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Apparatus and method for controlling the use of carbon dioxide in dry cleaning clothes 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • D06F-043/08
  • G01F-023/284
출원번호 US-0143397 (1998-08-28)
발명자 / 주소
  • Shore Stephen H.
  • Rosio Larry R.
출원인 / 주소
  • Snap-Tite Technologies, Inc.
대리인 / 주소
    Woodling, Krost & Rust
인용정보 피인용 횟수 : 44  인용 특허 : 7

초록

An apparatus and method for controlling the use of carbon dioxide in drying cleaning clothes, garments and other fabrics is disclosed and claimed. The components of the invention include a distillation vessel, a compressor, a warm-up vessel, a cleaning chamber, a condenser, and a carbon dioxide stor

대표청구항

[ We claim:] [6.] An apparatus for reclaiming gaseous carbon dioxide from a cleaning chamber employing carbon dioxide to launder clothes, garments or fabrics comprising:a compressor;a condenser;a storage tank;said compressor compressing said gaseous carbon dioxide;said condenser condensing said comp

이 특허에 인용된 특허 (7)

  1. Waring James P. (Rockville MD) Smith Robert D. (Bethesda MD), Apparatus for and method of determining the liquid coolant level in a nuclear reactor.
  2. Jureller Sharon Harriott (Haworth NJ) Kerschner Judith Lynne (Ridgewood NJ) Bae-Lee Myongsuk (Montville NJ) Del Pizzo Lisa (Bloomfield NJ) Harris Rosemarie (Yonkers NY) Resch Carol (Rutherford NJ) Wa, Dry cleaning system using densified carbon dioxide and a surfactant adjunct.
  3. Dewees Thomas G. (Pleasanton CA) Knafelc Frank M. (Lafayette CA) Mitchell James D. (Alamo CA) Taylor R. Gregory (Pleasanton CA) Iliff Robert J. (Oakley CA) Carty Daniel T. (Danville CA) Latham James , Liquid/supercritical carbon dioxide dry cleaning system.
  4. Ara Katsuyuki (Ibaraki JPX) Wakayama Naoaki (Ibaraki JPX) Kobayashi Kazuo (Hitachi JPX) Ogasawara Toshihiko (Ibaraki JPX), Method and apparatus for sensing liquid level.
  5. McQueen Malcolm M. (Fallbrook CA), Method of sensing fluid flow and level employing a heated extended resistance temperature sensor.
  6. Lee Ron C. (Bloomsbury NJ), Point level detector.
  7. Chao Sidney C. ; Purer Edna M., Solvent resupply method for use with a carbon dioxide cleaning system.

이 특허를 인용한 특허 (44)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Brainard, David E.; McClain, James B.; Cole, Michael E.; Worm, Steve L., Apparatus and methods for conserving vapor in a carbon dioxide dry cleaning system.
  3. Jur, Jesse Stephen; McCullough, Kenneth J.; Moreau, Wayne Martin; Simons, John Patrick; Taft, Charles Jesse, Apparatus and process for supercritical carbon dioxide phase processing.
  4. Jur, Jesse Stephen; McCullough, Kenneth J.; Moreau, Wayne Martin; Simons, John Patrick; Taft, Charles Jesse, Apparatus and process for supercritical carbon dioxide phase processing.
  5. Brainard, David E.; McClain, James B.; Cole, Michael E.; Worm, Steve L., Apparatus for conserving vapor in a carbon dioxide dry cleaning system.
  6. Brainard, David E.; McClain, James B.; Cole, Michael E.; Worm, Steve L., Apparatus for conserving vapor in a carbon dioxide dry cleaning system.
  7. Marshall, Mary C.; Franjione, John G.; Freitas, Christopher J.; Roberds, William T.; Pollard, Gordon D.; Blake, Jill, Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature.
  8. Kleker,Richard G., Apparatus for processing garments including a water and air system.
  9. Kleker,Richard George, Apparatus for washing and drying garments.
  10. A. Duane Preston ; Jon R. Turner ; Charles Svoboda, Carbon dioxide dry cleaning system.
  11. Preston, A. Duane; Turner, Jon R.; Svoboda, Charles, Carbon dioxide dry cleaning system.
  12. James B. McClain ; Gary Schrebe ; Kenneth Grakauskas ; Timothy J. Romack, Cleaning apparatus.
  13. McClain James B. ; Schrebe Gary ; Grakauskas Kenneth ; Romack Timothy J., Cleaning apparatus.
  14. McClain James B. ; Schrebe Gary ; Grakauskas Kenneth ; Romack Timothy J., Cleaning apparatus.
  15. McClain James B. ; Schrebe Gary ; Grakauskas Kenneth ; Romack Timothy J., Cleaning apparatus.
  16. McClain James B. ; Schrebe Gary ; Grakauskas Kenneth ; Romack Timothy J., Cleaning apparatus.
  17. Worm,Steve Lee; McClain,James B., Cleaning apparatus having multiple wash tanks for carbon dioxide dry cleaning and methods of using same.
  18. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  19. DeYoung, James P.; Romack, Timothy J.; McClain, James B., Detergent injection methods for carbon dioxide cleaning apparatus.
  20. DeYoung,James P.; McClain,James B.; Gross,Stephen M., Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems.
  21. DeYoung James P. ; Romack Timothy J. ; McClain James B., Detergent injection systems for carbon dioxide cleaning apparatus.
  22. DeYoung James P. ; Romack Timothy J. ; McClain James B., Detergent injection systems for carbon dioxide cleaning apparatus.
  23. James P. DeYoung ; Timothy J. Romack ; James B. McClain, Detergent injection systems for carbon dioxide cleaning apparatus.
  24. Lindqvist Kenneth,SEX ; Svensson Orvar,SEX, Fluid based cleaning method and system.
  25. Lindqvist Kenneth,SEX ; Svensson Orvar,SEX, Fluid based cleaning method and system.
  26. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  27. Leitch, Kelly; Silveira, Danny, High pressure CO2 purification and supply system.
  28. Leitch,Kelly; Silveira,Danny, High pressure COpurification and supply system.
  29. Jones, William D., High pressure fourier transform infrared cell.
  30. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  31. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  32. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  33. James B. McClain ; Gary C. Schrebe, Internal motor drive liquid carbon dioxide agitation system.
  34. Andrew F. Kegler ; Gregory L. Malchow ; Stephen L. Harris, Liquified gas dry-cleaning machine with convertible installation configuration.
  35. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  36. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  37. David E. Brainard ; James B. McClain ; Michael E. Cole ; Steve L. Worm, Methods and apparatus for conserving vapor and collecting liquid carbon dioxide for carbon dioxide dry cleaning.
  38. McClain James B. ; Romack Timothy J. ; DeYoung James P. ; Lienhart R. Bradley ; DeSimone Joseph M. ; Huggins Kenneth L., Methods for carbon dioxide dry cleaning with integrated distribution.
  39. McClain James B. ; Romack Timothy J. ; DeYoung James P. ; Lienhart R. Bradley ; DeSimone Joseph M. ; Huggins Kenneth L., Methods for carbon dioxide dry cleaning with integrated distribution.
  40. Worm, Steve Lee; McClain, James B., Methods of coating articles using a densified coating system.
  41. Wuester,Christopher D., Process flow thermocouple.
  42. McClain, James B.; Cole, Michael E., Pumpless carbon dioxide dry cleaning system.
  43. McClain James B. ; Brainard David E. ; Cole Michael E. ; Worm Steve L., System for the control of a carbon dioxide cleaning apparatus.
  44. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
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