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Microfabrication of cantilevers using sacrificial templates 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-007/34
출원번호 US-0020816 (1998-02-09)
발명자 / 주소
  • Viani Mario B.
  • Hansma Paul
  • Chand Ami
  • Wendman Mark A.
  • Morrett Hal J.
출원인 / 주소
  • The Regents of the University of California
대리인 / 주소
    Fulbright & Jaworski
인용정보 피인용 횟수 : 60  인용 특허 : 3

초록

A sacrificial cantilever is used as a template for making cantilevers of non-standard materials for use in an atomic force microscope. The desired metal is deposited onto the sacrificial cantilever, followed by removal of the sacrificial cantilever.

대표청구항

[ We claim:] [1.] A method for fabricating at least one cantilever for an atomic force microscope formed of a first material, comprising:forming a structure integral with a chip having an outer surface, at least a portion thereof being in the desired shape of said cantilever and serving as a sacrifi

이 특허에 인용된 특허 (3)

  1. Matsuyama Katsuhiro,JPX, Cantilever chip.
  2. Miyazaki Toshihiko (Hiratsuka JPX) Nose Hiroyasu (Zama JPX) Kuroda Ryo (Machida JPX) Kawase Toshimitsu (Atsugi JPX) Shinjo Katsuhiko (Isehara JPX), Micro-displacement type information detection probe device and scanning tunneling microscope, atomic force microscope, i.
  3. Buser Rudolf A. (Neuchatel CHX) Brugger Juergen (Neuchatel CHX) Linder Christian (Neuchatel CHX), Microprobe for surface-scanning microscopes.

이 특허를 인용한 특허 (60)

