초록 ▼

Provided is an apparatus for producing semiconductor and other devices, which can improve the quality of deposited films and increase the yield of produced devices in comparison with the conventional apparatus. The apparatus of the invention comprises a plurality of dry treatment chambers (7a, 7b, 7

Provided is an apparatus for producing semiconductor and other devices, which can improve the quality of deposited films and increase the yield of produced devices in comparison with the conventional apparatus. The apparatus of the invention comprises a plurality of dry treatment chambers (7a, 7b, 7c, 7d, 7e), a transfer room (6) interconnecting the dry treatment chambers (7a, 7b, 7c, 7d, 7e), loading/unloading chambers (8a, 8b, 8c, 8d), and a cleaning apparatus (13). The transfer room (6) and the cleaning apparatus (13) are directly or indirectly connected to each other.

대표청구항 ▼

[ What is claimed is:] [1.] An apparatus for producing semiconductors and other device, comprising:(a) an atmospherically sealed first place in which there are provided a plurality of dry treatment chambers for conducting dry treatment on objects and a transfer room interconnecting said dry treatmen

[ What is claimed is:] [1.] An apparatus for producing semiconductors and other device, comprising:(a) an atmospherically sealed first place in which there are provided a plurality of dry treatment chambers for conducting dry treatment on objects and a transfer room interconnecting said dry treatment chambers;(b) a second place in which there is provided a loading/unloading chamber for loading said objects for dry treatment in said dry treatment chambers and unloading said objects on which dry treatment has already been conducted;(c) a passage connecting said first and second places for conveying said objects between them in an atmospherically sealed manner; and(d) a third place in which there is provided a cleaning apparatus for cleaning said objects being conveved through said passage, said cleaning apparatus includinga gas generating device for generating an ozone gas and a hydrogen gas,a gas dissolving device for dissolving said ozone gas and said hydrogen gas respectively into pure water to produce ozonized water and hydrogenated water, anda cleaning device for spraying said ozonized water and said hydrogenated water onto said objects, wherein said third place has an atmospherically sealed area in which at least said cleaning device is disposed.