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Fabrication method and structure for multilayer optical anti-reflection coating, and optical component and optical syste 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-005/06
출원번호 US-0858801 (1997-05-19)
발명자 / 주소
  • Nagatsuka Jun
출원인 / 주소
  • Nikon Corporation, JPX
대리인 / 주소
    Skjerven, Morrill, MacPherson, Franklin & Friel LLPKlivans
인용정보 피인용 횟수 : 34  인용 특허 : 15

초록

An optical anti-reflection coating having multiple layers, where at least some of the layers are formed by a dry coating process and other layers are formed by a wet coating process. This combination of different types of anti-reflection layers provides superior performance in terms of low reflectan

대표청구항

[ What is claimed is:] [1.] A method for forming an optical anti-reflection coating onto a substrate, comprising the acts of:forming an anti-reflection layer of a first material over the substrate using a dry process; andforming a second anti-reflection layer of a second material overlying the first

이 특허에 인용된 특허 (15)

  1. Ichikawa Hajime (Tokyo JPX), Anti-reflection coating for optical component and method for forming the same.
  2. Hatano Takuji (Sakai JPX) Fukumoto Mariko (Osaka JPX), Antireflection coating for infrared light.
  3. Austin R. Russel (Novato CA), Antireflection layer system with integral UV blocking properties.
  4. Tsai Rung-Ywan (Kaohsiung TWX) Ho Fang-Chuan (Hsinchu TWX), High endurance near-infrared optical window.
  5. Seo Kang-Il (Seoul KRX) Jang Dong-Sik (Kyungki-Do KRX) Kim Heon-Soo (Seoul KRX) Jeong Su-Min (Kyungki-Do KRX), Method for preparing anti-reflective coating for display devices.
  6. Tani Hakuzo (Sakai JPX), Multi-layer anti-reflection coating.
  7. Hatano Takuji (Osaka JPX), Multi-layered coating for optical part comprising YF3 layer.
  8. Tong Hua-Sou (Arlington Heights IL) Hu Chun-Min (Keelung TWX), Multilayer antireflective coating for video display panel.
  9. Tong Hua-Sou (Arlington Heights IL) Hu Chung-Min (Taiwan CNX) Hsu Mi-Yui (Taiwan CNX), Multilayer antistatic/antireflective coating for display device.
  10. van der Werf Pieter (Eindhoven NLX) Haisma Jan (Eindhoven NLX), Optical element comprising a transparent substrate and an antireflection coating for the near-infrared region of wavelen.
  11. Kraatz Paul (Redondo Beach CA) Rowe James M. (Torrance CA) Tully John W. (Palos Verdes Estates CA) Biricik Vahram W. (Palos Verdes Estates CA) Thompson Wesley J. (Torrance CA) Modster Rudolph W. (Los, Optically transparent electrically conductive semiconductor windows and methods of manufacture.
  12. Lange Roger W. (Maplewood MN) Sowman Harold G. (Stillwater MN) Kang Soon-Kun (Oakdale MN), Silica coating.
  13. Belmares Hector (Petaluma CA), Solution-applied antireflective coatings.
  14. Belmares Hector (Santa Rosa CA), Two-layer antireflective coating applied in solution.
  15. Hashimoto Shigeru (Yokohama JPX) Yokoyama Akihiko (Yokohama JPX), Two-wavelength antireflection film.

이 특허를 인용한 특허 (34)

