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Method of making optical replicas by stamping in photoresist and replicas formed thereby 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B44C-011/65
  • B44C-001/22
  • B32B-031/00
  • B41M-003/12
출원번호 US-0109914 (1998-07-02)
발명자 / 주소
  • Suleski Thomas J.
출원인 / 주소
  • Samsung Electronics Co., Ltd., KRX
대리인 / 주소
    Jones Volentine, L.L.P.
인용정보 피인용 횟수 : 60  인용 특허 : 4

초록

Optical structures are replicated in photoresist on a substrate using a stamp. The transfer of the pattern into the liquid photoresist and the provision on the substrate can be achieved using manual pressures. Various techniques may be used to remove air from the liquid photoresist. The stamp is rem

대표청구항

[ What is claimed is:] [1.] A method of making an optical replica comprising:contacting liquid photoresist with a stamp having a pattern therein, thereby replicating the pattern in the photoresist;providing the liquid photoresist on a substrate opposite a side of the liquid photoresist contacting th

이 특허에 인용된 특허 (4)

  1. Franz Helmut (Pittsburgh PA) Goodwin George B. (Mars PA), Chemically reacted glass surface.
  2. Kumar Amit (Sacramento CA) Whitesides George M. (Newton MA), Formation of microstamped patterns on surfaces and derivative articles.
  3. Cox J. Allen (New Brighton MN) Wilke Robert M. (Maple Grove MN), Method for making surface relief profilers.
  4. Komatsubara Shigemaru (Sagamihara JPX), Method of manufacturing a stamper for information storage discs.

이 특허를 인용한 특허 (60)

