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Apparatus for cleaning and testing precision components of hard drives and the like 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-006/00
출원번호 US-0805510 (1997-02-26)
발명자 / 주소
  • Brandt Werner V.
  • Bowers Charles W.
출원인 / 주소
  • Eco-Snow Systems, Inc.
대리인 / 주소
    Armstrong
인용정보 피인용 횟수 : 28  인용 특허 : 14

초록

Apparatus for cleaning, assembling, testing and inspecting contamination sensitive hardware. The apparatus includes an environmental process enclosure having an inner processing chamber, and a carbon dioxide jet spray cleaning system. The enclosure includes a loadlock pass-through having front and r

대표청구항

[ What is claimed is:] [1.] An apparatus for use with contamination sensitive hardware, said apparatus comprising:an environmental process enclosure having an inner processing chamber;a loadlock pass-through communicating with said enclosure, said loadlock pass-through having front and rear access d

이 특허에 인용된 특허 (14)

  1. Whitlock Walter H. (Peapack NJ) Weltmer ; Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ), Apparatus and method for removing minute particles from a substrate.
  2. McDermott Wayne T. (Allentown PA) Wu Jin J. (Ossining NY) Ockovic Richard C. (Northampton PA), Apparatus to clean solid surfaces using a cryogenic aerosol.
  3. Swain Eugene A. (Webster NY) Carter Stephen R. (Tucson AZ) Hoenig Stuart A. (Tucson AZ), Carbon dioxide snow agglomeration and acceleration.
  4. Bowers Charles W., Electrostatic discharge protection of static sensitive devices cleaned with carbon dioxide spray.
  5. Krone-Schmidt Wilfried (Fullerton CA) Markle James R. (Palm Harbor FL), Environment control apparatus.
  6. Mauze Ganapati R. ; Hopkins ; II George W. ; Simons Tad Decatur, Gas analyzer with arrangement for spray-cleaning optical element.
  7. Bowers Charles W., Integrated circuit chip module cleaning using a carbon dioxide jet spray.
  8. Shortes Samuel R. (Plano TX) Millis Edwin Graham (Dallas TX), Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water.
  9. Bowers Charles W., Photoresist and redeposition removal using carbon dioxide jet spray.
  10. Heyns Garrett J. (Boulder CO) McClure Terry R. (Kersey CO) Nicholl Hugh (Berthoud CO) Read Peter H. (Morrisville PA) Schulte Steven M. (Westminster CO) Tabrizi Mohammad F. (Westminster CO), Probemat cleaning system using CO2 pellets.
  11. Menon Venugopal B. (Austin TX), Submicron particle removal using liquid nitrogen.
  12. Peterson Ronald V. (Thousand Oaks CA) Krone-Schmidt Wilfried (Fullerton CA), System for precision cleaning by jet spray.
  13. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), System for surface and fluid cleaning.
  14. Bowers Charles W., Wafer cassette cleaning using carbon dioxide jet spray.

이 특허를 인용한 특허 (28)

  1. Furusawa Masami,JPX ; Harano Riichiro,JPX, Apparatus and method for cleaning substrate.
  2. Rajiv S. Agarwala ; Cynthia A. Johnson, Apparatus and method for removing a label from a surface with a chilled medium.
  3. Lewis, Paul E.; Ahmadi, Goodarz; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Apparatus for cleaning surfaces substantially free of contaminants.
  4. Joseph M. DeSimone ; Ruben G. Carbonell, Apparatus for liquid carbon dioxide systems.
  5. Jackson,David P, Apparatus process and method for mounting and treating a substrate.
  6. Jackson,David P., Apparatus to treat and inspect a substrate.
  7. Endisch, Denis H., Edge bead removal for spin-on materials containing low volatility solvents fusing carbon dioxide cleaning.
  8. Tan, Huynh P.; Boynton, Rudy C.; Henry, Paul H., Hard drive particle cleaning system and method.
  9. Kamikawa, Yuji; Egashira, Koji, Liquid processing apparatus.
  10. Banerjee, Souvik; Chung, Harlan Forrest, Liquid-assisted cryogenic cleaning.
  11. Banerjee,Souvik; Chung,Harlan Forrest, Liquid-assisted cryogenic cleaning.
  12. Summers, David Archibold; Woelk, Klaus Hubert; Oglesby, Kenneth Doyle; Galecki, Grzegorz, Method and apparatus for jet-assisted drilling or cutting.
  13. Summers, David Archibold; Woelk, Klaus Hubert; Oglesby, Kenneth Doyle; Galecki, Grzegorz, Method and apparatus for jet-assisted drilling or cutting.
  14. Takayoshi Kawamoto JP; Norio Kimura JP; Hozumi Yasuda JP; Hiroshi Yoshida JP, Method and apparatus for polishing.
  15. Hiraishi, Masafumi; Kondo, Masataka; Yamagishi, Hideo; Hayashi, Katsuhiko; Okatsu, Toshihide, Method for cleaning photovoltaic module and cleaning apparatus.
  16. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants.
  17. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide.
  18. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
  19. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
  20. Boumerzoug, Mohamed; Tannous, Adel George; Makhamreh, Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  21. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  22. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  23. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  24. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  25. DeSimone Joseph M. ; Carbonell Ruben G., Methods of spin cleaning substrates using carbon dioxide liquid.
  26. Joseph M. DeSimone ; Ruben G. Carbonell, Spin cleaning methods.
  27. Yao, Yi Zhao; Hu, Hui Yan; Liu, Shaoyong; Seng, Kelvin Ang Kor; Stone, Garvin J.; Whitney, Gina M., System and method for using a spray/liquid particle count (LPC) to measure particulate contamination.
  28. Brenda Gail Quilling ; Jeffrey Scott Hamelink, Universal optical disk automated cleaner-inspector.
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