  1. Tamada, Takaaki; Sasaki, Naohito; Nakayama, Hiroyuki, Anti-reflection coating and optical member comprising same.
  2. Tanaka,Issei; Murata,Tsuyoshi, Anti-reflection coating, and optical element and optical system with anti-reflection coating.
  3. Jau-Jier Chu TW; Jau-Sung Lee TW, Anti-reflection high conductivity multi-layer coating on CRT surface made by vacuum sputtering and wet coating.
  4. Kanazawa, Hidehiro; Ando, Kenji; Teranishi, Koji, Antireflection film and optical element having the same.
  5. Kanazawa,Hidehiro; Ando,Kenji; Teranishi,Koji, Antireflection film and optical element having the same.
  6. Kalyankar, Nikhil; Blacker, Richard; Le, Minh Huu; Lewis, Mark; Liang, Liang, Antireflective coatings with gradation and methods for forming the same.
  7. Epple, Alexander; Kamenov, Vladimir; Gruner, Toralf; Schicketanz, Thomas, Catadioptric projection objective.
  8. Epple, Alexander; Kamenov, Vladimir; Gruner, Toralf; Schicketanz, Thomas, Catadioptric projection objective.
  9. Epple, Alexander; Kamenov, Vladimir; Gruner, Toralf; Schicketanz, Thomas, Catadioptric projection objective.
  10. Epple, Alexander; Kamenov, Vladimir; Gruner, Toralf; Schicketanz, Thomas, Catadioptric projection objective.
  11. Epple, Alexander; Kamenov, Vladimir; Gruner, Toralf; Schicketanz, Thomas, Catadioptric projection objective.
  12. Pike, Randy T.; Adkins, Calvin Lee; Bryant, Charles E., Electro-optical component including a fluorinated poly(phenylene ether ketone) protective coating and related methods.
  13. Loopstra, Erik Roelof; Baselmans, Johannes Jacobus Matheus; Dierichs, Marcel Mathijs Theodore Marie; Jasper, Johannes Christiaan Maria; Meijer, Hendricus Johannes Maria; Mickan, Uwe; Mulkens, Johannes Catharinus Hubertus; Lipson, Matthew; Utterdijk, Tammo, Lithographic apparatus and device manufacturing method.
  14. Ishizawa, Hitoshi; Murata, Tsuyoshi, Method for forming optical thin film and optical element provided with optical thin film.
  15. Nakayama, Hiroyuki; Yamada, Kazuhiro; Sakai, Yasuhiro; Yamada, Maki, Method for producing silica aerogel coating.
  16. Cado, Herve; De Ayguavives, Francisco; Pophillat, Olivier, Optical article comprising an antireflective coating with a low reflection both in the ultraviolet region and in the visible region.
  17. Cado, Hervé; De Ayguavives, Francisco; Pophillat, Olivier, Optical article comprising an antireflective coating with a low reflection both in the ultraviolet region and in the visible region.
  18. Shklover, Vitaliy; Schall, Michael; Kraus, Johannes; Gloeckl, Oliver; Erxmeyer, Jeffrey; Feldermann, Horst; Forcht, Konstantin; Heinemeyer, Ute, Optical element.
  19. Shirai, Takeshi; Kokubun, Takao; Ishizawa, Hitoshi; Murakami, Atsunobu, Optical element and exposure apparatus.
  20. Shirai, Takeshi; Kokubun, Takao; Ishizawa, Hitoshi; Murakami, Atsunobu, Optical element and exposure apparatus.
  21. Shirai, Takeshi; Kokubun, Takao; Ishizawa, Hitoshi; Murakami, Atsunobu, Optical element and exposure apparatus.
  22. Shirai, Takeshi; Kokubun, Takao; Ishizawa, Hitoshi; Murakami, Atsunobu, Optical element and exposure apparatus.
  23. Shirai, Takeshi; Kokubun, Takao; Ishizawa, Hitoshi; Murakami, Atsunobu, Optical element and exposure apparatus.
  24. Shirai, Takeshi; Kokubun, Takao; Ishizawa, Hitoshi; Murakami, Atsunobu, Optical element and exposure apparatus.
  25. Shirai, Takeshi, Optical element and projection exposure apparatus based on use of the optical element.
  26. Shirai, Takeshi, Optical element and projection exposure apparatus based on use of the optical element.
  27. Kanazawa,Hidehiro; Ando,Kenji; Teranishi,Koji, Optical element with antireflection film.
  28. Murata, Tsuyoshi; Ishizawa, Hitoshi, Optical element with multilayer thin film and exposure apparatus with the element.
  29. Ishizawa, Hitoshi; Niisaka, Shunsuke; Murata, Tsuyoshi, Optical system having optical thin film including amorphous silicon oxide-based binder.
  30. Tanaka,Issei, Optical system with anti-reflection coating.
  31. Weissenrieder,Karl Stefan; Hirnet,Alexander; Pazidis,Alexandra; Schuster,Karl Heinz; Zaczek,Christoph; Lill,Michael; Scheible, legal representative,Guenter; Schink,Harald; Brotsack,Markus; Loering,Ulrich; Gruner,Toralf; Scheible,Patrick, Projection objective for immersion lithography.
  32. Joseph M. Fukumoto ; Cheng-Chih Tsai, Shaping optic for diode light sheets.
  33. Nakayama, Hiroyuki; Yamada, Kazuhiro; Sakai, Yasuhiro; Yamada, Maki, Silica aerogel coating and its production method.
  34. Fukui, Toshiharu; Nakanishi, Akira; Moroi, Hiroshi; Katsuragawa, Jun, Transparent board with conductive multi-layer antireflection films, transparent touch panel using this transparent board with multi-layer antireflection films, and electronic equipment with this tran.
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