$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Optical recording medium

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B32B-003/00
출원번호 US-0153294 (1998-09-15)
우선권정보 JP-0273937 (1997-09-19)
발명자 / 주소
  • Utsunomiya Hajime,JPX
  • Kato Tatsuya,JPX
  • Inoue Hiroyasu,JPX
출원인 / 주소
  • TDK Corporation, JPX
대리인 / 주소
    Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보 피인용 횟수 : 43  인용 특허 : 3

초록

A method for recording/reproducing an optical recording medium of phase change type is provided. The method enables a high density recording while increase in the cross erase is suppressed. The method also enables an accurate tracking while increase in the crosstalk is suppressed. The method is adap

대표청구항

[ We claim:] [1.] A method for recording/reproducing an optical recording medium of phase change type comprising a substrate having a thickness of up to 0.8 mm wherein lands and grooves on opposite sides of the land are formed on the surface, and both the lands and the grooves are used as recording

이 특허에 인용된 특허 (3)

  1. Ohkawa Hideki (Yokohama JPX) Matsubara Motonari (Yokohama JPX) Yoshida Nobuhisa (Zushi JPX), Information recording medium.
  2. Takada Ken' Ichi,JPX ; Ohno Takashi,JPX ; Nobukuni Natsuko,JPX ; Horie Michikazu,JPX ; Kunitomo Haruo,JPX, Modulation of laser power in accordance with a linear velocity by pulse division schemes.
  3. Horie Michikazu (Yokohama JPX) Kunitomo Haruo (Yokohama JPX) Ohno Takashi (Yokohama JPX) Takada Kenichi (Yokohama JPX) Mizuno Hironobu (Yokohama JPX), Optical recording medium.

이 특허를 인용한 특허 (43)

  1. Ahn, Kie Y.; Forbes, Leonard, Atomic layer deposited hafnium tantalum oxide dielectrics.
  2. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Dielectrics containing at least one of a refractory metal or a non-refractory metal.
  3. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Dielectrics containing at least one of a refractory metal or a non-refractory metal.
  4. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Dielectrics containing at least one of a refractory metal or a non-refractory metal.
  5. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Hafnium lanthanide oxynitride films.
  6. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Hafnium lanthanide oxynitride films.
  7. Ahn, Kie Y.; Forbes, Leonard, Hafnium tantalum oxide dielectrics.
  8. Ahn, Kie Y.; Forbes, Leonard, Hafnium tantalum oxide dielectrics.
  9. Ahn, Kie Y.; Forbes, Leonard, Hafnium tantalum oxide dielectrics.
  10. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Hafnium tantalum oxynitride dielectric.
  11. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Hafnium tantalum oxynitride dielectric.
  12. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Hafnium tantalum oxynitride high-k dielectric and metal gates.
  13. Kondo,Tetsuya, Information recording medium.
  14. Ahn, Kie Y.; Forbes, Leonard, Lanthanum aluminum oxynitride dielectric films.
  15. Ahn,Kie Y.; Forbes,Leonard, Lanthanum aluminum oxynitride dielectric films.
  16. Ahn,Kie Y.; Forbes,Leonard, Lanthanum hafnium oxide dielectrics.
  17. Toru Fujii JP; Toshiaki Tajima JP; Yuji Tomizawa JP; Ryou Negishi JP; Emiko Hamada JP, Optical information medium and recording method therefor.
  18. Sakaue, Yoshitaka; Ohno, Eiji, Optical information recording medium.
  19. Usami, Yoshihisa, Optical information recording medium.
  20. Usami, Yoshihisa, Optical information recording medium.
  21. Sakaue,Yoshitaka; Nagata,Ken'ichi, Optical information recording medium, method for manufacturing the same and recording/reproduction method.
  22. Inoue Hiroyasu,JPX ; Kato Tatsuya,JPX ; Utsunomiya Hajime,JPX, Optical recording medium.
  23. Inoue, Hiroyasu; Hirata, Hideki, Optical recording medium.
  24. Ogata, Nobuo, Optical recording medium and optical pickup device.
  25. Tatsuya Kato JP; Isamu Kuribayashi JP; Hajime Utsunomiya JP; Takashi Kikukawa JP, Optical recording method.
  26. Kato,Tatsuya; Hirata,Hideki; Utsunomiya,Hajime; Inoue,Hiroyasu, Optical recording method and medium.
  27. Kato,Tatsuya; Utsunomiya,Hajime; Inoue,Hiroyasu; Shingai,Hiroshi; Tanaka,Yoshitomo, Optical recording method and optical recording medium.
  28. Kadowaki, Shin-ichi; Sano, Kousei; Ishibashi, Hiromichi; Furumiya, Shigeru, Optical storage medium, a tilt detection apparatus, and a data recording and reproducing apparatus.
  29. Nakamura Shigeru,JPX ; Nishida Tetsuya,JPX ; Miyamoto Makoto,JPX, Phase change optical disk medium.
  30. Ogawa Masatsugu,JPX, Phase change recording medium and method for recording therein and reproduction therefrom.
  31. Kim, Jin Yong, Recording medium having substrate with thickness dependent on numerical aperture of object lens, method of forming the optical medium and optical recording/reproducing apparatus.
  32. Kim,Jin Yong, Recording medium having substrate with thickness dependent on numerical aperture of object lens, method of forming the optical medium and optical recording/reproducing apparatus.
  33. Edwards, Jathan D.; Kerfeld, Donald J., Replica disk for data storage.
  34. Edwards, Jathan D.; Kerfeld, Donald J., Replica disk for data storage.
  35. Edwards, Jathan D.; Kerfeld, Donald J., Reverse optical mastering for data storage disk replicas.
  36. Edwards, Jathan D.; Kerfeld, Donald J., Reverse optical mastering for data storage disk replicas.
  37. Forbes,Leonard; Ahn,Kie Y.; Bhattacharyya,Arup, Silicon lanthanide oxynitride films.
  38. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Tantalum aluminum oxynitride high-K dielectric.
  39. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Tantalum aluminum oxynitride high-κ dielectric.
  40. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Tantalum lanthanide oxynitride films.
  41. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Tantalum silicon oxynitride high-K dielectrics and metal gates.
  42. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Tantalum silicon oxynitride high-K dielectrics and metal gates.
  43. Forbes, Leonard; Ahn, Kie Y.; Bhattacharyya, Arup, Tantalum silicon oxynitride high-k dielectrics and metal gates.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트