초록 ▼

A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site

A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

대표청구항 ▼

[ What is claimed is:] [1.] A gas panel for handling plural process gases, comprising:a plurality of one-piece manifold bodies, each of said manifold bodies having thereon at least three identical component receiving stations, each of said component receiving stations having a gas inlet and a gas ou

[ What is claimed is:] [1.] A gas panel for handling plural process gases, comprising:a plurality of one-piece manifold bodies, each of said manifold bodies having thereon at least three identical component receiving stations, each of said component receiving stations having a gas inlet and a gas outlet, the gas outlet from a first component receiving station of the plurality being connected by a permanent connection within the manifold to a gas inlet to a neighboring component receiving station;a plurality of gas components, each of said gas components being connected to a respective receiving station on one of the manifold blocks, said gas components comprising at least one valve and at least one mass flow controller.