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Package-free bonding pad structure 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01K-023/48
출원번호 US-0299330 (1999-04-26)
발명자 / 주소
  • Hsuan Min-Chih,TWX
  • Liou Fu-Tai,TWX
출원인 / 주소
  • United Microelectronics Corporation, TWX
대리인 / 주소
    Hickman Stephens Coleman & Hughes, LLP
인용정보 피인용 횟수 : 49  인용 특허 : 4

초록

A package-free bonding pad structure on a silicon chip that includes a plurality of metal pads on the upper surface of the silicon chip and a passivation layer covering the upper surface of the silicon chip. The passivation layer has a plurality of open cavities directly above the metal pad areas fo

대표청구항

[ What is claimed is:] [11.] A package-free boding pad structure, comprising:a substrate;a plurality of conductive layers above the substrate; anda plurality of insulation layers above the substrate, wherein adjacent conductive layers are separated from each other by an insulating layer, a plurality

이 특허에 인용된 특허 (4)

  1. Amano Akira (Kawasaki JPX), Bump electrode structure and semiconductor chip having the same.
  2. Hirano Naohiko,JPX, Flip-chip connecting type semiconductor device.
  3. Kimura Naoto,JPX, Semiconductor device having simple protective structure and process of fabrication thereof.
  4. Licata Thomas John ; Mandelman Jack Allan, Wire shape conferring reduced crosstalk and formation methods.

이 특허를 인용한 특허 (49)

