Energy filter, particularly for an electron microscope
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01J-037/26
출원번호
US-0145397
(1998-09-01)
우선권정보
DE-0038070 (1997-09-01)
발명자
/ 주소
Benner Gerd,DEX
출원인 / 주소
Leo Elektronenmikroskopie GmbH, DEX
인용정보
피인용 횟수 :
17인용 특허 :
7
초록▼
An energy filter, particularly for electron microscopes, in which the setting of different energy bandwidths takes place electron-optically. For this purpose, one or more deflecting systems and one or more transfer lenses are provided at the filter exit. A diaphragm arrangement is arranged in the di
An energy filter, particularly for electron microscopes, in which the setting of different energy bandwidths takes place electron-optically. For this purpose, one or more deflecting systems and one or more transfer lenses are provided at the filter exit. A diaphragm arrangement is arranged in the dispersion plane and has an opening with a stepped edge region. Slit diaphragms with different slit lengths can be simulated by deflection of the electron beam. The deflection of the electron beam effected by the dispersion system(s) perpendicularly to the dispersive direction of the filter is compensated again by a succeeding transfer lens or a further deflecting system, so that an image displacement is also compensated. In a second embodiment, a respective slit edge is arranged in two mutually conjugate spectrum planes. A deflecting system preceding each slit edge, different spectrum portions are filtered out by the two slit edges, according to the excitation of the deflecting systems. The energy bandwidth can be varied continuously in this embodiment.
대표청구항▼
[ I claim:] [1.] An energy filter having an exit image plane (BA) and a dispersion plane (S), comprising:a diaphragm arrangement (14, 27, 30) for energy selection in said dispersion plane (S) or in a plane (S') conjugate to said dispersion plane (S), andat least one deflecting system (12, 13; 12', 1
[ I claim:] [1.] An energy filter having an exit image plane (BA) and a dispersion plane (S), comprising:a diaphragm arrangement (14, 27, 30) for energy selection in said dispersion plane (S) or in a plane (S') conjugate to said dispersion plane (S), andat least one deflecting system (12, 13; 12', 13'; 12', 25) preceding said diaphragm arrangement (14, 27, 30), that effects a deflection of an electron beam, wherein setting of different energy bandwidths takes place by different excitation of said deflecting system (12, 13; 12', 13'; 12", 25, 28), which results in different deflections of said electron beam relative to said diaphragm arrangement (14, 27, 30).
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이 특허에 인용된 특허 (7)
Rose Harald (Darmstadt DEX) Lanio Stefan (Rossdorf DEX), Alpha-type electron energy filter.
Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximilian; Casares, Antonio, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximilian; Casares, Antonio, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximilian; Casares, Antonio; Rogers, Steven, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximilian; Casares, Antonio; Rogers, Steven, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximillian; Casares, Antonio; Rogers, Steven, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
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