monocrystalline silicon carbide ingot, monocrystalline silicon carbide wafer and method of manufacturing the same.
    19. Vodakov, Yury Alexandrovich; Mokhov, Evgeny Nikolaevich; Ramm, Mark Grigorievich; Roenkov, Alexandr Dmitrievich; Makarov, Yury Nikolaevich; Karpov, Sergei Yurievich; Ramm, Mark Spiridonovich; Temkin,, Niobium crucible fabrication and treatment.
    20. Hunter Charles Eric, Production of bulk single crystals of silicon carbide.
    21. Helava,Heikki I.; Ramm,Mark G., Tantalum based crucible.
    22. Vodakov, Yury Alexandrovich; Mokhov, Evgeny Nikolaevich; Ramm, Mark Grigorievich; Roenkov, Alexandr Dmitrievich; Makarov, Yury Nikolaevich; Karpov, Sergei Yurievich; Ramm, Mark Spiridonovich; Temkin,, Tantalum crucible fabrication and treatment.
    23. Vodakov Yury Alexandrovich,RUX ; Mokhov Evgeny Nikolaevich,RUX ; Ramm Mark Grigorievich,RUX ; Roenkov Alexandr Dmitrievich,RUX ; Makarov Yury Nikolaevich,RUX ; Karpov Sergei Yurievich,RUX ; Ramm Mark, Technique for growing silicon carbide monocrystals.
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