  1. Verma, Chetan; Kumar, Shailesh; Lye, Meng Kong, Bond pad for semiconductor die.
  2. Brett H. Engel ; Vincent James McGahay ; Henry Atkinson Nye, III, Bond pad structure and method for reduced downward force wirebonding.
  3. Edgar R. Zuniga ; Samuel A. Ciani, Bonding over integrated circuits.
  4. Yamaha Takahisa,JPX, Bonding pad structure of semiconductor device.
  5. Lin, Mou-Shiung; Lee, Jin-Yuan; Huang, Ching-Cheng, Chip structure and process for forming the same.
  6. Schroen Walter H. ; Archer Judith S. ; Terrill Robert E., Fully hermetic semiconductor chip, including sealed edge sides.
  7. Lee, Soo-cheol; Ahn, Jong-hyon; Son, Kyoung-mok; Shin, Heon-jong; Lee, Hyae-ryoung; Kim, Young-pill; Jung, Moo-jin; Wang, Son-jong; Yoo, Jae-Cheol, Integrated circuit bonding pads including conductive layers with arrays of unaligned spaced apart insulating islands therein and methods of forming same.
  8. Lee Soo-cheol,KRX ; Ahn Jong-hyon,KRX ; Lee Hyae-ryoung,KRX, Integrated circuit bonding pads including intermediate closed conductive layers having spaced apart insulating islands therein.
  9. Lin, Mou-Shiung; Lee, Jin-Yuan; Huang, Ching-Cheng, Method for fabricating circuitry component.
  10. Hsieh, Han-Kun; Lin, Wei-Feng, Method for fabricating conductive bumps and substrate with metal bumps for flip chip packaging.
  11. Yamaha, Takahisa, Method for manufacturing a semiconductor device.
  12. Sabin, Gregory D.; Gross, William J.; Chang, Jung-Yueh, Method for placing active circuits beneath active bonding pads.
  13. Yamaha,Takahisa, Method of forming a bonding pad structure.
  14. Yamaha,Takahisa, Method of forming a bonding pad structure.
  15. Kameyama, Kojiro; Suzuki, Akira; Okayama, Yoshio; Umemoto, Mitsuo, Method of manufacturing semiconductor device with through hole.
  16. Soo-cheol Lee KR; Jong-hyon Ahn KR; Hyae-ryoung Lee KR, Methods of fabricating integrated circuit bonding pads including intermediate closed conductive layers having spaced apart insulating islands therein.
  17. Liou Fu-Tai,TWX ; Chuang Andy,TWX, Plug structure.
  18. Lin, Mou-Shiung; Lee, Jin-Yuan, Post passivation interconnection schemes on top of IC chip.
  19. Lin, Mou-Shiung; Lee, Jin-Yuan, Post passivation interconnection schemes on top of IC chip.
  20. Lin, Mou-Shiung; Lee, Jin-Yuan, Post passivation interconnection schemes on top of IC chip.
  21. Lin, Mou-Shiung; Lee, Jin-Yuan, Post passivation interconnection schemes on top of IC chip.
  22. Lin, Mou-Shiung; Lee, Jin-Yuan, Post passivation interconnection schemes on top of IC chip.
  23. Lin, Mou-Shiung; Lee, Jin-Yuan, Post passivation interconnection schemes on top of IC chip.
  24. Lin, Mou-Shiung; Lee, Jin-Yuan, Post passivation interconnection schemes on top of IC chips.
  25. Lin, Mou-Shiung; Chou, Chiu-Ming; Chou, Chien-Kang, Post passivation interconnection schemes on top of the IC chips.
  26. Tahara, Iwao; Mihara, Ichiro; Aoki, Yutaka, Semiconductor device.
  27. Kameyama, Kojiro; Suzuki, Akira; Umemoto, Mitsuo, Semiconductor device and manufacturing method of the same.
  28. Kameyama, Kojiro; Suzuki, Akira; Umemoto, Mitsuo, Semiconductor device and manufacturing method of the same.
  29. Okayama, Yoshio; Suzuki, Akira; Kameyama, Koujiro; Umemoto, Mitsuo; Takahashi, Kenji; Terao, Hiroshi; Hoshino, Masataka, Semiconductor device and manufacturing method thereof.
  30. Ooto Kenichi,JPX ; Kobayashi Heiji,JPX ; Nakazawa Shouitirou,JPX, Semiconductor device and manufacturing method thereof.
  31. Aoki, Yutaki; Mihara, Ichiro; Wakabayashi, Takeshi; Watanabe, Katsumi, Semiconductor device having a barrier layer.
  32. Aoki, Yutaka; Mihara, Ichiro; Wakabayashi, Takeshi; Watanabe, Katsumi, Semiconductor device having a thin-film circuit element provided above an integrated circuit.
  33. Aoki, Yutaka; Mihara, Ichiro; Wakabayashi, Takeshi; Watanabe, Katsumi, Semiconductor device having a thin-film circuit element provided above an integrated circuit.
  34. Kameyama,Kojiro; Suzuki,Akira; Umemoto,Mitsuo, Semiconductor device with a via hole having a diameter at the surface larger than a width of a pad electrode.
  35. Hashimoto, Shin; Mimura, Tadaaki, Semiconductor device with multilayered metal pattern.
  36. Hashimoto,Shin; Mimura,Tadaaki, Semiconductor device with multilayered metal pattern.
  37. Kameyama, Kojiro; Suzuki, Akira; Umemoto, Mitsuo, Semiconductor device with penetrating electrode.
  38. Kameyama,Kojiro; Suzuki,Akira; Okayama,Yoshio; Umemoto,Mitsuo, Semiconductor device with via hole for electric connection.
  39. Kameyama, Koujiro; Suzuki, Akira; Okayama, Yoshio; Umemoto, Mitsuo; Takahashi, Kenji; Terao, Hiroshi; Hoshino, Masataka, Semiconductor device with via hole of uneven width.
  40. Nishimura, Hidetoshi, Semiconductor integrated circuit having improved power supply wiring.
  41. Chiu,Anthony M., System and method for increasing the strength of a bond made by a small diameter wire in ball bonding.
  42. Chiu,Anthony M., System and method for increasing the strength of a bond made by a small diameter wire in ball bonding.
  43. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  44. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  45. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  46. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  47. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  48. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  49. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
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