$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Cold-cathode ion source with a controlled position of ion beam 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-037/08
출원번호 US-0225159 (1999-01-04)
발명자 / 주소
  • Maishev Yuri,RUX
  • Ritter James
  • Velikov Leonid
  • Shkolnik Alexander
출원인 / 주소
  • Advanced Ion Technology, Inc.
인용정보 피인용 횟수 : 50  인용 특허 : 3

초록

A cold-cathode ion source with a closed-loop ion-emitting slit which is provided with means for generating a cyclically-variable, e.g., alternating or pulsating electric or magnetic field in an anode-cathode space. These means may be made in the form of an alternating-voltage generator which generat

대표청구항

[ We claim:] [1.] A method for controlling position of an ion beam on the surface of an object to be treated with said ion beam, comprising:providing a cold-cathode ion source with crossed electrical and magnetic fields and with at least one ion-emitting slit, said ion source having a voltage source

이 특허에 인용된 특허 (3)

  1. Singh Bawa (Cherry Hill NJ) Denton Peter R. (Cherry Hill NJ), Cold cathode ion beam source.
  2. Boucher ; Bernard ; Luzet ; Daniel ; Sella ; Claude, Device for cathodic sputtering at a high deposition rate.
  3. Kovalsky ; Georgy Alexandrovich ; Maishev ; Jury Petrovich ; Dmitriev ; Jury Akimovich, Ion source.

이 특허를 인용한 특허 (50)

