$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Combined emissivity and radiance measurement for determination of temperature of radiant object 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01J-005/08
  • G01J-005/62
  • G01N-025/00
출원번호 US-0040045 (1998-03-17)
발명자 / 주소
  • O'Neill James Anthony
  • Singh Jyothi
출원인 / 주소
  • International Business Machines Corporation
대리인 / 주소
    Mortinger
인용정보 피인용 횟수 : 30  인용 특허 : 10

초록

A system and method of measurement of emissivity and radiance of a wafer in a rapid thermal processing chamber enables determination of wafer temperature and control of temperature of the wafer. Mirrors enclose the chamber and reflect radiation from lamps within the chamber to heat the workpiece of

대표청구항

[ What is claimed is:] [1.] A system for measuring thermal characteristics of a radiant object, the thermal characteristics including radiance of the radiant object, comprising:a detector of radiant energy emitted by said object, said detector being positioned for receipt of radiant energy propagati

이 특허에 인용된 특허 (10)

  1. Markham James R. (Middlefield CT) Morrison ; Jr. Philip W. (South Windsor CT) Solomon Peter R. (West Hartford CT) Best Philip E. (Mansfield Center CT), Apparatus and method for determining high temperature surface emissivity through reflectance and radiance measurements.
  2. Gat Arnon (Palo Alto CA) French Michael (San Jose CA), Bichannel radiation detection apparatus.
  3. O'Neill James Anthony ; Singh Jyothi, Combined emissivity and radiance measurement for the determination of the temperature of a radiant object.
  4. Nulman Jaim (Palo Alto CA) Bacile Nick J. (San Jose CA) Blonigan Wendell T. (Sunnyvale CA), Emissivity correction apparatus and method.
  5. Nakos James S. (Essex VT) Bakeman ; Jr. Paul E. (South Burlington VT) Hallock Dale P. (Bristol VT) Lasky Jerome B. (Essex Junction VT) Pennington Scott L. (South Burlington VT), Emissivity independent temperature measurement systems.
  6. Stein Alexander (Secaucus NJ) Rabinowitz Paul (Old Bethpage NY) Kaldor Andrew (Watchung NJ), Laser radiometer.
  7. Krishnan Shankar (Arlington Heights IL) Hansen George P. (Austin TX) Hauge Robert H. (Houston TX) Margrave John L. (Houston TX) Rey Charles A. (Riverwoods IL), Method and apparatus to simultaneously measure emissivities and thermodynamic temperatures of remote objects.
  8. Moslehi Mehrdad M. (Dallas TX) Najm Habib N. (Dallas TX), Multi-point pyrometry with real-time surface emissivity compensation.
  9. Moslehi Mehrdad M. (Dallas TX) Najm Habib N. (Dallas TX), Multi-point pyrometry with real-time surface emissivity compensation.
  10. Lee Yong J. (Richardson TX) Moslehi Mehrdad M. (Dallas TX), Multi-zone real-time emissivity correction system.

이 특허를 인용한 특허 (30)

  1. Ish-Shalom Yaron,ILX ; Baharav Yael, Active pyrometry with emissivity extrapolation and compensation.
  2. Ramachandran, Balasubramanian; Jallepally, Ravi; Boas, Ryan C.; Ramamurthy, Sundar; Al-Bayati, Amir; Graoui, Houda; Spear, Joseph M., Advances in spike anneal processes for ultra shallow junctions.
  3. Camm,David Malcolm; Bumbulovic,Mladen; Cibere,Joseph; Elliott,J. Kiefer; McCoy,Steve; Stuart,Greg, Apparatuses and methods for suppressing thermally-induced motion of a workpiece.
  4. Adams, Bruce; Hunter, Aaron, Black reflector plate.
  5. Lee, Yong Jin; Moslehi, Mehrdad M.; Kamali, Jalil; Belikov, Sergey, High-performance energy transfer method for thermal processing applications.
  6. Whipple ; III Walter ; Alley Robert Philbrick ; Bonissone Piero Patrone ; Dausch Mark Edward ; Badami Vivek Venugopal, Infrared non-contact temperature measurement for household appliances.
  7. Reuschel, Jens Dietmar; Schmitz, Christoph, Lighting device with animated sequential light for a motor vehicle.
  8. Koelmel, Blake; Mayur, Abhilash J., Method and apparatus for detecting the substrate temperature in a laser anneal system.
  9. Lerch, Wilfried; Hauf, Markus, Method and device for calibrating measurements of temperatures independent of emissivity.
  10. Yasuda, Yoichiro; Tsukamoto, Toshiyuki; Sanaka, Masamori; Asechi, Hiroshi; Ogura, Atsuhiro, Method of determining thermal property of substrate and method of deciding heat treatment condition.
  11. Raum, Klaus; Fella, Hans, Method of measuring ambient temperature and a temperature measurement arrangement.
  12. Palfenier, Ronald A.; Nystrom, Patrick J., Method of optical pyrometry that is independent of emissivity and radiation transmission losses.
  13. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.
  14. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.
  15. Lee, Fu-Su; Chang, Juin-Jie; Lu, Ching-Shan, RTA chamber with in situ reflective index monitor.
  16. Ryan, Robert, Radiant temperature nulling radiometer.
  17. Palfenier, Ronald A.; Nystrom, Patrick J., Radiometric temperature measurement system.
  18. Palfenier, Ronald A.; Nystrom, Patrick J., Radiometric temperature measurement system.
  19. Kubo, Tomohiro, Rapid thermal processing apparatus and method of manufacture of semiconductor device.
  20. Camm David Malcolm,CAX ; Lefrancois Marcel Edmond,CAX ; Hickson Brendon James,CAX, Spatially resolved temperature measurement and irradiance control.
  21. Camm, David Malcolm; Lefrancois, Marcel Edmond; Hickson, Brendon James, Spatially resolved temperature measurement and irradiance control.
  22. Jennings,Dean; Ranish,Joseph M.; Haas,Brian; Balakrishna,Ajit; Ramamurthy,Sundar; Hunter,Aaron; Yam,Mark, Stepped reflector plate.
  23. Barron, Jr., William R.; Larrick, Thomas, System and method for non-contact temperature sensing.
  24. Jeffrey P. Hebb ; Ali Shajii, System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing.
  25. Hebb Jeffrey P. ; Shajii Ali, System and method for the real time determination of the in situ emissivity of a workpiece during processing.
  26. Camm, David Malcolm; Cibere, Joseph; Bumbulovic, Mladen, Systems and methods for supporting a workpiece during heat-treating.
  27. Ralph A. Felice, Temperature determining device and process.
  28. Camm,David M.; Kervin,Shawna; Lefrancois,Marcel Edmond; Stuart,Greg, Temperature measurement and heat-treating methods and system.
  29. Camm, David M.; Kervin, Shawna; Lefrancois, Marcel Edmond; Stuart, Greg, Temperature measurement and heat-treating methods and systems.
  30. Camm, David Malcolm; Cibere, Joseph; Stuart, Greg; McCoy, Steve, Workpiece breakage prevention method and apparatus.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로