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특허 상세정보

Sub-wavelength aperture arrays with enhanced light transmission

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) H01J-003/14   
미국특허분류(USC) 250/216 ; 250/306
출원번호 US-0979432 (1997-11-26)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Feig
인용정보 피인용 횟수 : 127  인용 특허 : 12
초록

A metallic film has apertures located therein in an array arranged in a pattern so that when light is incident on the apertures, surface plasmons on the metallic film are perturbed resulting in an enhanced transmission of the light emitted from individual apertures in the array. The aperture array is used: to filter light of predetermined wavelength traversing the apertures, to collect light over a distance after traversing the apertures, to improve operation of near-field scanning optical microscopes, and to enhance light transmission through masks usea...

대표
청구항

[ What is claimed is:] [1.] An apparatus for enhanced light transmission comprising:a metallic film; andan array of apertures in said film;said apertures in the array being spaced apart by a distance P, where P is selected dependent upon the wavelength of light incident on said array whereby incident light at a predetermined wavelength will perturb the metallic film in a surface plasmon energy band for enhancing transmission of light through individual apertures in said array.

이 특허에 인용된 특허 (12)

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