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Method for the manufacture of quantum structures, in particular quantum dots and tunnel barriers as well as components w 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/335
  • H01L-021/778
출원번호 US-0665807 (1996-06-19)
우선권정보 DE-0022351 (1995-06-20)
발명자 / 주소
  • Dilger Markus,DEX
  • Eberl Karl,DEX
  • Haug Rolf,DEX
  • v. Klitzing Klaus,DEX
출원인 / 주소
  • Max-Planck-Geselleschaft Zur, DEX
대리인 / 주소
    Townsend and Townsend and Crew LLP
인용정보 피인용 횟수 : 29  인용 특허 : 9

초록

A method of manufacturing quantum structures, in particular quantum dots and tunnel barriers and also a component with such quantum structures wherein in that a substrate is structured by the intentional formation of trenches so that material remains between oppositely disposed trench sections, with

대표청구항

[ What is claimed is:] [1.] A method of manufacturing quantum structures, in particular quantum dots and tunnel barriers wherein a substrate is structured by the intentional formation of trenches so that material remains between oppositely disposed trench sections, with a transition from a broader r

이 특허에 인용된 특허 (9)

  1. Kim Sung-Bock,KRX ; Ro Jeong-Rae,KRX ; Lee El-Hang,KRX, Crystal growth method for compound semiconductor.
  2. Fitjer Holger (Ansbach DEX), Dental brush holding device.
  3. Min Suk-Ki,KRX ; Kim Eun Kyu,KRX, Fabrication method for high-output quantum wire array diode structure.
  4. Biegelsen David K. (Portola Valley CA) Sheridon Nicholas K. (Los Altos CA) Johnson Noble M. (Menlo Park CA), Fabrication of quantum confinement semiconductor light-emitting devices.
  5. Gossner Harald,DEX ; Eisele Ignaz,DEX ; Risch Lothar,DEX ; Hammerl Erwin, Microelectronic component and process for its production.
  6. Sakuma Yoshiki (Kawasaki JPX), Quantum semiconductor device with triangular etch pit.
  7. Paell Thomas L. (Los Altos CA) Epler John E. (Zurich CHX), Quantum wire fabrication via photo induced evaporation enhancement during in situ epitaxial growth.
  8. Patel Nalin K. (Cambridge GBX) Burroughes Jeremy H. (Cambridge GBX), Semiconductor device and method for its manufacture.
  9. Dennison Charles H. ; Marr Ken, Semiconductor processing method of forming a static random access memory cell and static random access memory cell.

이 특허를 인용한 특허 (29)

  1. Vossmeyer,Tobias; Tomita,Hidemi, Chemical sensor arrangement.
  2. Forbes, Leonard; Ahn, Kie Y., Dynamic memory based on single electron storage.
  3. Forbes, Leonard; Ahn, Kie Y., Dynamic memory based on single electron storage.
  4. Lundskog, Anders; Hsu, Chih-Wei; Karlsson, Fredrik, Group-III nitride structure.
  5. Dahl,Jeremy E.; Carlson,Robert M.; Liu,Shenggao, Heterodiamondoid-containing field emission devices.
  6. Liu, Shenggao; Carlson, Robert M.; Dahl, Jeremy E., Heterodiamondoids.
  7. Liu, Shenggao; Carlson, Robert M.; Dahl, Jeremy E., Heterodiamondoids.
  8. Liu, Shenggao; Carlson, Robert M.; Dahl, Jeremy E., Heterodiamondoids.
  9. Liu,Shenggao; Carlson,Robert M.; Dahl,Jeremy E., Heterodiamondoids.
  10. Gilliland, Guy D.; Lin, Ming-Chang, Holographic, laser-induced fabrication of indium nitride quantum wires and quantum dots.
  11. Majima, Yutaka; Teranishi, Toshiharu; Matsumoto, Kazuhiko; Maehashi, Kenzo; Susaki, Tomofumi; Ohno, Yasuhide; Matsuzaki, Kosuke; Hackenberger, Guillaume Hubert Frederic, Logical operation element.
  12. Smith, Christine A.; Lee, Howard W. H., Material system for tailorable white light emission and method for making thereof.
  13. Peterson, Jeffrey J.; Hunt, Charles E., Method for co-fabricating strained and relaxed crystalline and poly-crystalline structures.
  14. Byung Gook Park KR; Dae Hwan Kim KR, Method for fabricating single electron transistor.
  15. Park Byung Gook,KRX ; Kim Dae Hwan,KRX, Method for fabricating single electron transistor.
  16. Bensahel, Daniel-Camille; Morand, Yves, Method of fabricating a device with a concentration gradient and the corresponding device.
  17. Bensahel, Daniel-Camille; Morand, Yves, Method of fabricating a device with a concentration gradient and the corresponding device.
  18. Brousseau, III, Louis C., Methods for fabricating nanopores for single-electron devices.
  19. Linthicum, Kevin J.; Gehrke, Thomas; Davis, Robert F., Methods of fabricating gallium nitride semiconductor layers on substrates including non-gallium nitride posts.
  20. Brousseau, III, Louis C., Methods of fabricating single electron transistors in which the thickness of an insulating layer defines spacing between electrodes.
  21. Komiyama, Susumu; Oleg, Astafiev; Vladimir, Antonov; Hirai, Hiroshi; Kutsuwa, Takeshi, Millimeter wave and far-infrared detector.
  22. Beach,Robert, Non-planar III-nitride power device having a lateral conduction path.
  23. Lui,Basil, Semiconductor device simulation method and simulator.
  24. John H. Jefferson GB; Timothy J. Phillips GB, Single charge carrier transistor, method of holding a charge carrier within a quantum dot, and method of detection.
  25. Louis C. Brousseau, III, Single electron transistors in which the thickness of an insulating layer defines spacing between electrodes.
  26. Brousseau, III, Louis C., Single-electron transistors and fabrication methods in which a projecting feature defines spacing between electrodes.
  27. Liu, Jin Ping; See, Alex K H; Zhou, Mei Sheng; Hsia, Liang Choo, Strained channel transistor structure and method.
  28. Liu, Jin Ping; See, Alex K H; Zhou, Mei Sheng; Hsia, Liang Choo, Strained channel transistor structure and method.
  29. Eskra, Jennifer; Geddes, Pamela A.; Harrison, Daniel J.; Jalbert, Claire A.; Marginean, Barry L.; Przybylo, John, Thermal transfer ribbon.
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