$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Process control for pulsed laser deposition using raman spectroscopy 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-011/06
출원번호 US-0846437 (1997-04-30)
발명자 / 주소
  • Maguire John Francis
  • Busbee John David
  • Liptak David Charles
  • Lubbers David Peter
  • LeClair Steven R.
  • Biggers Rand Robert
출원인 / 주소
  • Southwest Research Institute
대리인 / 주소
    Baker & Botts, L.L.P.
인용정보 피인용 횟수 : 18  인용 특허 : 19

초록

A method of controlling a pulsed laser deposition process. A spectroscope is used to acquire Raman response data from a substrate as it is being coated with a film. A processor compares the response data to reference data, which may represent an uncoated substrate or an ideal film. In the former cas

대표청구항

[ What is claimed is:] [1.] A method of using a computer to measure the thickness of any non-metallic film coated upon a substrate, comprising the steps of:storing substrate reference data derived from a waveform representing the Raman response of said substrate;acquiring substrate response data rep

이 특허에 인용된 특허 (19)

  1. Batchelder John S. (Somers NY) Hobbs Philip C. D. (Briarcliff Manor NY) Taubenblatt Marc A. (Pleasantville NY) Cooper Douglas W. (Millwood NY), Apparatus and a method for high numerical aperture microscopic examination of materials.
  2. Milne Christopher G. (#170 4831 E. Summitt Cr. Knoxville TN 37919) Shelby ; Jr. Paulus P. (3115 B Marion Dr. Knoxville TN 37918) Bailey David L. (3700 Sutherland Ave. ; Apt. Y-3 Knoxville TN 37919), Apparatus and microbase for surface-enhanced raman spectroscopy system and method for producing same.
  3. Manada Nobuaki (1-24 ; Yagiyamaminami 1-chome Taihaku-ku ; Sendai-shi ; Miyagi-ken JPX) Ito Junji (16-3 ; Yagiyamamidori-cho Taihaku-ku ; Sendai-shi ; Miyagi-ken JPX) Kurabayashi Toru (9-23 ; Yagiyam, Apparatus for epitaxially growing a chemical compound crystal.
  4. Iturralde Armando (San Antonio TX), Automatic film deposition control method and system.
  5. Holland Leslie (Crowley GB2), Control of deposition of thin films.
  6. Wilmanns Ingo (Gelsdorf DT), Control of vapor deposition.
  7. Southwell William H. (Thousand Oaks CA) Hall Randolph L. (Newbury Park CA), Deposition of multiple layer thin films using a broadband spectral monitor.
  8. Dagenais Mario (Chevy-Chase MD) Wu I-Fan (Hyattsville MD), Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers.
  9. Knoll Wolfgang (Mainz DEX) Knobloch Harald (Albig DEX), Examination of physical properties of thin films.
  10. Laube Samuel J. P. (Cincinnati OH) Stark Elizabeth F. (Dayton OH), Hierarchical feedback control of pulsed laser deposition.
  11. Sevillano Evelio (Lexington MA) Bourget Lawrence P. (Winchester MA) Post Richard S. (Lexington MA), High growth rate plasma diamond deposition process and method of controlling same.
  12. Wajid Abdul (East Syracuse NY), Measuring and controlling deposition on a piezoelectric monitor crystal.
  13. Yu Chorng-Tao (Yorba Linda CA) Isaak Kenneth H. (Tustin CA), Method for film thickness endpoint control.
  14. Horie Masahiro (Kamikyo JPX) Fujiwara Nariaki (Kamikyo JPX) Kokubo Masahiko (Kamikyo JPX), Method of measuring film thicknesses.
  15. Bachmann Klaus J. (Raleigh NC) Dietz Nikolaus (Raleigh NC) Miller Amy E. (Raleigh NC), Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy.
  16. Hall James T. (Torrance CA), Multiple-notch rugate filters and a controlled method of manufacture thereof.
  17. Lee Tseng-Chung ; Maynard Helen Louise, Process for fabricating a device using polarized light to determine film thickness.
  18. Fink Manfred F. ; Robinson John C. ; Buell Walter F., Raman spectrometer.
  19. Murarka Narayan P. (Hoffman Estates IL) Kogler Kent J. (Orland Park IL) Bartholomew Craig S. (Glen Ellyn IL) Betz Howard T. (Chesterton IN) Harris Richard J. (Bellbrook OH), Rugate optical filter systems.

이 특허를 인용한 특허 (18)

  1. Halderman, Jonathan D.; Brownfield, Terri J., Determination of flux coverage.
  2. Nukatsuka, Shigehiro; Sato, Akiyoshi; Adachi, Takeshi; Nariki, Kotaro, Disaster-affected area estimation device and program.
  3. Folestad, Staffan; Bj?rn, Ingela Niklasson; Rasmuson, Anders; Str?m, Daniel, Method and apparatus for monitoring the coating on particle during manufacturing of a pharmaceutical product.
  4. Davis, Matthew F.; Lian, Lei; Uo, Yasuhiro; Willwerth, Michael D.; Netchitaliouk, Andrei Ivanovich, Method and apparatus for performing limited area spectral analysis.
  5. Manuel,Mark; Kirkum,Christopher Dean; Racklyeft,Robert, Method and apparatus for the creation of a tool.
  6. Manuel,Mark; Kirkum,Christopher Dean; Racklyeft,Robert, Method and apparatus for the creation of a tool.
  7. Hu, Zhaoli, Method and system for confined laser cutting.
  8. Manuel,Mark, Method for building a tool.
  9. Greaves,Thomas Nelson, Method for forming a tangible item and a tangible item formed by the method.
  10. Manuel,Mark, Method for producing a tool.
  11. Halliyal,Arvind; Singh,Bhanwar; Subramanian,Ramkumar, Scatterometry and acoustic based active control of thin film deposition process.
  12. John Francis Maguire ; John David Busbee ; Steven R. LeClair, Surface flaw detection using spatial raman-based imaging.
  13. Agnoli, Giovanni M.; Abt, John O.; Bowman, Samuel R.; Delwiche, James A.; Dillon, Jeffrey C.; Yanowitz, Andrew, Synchronized transmission of audio and video data from a computer to a client via an interface.
  14. Manuel,Mark; Greaves,Thomas N., System and a method for cooling a tool.
  15. Manuel,Mark, Tool and a method for creating a tool.
  16. Manuel,Mark; Greaves,Thomas N., Tool and a method for creating the tool.
  17. Manuel,Mark; Greaves,Thomas N., Tool and a method for making a tool.
  18. Manuel, Mark, Tool having an ejection assembly, a method for making such a tool, and a method for ejecting a formed object from a tool.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로