  1. Hoh,Jan H., AFM cantilevers and methods for making and using same.
  2. Miles, Mark W.; Batey, John; Chui, Clarence; Kothari, Manish; Tung, Ming-Hau, Controlling electromechanical behavior of structures within a microelectromechanical systems device.
  3. Floyd,Philip D., Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator.
  4. Wang, Hsin Fu; Tung, Ming Hau; Zee, Stephen, Diffusion barrier layer for MEMS devices.
  5. Chou, Chen Jean; Wu, Chun chen; Brinkley, Patrick F., Electrical conditioning of MEMS device and insulating layer thereof.
  6. Xu,Gang; Gousev,Evgeni, Electrode and interconnect materials for MEMS devices.
  7. Palmaz, Julio C.; Sprague, Eugene A.; Simon, Cristina; Marton, Denes; Wiseman, Roger W.; Banas, Christopher E., Endoluminal device exhibiting improved endothelialization and method of manufacture thereof.
  8. Boyle, Christopher T.; Bailey, Steven R.; Palmaz, Julio C.; Banas, Christopher E., Endoluminal stent, self-supporting endoluminal graft and methods of making same.
  9. Deng, Tao; Arias, Francisco; Ismagilov, Rustem F.; Kenis, Paul J. A.; Whitesides, George M., Fabrication of metallic microstructures via exposure of photosensitive compostion.
  10. Miles, Mark W; Gally, Brian J.; Chui, Clarence, Film stack for manufacturing micro-electromechanical systems (MEMS) devices.
  11. Boyle, Christopher T.; Marton, Denes; Banas, Christopher E., Implantable graft and methods of making same.
  12. Boyle, Christopher T.; Marton, Denes; Banas, Christopher E., Implantable graft and methods of making same.
  13. Bailey, Steven R.; Boyle, Christopher T.; Marton, Denes; Banas, Christopher E., In vivo sensor and method of making same.
  14. Bailey, Steven R.; Boyle, Christopher T.; Marton, Denes; Banas, Christopher E., In vivo sensor and method of making same.
  15. Douglas, Joel S.; Hugo, Robert L.; Zhang, Cynthia, Infusion hub assembly and fluid line disconnect system.
  16. Lin,Wen Jian, Interference display cell and fabrication method thereof.
  17. Lin, Wen-Jian; Tsai, Hsiung-Kuang, Interferometric modulation pixels and manufacturing method thereof.
  18. Gousev, Evgeni; Xu, Gang; Mienko, Marek, Interferometric optical display system with broadband characteristics.
  19. Chui,Clarence, MEMS device fabricated on a pre-patterned substrate.
  20. Kocis, Joseph T.; Tornello, James; Petrarca, Kevin S.; Volant, Richard; Subbanna, Seshadri, MEMS encapsulated structure and method of making same.
  21. Chui, Clarence; Sampsell, Jeffrey B., MEMS using filler material and method.
  22. Chui,Clarence, Method and device for a display having transparent components integrated therein.
  23. Floyd,Philip D., Method and device for protecting interferometric modulators from electrostatic discharge.
  24. Miles,Mark W., Method for fabricating a structure for a microelectromechanical system (MEMS) device.
  25. Miles, Mark W., Method for fabricating a structure for a microelectromechanical systems (MEMS) device.
  26. Miles,Mark W., Method for manufacturing an array of interferometric modulators.
  27. Wang, Chun-Ming; Lan, Jeffrey; Sasagawa, Teruo, Method of creating MEMS device cavities by a non-etching process.
  28. Wang, Chun-Ming; Lan, Jeffrey; Sasagawa, Teruo, Method of creating MEMS device cavities by a non-etching process.
  29. Chui,Clarence; Sampsell,Jeffrey B., Method of fabricating a free-standing microstructure.
  30. Chui, Clarence; Tung, Ming Hau, Method of fabricating interferometric devices using lift-off processing techniques.
  31. Chand, Ami, Method of forming semiconductor devices in wafer assembly.
  32. Lin, Wen Jian, Method of manufacturing optical interference color display.
  33. Tung,Ming Hau; Kogut,Lior, Methods for producing MEMS with protective coatings using multi-component sacrificial layers.
  34. Kothari, Manish; Sampsell, Jeffrey B., Methods for reducing surface charges during the manufacture of microelectromechanical systems devices.
  35. Sampsell, Jeffrey Brian; Gally, Brian James; Floyd, Philip Don, Methods of fabricating MEMS with spacers between plates and devices formed by same.
  36. Tung,Ming Hau; Floyd,Philip D.; Arbuckle,Brian W., Methods of fabricating interferometric modulators by selectively removing a material.
  37. Tung,Ming Hau; Kothari,Manish; Cummings,William J., Methods of fabricating interferometric modulators by selectively removing a material.
  38. Douglas, Joel S., Micro infusion drug delivery device.
  39. Douglas, Joel; Hugo, Jr., Robert, Micro infusion drug delivery device.
  40. Sasagawa, Teruo; Kogut, Lior, Microelectromechanical device and method utilizing a porous surface.
  41. Sasagawa,Teruo; Kogut,Lior, Microelectromechanical device and method utilizing a porous surface.
  42. Sasagawa, Teruo; Kogut, Lior, Microelectromechanical device and method utilizing nanoparticles.
  43. Miles, Mark W.; Batey, John; Chui, Clarence; Kothari, Manish, Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer.
  44. Chui,Clarence; Sampsell,Jeffrey B., Mirror and mirror layer for optical modulator and method.
  45. Moeck,Peter, Nanometrology device standards for scanning probe microscopes and processes for their fabrication and use.
  46. Luo, Qi; Akella, Sriram; Kogut, Lior, Non-planar surface structures and process for microelectromechanical systems.
  47. Sasagawa, Teruo; Kogut, Lior; Tung, Ming Hau, Non-planar surface structures and process for microelectromechanical systems.
  48. Lin, Wen-Jian; Tsai, Hsiung-Kuang, Optical interference display cell and method of making the same.
  49. Beyder,Arthur; Sachs,Frederick, Oscillator and method of making for atomic force microscope and other applications.
  50. Beyder, Arthur; Sachs, Frederick, Oscillator for atomic force microscope and other applications.
  51. Tung,Ming Hau; Chung,Wonsuk, Patterning of mechanical layer in MEMS to reduce stresses at supports.
  52. Heald,David, Process and structure for fabrication of MEMS device having isolated edge posts.
  53. Chand, Ami, Scanning probe devices.
  54. Yan, Xiaoming; Arbuckle, Brian; Gousev, Evgeni; Tung, Ming Hau, Selective etching of MEMS using gaseous halides and reactive co-etchants.
  55. Chand, Ami, Semiconductor device in wafer assembly.
  56. Chung,Wonsuk; Zee,Steve; Sasagawa,Teruo, Silicon-rich silicon nitrides as etch stops in MEMS manufacture.
  57. Lin,Wen Jian, Structure of a micro electro mechanical system and the manufacturing method thereof.
  58. Sasagawa, Teruo; Chui, Clarence; Kothari, Manish; Ganti, SuryaPrakash; Sampsell, Jeffrey B., Support structure for MEMS device and methods therefor.
  59. Yang, Chin-Sheng, Suspended beam for use in MEMS device.
  60. Yu, Min-Feng; Minary-Jolandan, Majid, Ultra-low damping imaging mode related to scanning probe microscopy in liquid.
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