초록 ▼

Disclosed is a coating apparatus, comprising: a first stream-combining valve communicating with each of a first solvent tank and a resist solution tank, a first pump for supplying an initial resist solution from the resist solution tank toward said first stream-combining valve, a second pump for sup

Disclosed is a coating apparatus, comprising: a first stream-combining valve communicating with each of a first solvent tank and a resist solution tank, a first pump for supplying an initial resist solution from the resist solution tank toward said first stream-combining valve, a second pump for supplying a solvent from said first solvent supply toward said first stream-combining valve, a first mixer for mixing under stirring the initial resist solution flowing out of said first stream-combining valve with a solvent, a second stream-combining valve arranged downstream of said first mixer and communicating with each of the first mixer and said second solvent supply, a third pump for supplying the solvent from said second solvent supply toward the second stream-combining valve, a second mixer for mixing under stirring said primary mixed liquid material coming out of said second stream-combining valve with a solvent so as to prepare a final mixed liquid material, a nozzle equipped with a liquid spurting port for spurting said final mixed liquid material prepared in said second mixer toward the substrate, and a controller for controlling each of the first, second, third pumps and the first and second stream-combining valves so as to control the mixing ratio of the initial resist solution to the solvent and to control the mixing ratio of the primary mixed liquid material to the solvent.

대표청구항 ▼

[ We claim:] [1.] A coating apparatus, comprising:a substrate holding member for holding a substrate to be processed;a process solution supply source housing an initial process solution containing a solvent;first and second solvent supply sources each housing a solvent;a first stream-combining valve

[ We claim:] [1.] A coating apparatus, comprising:a substrate holding member for holding a substrate to be processed;a process solution supply source housing an initial process solution containing a solvent;first and second solvent supply sources each housing a solvent;a first stream-combining valve communicating with each of said first solvent supply source and said process solution supply source;a first pump for supplying said initial process solution from the process solution supply source toward said first stream-combining valve;a second pump for supplying a solvent from said first solvent supply source toward said first stream-combining valve;a first mixer for mixing under stirring the initial process solution flowing out of said first stream-combining valve with a solvent;a second stream-combining valve arranged downstream of said first mixer and communicating with each of the first mixer and said second solvent supply source;a third pump for supplying the solvent from said second solvent supply source toward the second stream-combining valve;a second mixer for mixing under stirring said primary mixed liquid material coming out of said second stream-combining valve with a solvent so as to prepare a final mixed liquid material;a nozzle equipped with a liquid spurting port for spurting said final mixed liquid material prepared in said second mixer toward the substrate held by said substrate holding member; anda controller for controlling each of the first, second, third pumps and the first and second stream-combining valves so as to control the mixing ratio of the initial process solution to the solvent and to control the mixing ratio of the primary mixed liquid material to the solvent.