  1. Jenson, Mark L.; Klaassen, Jody J.; Sullivan, Jim, Active wireless tagging system on peel and stick substrate.
  2. Shakespeare,Stuart, Apparatus and method for depositing material onto a substrate using a roll-to-roll mask.
  3. Jacobs, Harlan T.; Jenson, Mark L.; Klaassen, Jody J.; Yan, Jenn-Feng, Battery-operated wireless-communication apparatus and method.
  4. Jacobs, Harlan T.; Jenson, Mark L.; Klassen, Jody J.; Yan, Jenn-Feng, Battery-operated wireless-communication apparatus and method.
  5. Jacobs,Harlan Theodore; Jenson,Mark Lynn; Klaassen,Jody Jon; Yan,Jenn Feng, Battery-operated wireless-communication apparatus and method.
  6. Peter Maschwitz ; Jaime Li, Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source.
  7. Petrmichl, Rudolph Hugo, Cold cathode ion beam deposition apparatus with segregated gas flow.
  8. Rudolph Hugo Petrmichl, Cold cathode ion beam deposition apparatus with segregated gas flow.
  9. Jenson,Mark Lynn, Continuous processing of thin-film batteries and like devices.
  10. Jenson,Mark Lynn; Klaassen,Jody Jon; Weiss,Victor Henry; Yan,Jenn Feng, Device enclosures and devices with integrated battery.
  11. Horsky, Thomas Neil, Dual mode ion source for ion implantation.
  12. Demos,Alexandros T.; Ponnekanti,Hari K.; Zhao,Jun; Armer,Helen R., Electron beam treatment apparatus.
  13. Jacobs, Harlan T.; Jenson, Mark L.; Klaassen, Jody J.; Yan, Jenn-Feng, Encapsulated integrated-circuit device with thin-film battery.
  14. Hahto, Sami K.; Goldberg, Richard; McIntyre, Edward; Horsky, Thomas N., External cathode ion source.
  15. Hahto, Sami K.; Goldberg, Richard; McIntyre, Edward; Horsky, Thomas N., External cathode ion source.
  16. Petrmichl,Rudolph Hugo, Floating mode ion source.
  17. Gutkin, Michael; Bizyukov, Alexander; Sleptsov, Vladimir; Bizyukov, Ivan; Sereda, Konstantin, Focused anode layer ion source with converging and charge compensated beam (falcon).
  18. Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo; Luten, Henry A., Ion beam source with coated electrode(s).
  19. Veerasamy,Vijayen S.; Petrmichl,Rudolph Hugo, Ion beam source with gas introduced directly into deposition/vacuum chamber.
  20. Horsky, Thomas Neil; Williams, John Noel, Ion implantation ion source, system and method.
  21. Yamashita, Takatoshi, Ion source and operation method thereof.
  22. Frati, Maximo, Ion source apparatus and methods of using the same.
  23. Walton,Hugh A., Ion source with multi-piece outer cathode.
  24. Murphy, Nestor P., Ion source with recess in electrode.
  25. Luten,Henry A.; Veerasamy,Vijayen S., Ion source with substantially planar design.
  26. Alekseev, Valery V.; Zelenkov, Vsevolod V.; Krivoruchko, Mark M.; Keem, John E., Ion sources.
  27. Whaley, David Riley, Ion-shielded focusing method for high-density electron beams generated by planar cold cathode electron emitters.
  28. Tarnowski,Dave J.; Jenson,Mark L., Layered barrier structure having one or more definable layers and method.
  29. Klaassen,Jody J., Lithium/air batteries with LiPON as separator and protective barrier and method.
  30. Klaassen,Jody J., Lithium/air batteries with LiPON as separator and protective barrier and method.
  31. Siegfried,Daniel E.; Burtner,David Matthew; Townsend,Scott A.; Keem,John; Alexeyev,Valery; Zelenkov,Vsevolod; Krivoruchko,Mark, Longitudinal cathode expansion in an ion source.
  32. Jenson, Mark L., Low-temperature fabrication of thin-film energy-storage devices.
  33. Whaley, David Riley; Duggal, Ramon; Armstrong, Carter Michael, Magnetically insulated cold-cathode electron gun.
  34. Jenson, Mark L.; Klaassen, Jody J., Method and apparatus for integrated-circuit battery devices.
  35. Jenson, Mark L.; Klaassen, Jody J., Method and apparatus for integrated-circuit battery devices.
  36. Jenson,Mark L.; Weiss,Victor H., Method and apparatus for thin-film battery having ultra-thin electrolyte.
  37. Luten, Henry A.; Veerasamy, Vijayen S.; Frati, Maximo; Shaw, Denis, Method of cleaning ion source, and corresponding apparatus/system.
  38. Jenson, Mark Lynn, Method of continuous processing of thin-film batteries and like devices.
  39. Siegfried,Daniel E.; Burtner,David Matthew; Townsend,Scott A.; Alexeyev,Valery, Modular ion source.
  40. Siegfried, Daniel E.; Burtner, David Matthew; Townsend, Scott A.; Keem, John; Krivoruchko, Mark; Alexeyev, Valery; Zelenkov, Vsevolod, Modular uniform gas distribution system in an ion source.
  41. Yamaguchi,Koji; Nishiguchi,Toshiji, Plasma processing method and apparatus.
  42. Read, John B.; Sweeney, Daniel C., Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices.
  43. Sweeney, Daniel C.; Read, John B., Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices.
  44. Jenson,Mark L.; Klaassen,Jody J.; Sullivan,Jim; Lemaire,Charles A.; Billion,Richard E., Solid state MEMS activity-activated battery device and method.
  45. Jenson, Mark L.; Klaassen, Jody J.; Sullivan, Jim; Lemaire, Charles A.; Billion, Richard E., Solid state activity-activated battery device and method.
  46. Burtner, David Matthew; Siegfried, Daniel E.; Blacker, Richard; Alexeyev, Valery; Keem, John; Zelenkov, Vsevolod; Krivoruchko, Mark, Sputtered contamination shielding for an ion source.
  47. Klaassen, Jody J., Thin-film batteries with polymer and LiPON electrolyte layers and method.
  48. Jenson,Mark L., Thin-film battery devices and apparatus for making the same.
  49. Jenson,Mark Lynn; Weiss,Victor Henry, Thin-film battery having ultra-thin electrolyte.
  50. Jenson,Mark Lynn; Weiss,Victor Henry, Thin-film battery having ultra-thin electrolyte and associated method.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로