  1. Stone, Kate, Apparatus for and method of fabricating an electronic device by transfer of material onto a substrate.
  2. Schwartz, Evan L.; Meyer, Justin P.; Benson, Jr., Olester; Collier, Terry O.; Free, Michael Benton; Kamrath, Robert F.; Mazurek, Mieczyslaw H.; Olson, David B.; Shenoy, K. Raveesh; Wolk, Martin B., Articles with lamination transfer films having engineered voids.
  3. Homola, Andrew M., Composite stamper for imprint lithography.
  4. Homola, Andrew M., Composite stamper for imprint lithography.
  5. Hubert, Brian; Bulthaup, Colin; Gudeman, Chris; Spindt, Chris; Haubrich, Scott; Takashima, Mao; Rockenberger, Joerg; Kunze, Klaus; Zurcher, Fabio, Contact print methods.
  6. Montelius,Lars; Heidari,Babak; Stjernholm,Thord, Device for transferring a pattern to an object.
  7. Jacobson, Joseph M.; Bulthaup, Colin A.; Wilhelm, Eric J.; Hubert, Brian N., Fabrication of finely featured devices by liquid embossing.
  8. Lee, Jae Hwang; Ho, Kai Ming; Kim, Yong Sung; Constant, Kristen; Kim, Chang Hwan, Fabrication of layer-by-layer photonic crystals using two polymer microtransfer molding.
  9. Tan, Li; Kong, Yen Peng; Pang, Stella W.; Yee, Albert F., Imprinting polymer film on patterned substrate.
  10. Feldman, Michael R.; Harden, Brian; Kathman, Alan D.; Welch, W. Hudson, Integrated optical imaging systems including an interior space between opposing substrates and associated methods.
  11. DeSimone, Joseph M.; Denison Rothrock, Ginger; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  12. DeSimone, Joseph M.; Rothrock, Ginger Denison; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  13. Schwartz, Evan L.; Meyer, Justin P.; Benson, Jr., Olester; Collier, Terry O.; Free, Michael Benton; Kamrath, Robert F.; Mazurek, Mieczyslaw H.; Olson, David B.; Shenoy, K. Raveesh; Wolk, Martin B., Lamination transfer films for forming articles with engineered voids.
  14. Kwak, Jeong-Bok; Ra, Seung-Hyun; Lee, Choon-Keun; Cho, Jae-Choon; Lee, Sang-Moon, Manufacturing method for imprinting stamper.
  15. Lee, Jae-Hwang; Ho, Kai-Ming; Constant, Kristen P., Metallic layer-by-layer photonic crystals for linearly-polarized thermal emission and thermophotovoltaic device including same.
  16. Suleski, Thomas J., Method and apparatus for fabricating shaped structures and shaped structures including one- , two- or three-dimensional patterns incorporated therein.
  17. Chou, Stephen Y., Method and apparatus for high density nanostructures.
  18. McMackin, Ian M.; Lad, Pankaj B.; Truskett, Van N., Method for fast filling of templates for imprint lithography using on template dispense.
  19. Salleo,Alberto; Wong,William S., Method for large-area patterning dissolved polymers by making use of an active stamp.
  20. Alexander Pechenik, Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate.
  21. Harden, Brian; Kathman, Alan; Feldman, Michael, Method for replicating optical elements, particularly on a wafer level, and replicas formed thereby.
  22. Harden, Brian; Kathman, Alan; Feldman, Michael, Method for replicating optical elements, particularly on a wafer level, and replicas formed thereby.
  23. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  24. Bradley, Donal; Chen, Lichun; Dagenaar, Patrick, Method of depositing organic layers onto a substrate.
  25. Yeom, Geun-young; Yoo, Myung cheol; Urbanek, Wolfram; Sung, Youn-joon; Jeong, Chang-hyun; Kim, Kyong-nam; Kim, Dong-woo, Method of etching substrates.
  26. Yeom,Geun young; Yoo,Myung cheol; Urbanek,Wolfram; Sung,Youn joon; Jeong,Chang hyun; Kim,Kyong nam; Kim,Dong woo, Method of etching substrates.
  27. Schueller,Olivier; Kim,Enoch; Whitesides,George, Method of patterning a surface using a deformable stamp.
  28. Wang,Hong Ying; Rauch,Gary C., Method of replicating a textured surface.
  29. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  30. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  31. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larkin E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography.
  32. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  33. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  34. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography.
  35. Bulthaup, Colin; Spindt, Chris, Methods for patterning using liquid embossing.
  36. Bao, Lirong; Tan, Li; Huang, Xudong; Kong, Yen Peng; Guo, Lingjie Jay; Pang, Stella W.; Yee, Albert, Methods of creating patterns on substrates and articles of manufacture resulting therefrom.
  37. Schwartz, Evan L.; Meyer, Justin P.; Benson, Olester; Collier, Terry O.; Free, Michael Benton; Kamrath, Robert F.; Mazurek, Mieczyslaw H.; Olson, David B.; Shenoy, K. Raveesh; Wolk, Martin B., Methods of forming transfer films.
  38. Kim, Woo Soo; Hu, Nan-Xing; Gagnon, Yvan; Junginger, Johann, Methods of making an improved photoreceptor outer layer.
  39. Schilling, Andreas; Tompkin, Wayne Robert, Microstructure and method for producing microstructures.
  40. O'Brien, Patrick J., Optical storage device with print layer surface feature.
  41. Sreenivasan, Sidlgata V.; Schumaker, Philip D., Patterning a plurality of fields on a substrate to compensate for differing evaporation times.
  42. DeSimone, Joseph M.; Rolland, Jason P.; Quake, Stephen R.; Schorzman, Derek A.; Yarbrough, Jason; Van Dam, Michael, Photocurable perfluoropolyethers for use as novel materials in microfluidic devices.
  43. Chou, Stephen Y., Release surfaces, particularly for use in nanoimprint lithography.
  44. Schaper, Charles Daniel, Replication and transfer of microstructures and nanostructures.
  45. Jones, Christopher Ellis; Khusnatdinov, Niyaz; Johnson, Stephen C.; Schumaker, Philip D.; Lad, Pankaj B., Residual layer thickness measurement and correction.
  46. Lee, Nam-Seok; Kim, Chul-Ho; Lee, Shin-Bok, Roll mold, method for fabricating the same and method for fabricating thin film pattern using the same.
  47. Clem, Paul G.; Jeon, Noo-Li; Mrksich, Milan; Nuzzo, Ralph G.; Payne, David A.; Whitesides, George M.; Xia, Younan, Self-assembled monolayer directed patterning of surfaces.
  48. Guan,Jingjiao; Hansford,Derek J.; Lee,L. James, Self-folding polymer microparticles.
  49. Kurataka, Nobuo; Wang, Hong Ying; Deeman, Neil, Servo pattern formation via transfer of sol-gel layer and magnetic media obtained thereby.
  50. Kurataka, Nobuo; Wang, Hong Ying; Deeman, Neil, Servo pattern formation via transfer of sol-gel layer and magnetic media obtained thereby.
  51. Leung, Wai Y.; Park, Joong-Mok; Gan, Zhengqing; Constant, Kristen P.; Shinar, Joseph; Shinar, Ruth; Ho, Kai-Ming, Soft lithography microlens fabrication and array for enhanced light extraction from organic light emitting diodes (OLEDs).
  52. Bruno, Michel; Schmid, Heinz; Delamarche, Emmanuel; Bietsch, Alexander, Stamp device for printing a pattern on a surface of a substrate.
  53. Heidari,Babak; Ling,Torbj?rn, Stamp having an antisticking layer and a method of forming of repairing such a stamp.
  54. Hasegawa,Mitsuru; Miyauchi,Akihiro, Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern.
  55. Wolk, Martin B.; Mazurek, Mieczyslaw H.; Lamansky, Sergey; Vogel-Martin, Margaret M.; Jones, Vivian W.; Benson, Jr., Olester; Free, Michael Benton; Schwartz, Evan L.; Bay, Randy S.; Clarke, Graham M., Structured lamination transfer films and methods.
  56. Wago,Koichi; Gauzner,Gennady, Surface modified stamper for imprint lithography.
  57. Wago,Koichi; Gauzner,Gennady, Surface modified stamper for imprint lithography.
  58. Harchanko, John S.; Banish, Michele, System and method for analog replication of microdevices having a desired surface contour.
  59. Shackleton,Steven C.; McMackin,Ian M.; Lad,Pankaj B.; Truskett,Van N., System for controlling a volume of material on a mold.
  60. Breen, Tricia L.; Kosbar, Laura L.; Mastro, Michael P.; Nunes, Ronald W., Vapor phase surface modification of composite substrates to form a molecularly thin release layer.
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