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Apparatus for substrate holding 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05C-013/00
출원번호 US-0789764 (1997-01-28)
우선권정보 JP-0014446 (1996-01-30)
발명자 / 주소
  • Ikeda Masahide,JPX
  • Ohtani Masami,JPX
출원인 / 주소
  • Dainippon Screen Mfg, Co., Ltd., JPX
대리인 / 주소
    Ostrolenk, Faber, Gerb & Soffen, LLP
인용정보 피인용 횟수 : 94  인용 특허 : 1

초록

A substrate holding apparatus holds a rotating substrate without idly rotating the substrate and keeps the substrate in proper balance while the substrate is rotated. In a revolvable holding member, a column-shaped holding part is disposed on a top surface of a column-shaped supporting part, at an e

대표청구항

[ We claim:] [1.] An apparatus for holding a substrate, which is used in a unit for processing said substrate by rotating said substrate, said apparatus comprising:a) a rotational stage for rotating around a first axis;b) fixed holding means for restricting a position of said substrate by being in c

이 특허에 인용된 특허 (1)

  1. Yoshioka Katsushi (Kyoto JPX) Nakagawa Koji (Kyoto JPX) Itaba Masayuki (Kyoto JPX) Hiraoka Nobuyasu (Kyoto JPX) Takeoka Masafumi (Kyoto JPX), Device for holding and rotating a substrate.

이 특허를 인용한 특허 (94)

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