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Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/00
출원번호 US-0741241 (1996-10-30)
발명자 / 주소
  • Raoux Sebastien
  • Tanaka Tsutomu
  • Kelkar Mukul
  • Ponnekanti Hari
  • Fairbairn Kevin
  • Cheung David
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Townsend & Townsend & Crew
인용정보 피인용 횟수 : 55  인용 특허 : 15

초록

An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber. The apparatus includes first and second members having opposing surfaces that define a fluid conduit between them. The fluid conduit includes an inlet, an outlet and a collection chamber between the inlet an

대표청구항

[ What is claimed is:] [1.] An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber, the apparatus comprising:first and second members having opposing surfaces defining a fluid conduit, the fluid conduit having an inlet, an outlet and a collection chamber between

이 특허에 인용된 특허 (15)

  1. Sherman Robert C. (Austin TX), Baffle/settling chamber for a chemical vapor deposition equipment.
  2. Krogh Ole D. (110 Point Lobos Ave. San Francisco CA 94121), ECR plasma source for gas abatement.
  3. Obuchi Akira (Tsukuba JPX) Yoshiyama Hidenori (Tsukuba JPX) Ohi Akihiko (Tsukuba JPX) Aoyama Hyogoro (Tsukuba JPX) Ohuchi Hideo (Tsukuba JPX) Ogata Atsushi (Tsukuba JPX) Mizuno Koichi (Ibaraki JPX) M, Exhaust gas cleaner.
  4. Pollock James F. (Old Windsor GBX), Exhaust particulate filter.
  5. Kurokawa Takashi (Yokohama JPX), Exhaust system for chemical vapor deposition apparatus.
  6. Maeba Yoshiyasu (Samukawa JPX) Toyoda Satoru (Chigasaki JPX) Naruse Humio (Yokohama JPX), Fine particle collector trap for vacuum evacuating system.
  7. Ogawa Yoshifumi (Kudamatsu JPX) Nishiumi Masaharu (Kudamatsu JPX) Tanaka Yoshie (Kudamatsu JPX) Okudaira Sadayuki (Oume JPX) Nishimatsu Shigeru (Kokubunji JPX), Method and apparatus for monitoring etching.
  8. Gu Youfan, Method and apparatus for reducing build-up of material on inner surface of tube downstream from a reaction furnace.
  9. Chiu Kin-Chung R. (Scotts Valley CA), Method and system for vapor extraction from gases.
  10. Kelly Eugene P. (Spring Valley CA) Russell Stephen D. (San Diego CA) Sexton Douglas A. (San Diego CA), Method of rapid sample handling for laser processing.
  11. Russell Stephen D. (San Diego CA) Sexton Douglas A. (San Diego CA), Photon controlled decomposition of nonhydrolyzable ambients.
  12. Lee Young H. (Somers NY), Plasma reactor for processing substrates.
  13. Blalock Guy T. (Boise ID), Removal of carbon-based polymer residues with ozone, useful in the cleaning of plasma reactors.
  14. Kanter Ira E. (Monroeville PA) Hundstad Richard L. (Forest Hills Boro PA), Stack gas emissions control system.
  15. Wang David N. (Cupertino) White John M. (Hayward) Law Kam S. (Union City) Leung Cissy (Union City) Umotoy Salvador P. (Pittsburg) Collins Kenneth S. (San Jose) Adamik John A. (San Ramon) Perlov Ilya , Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planar.

이 특허를 인용한 특허 (55)

  1. Thomas L. Ritzdorf ; Steve L. Eudy ; Gregory J. Wilson ; Paul R. McHugh, Apparatus and method for electrochemical processing of a microelectronic workpiece, capable of modifying processing based on metrology.
  2. Ritzdorf, Thomas L.; Eudy, Steve L.; Wilson, Gregory J.; McHugh, Paul R., Apparatus and method for processing a microelectronic workpiece using metrology.
  3. Ritzdorf,Thomas L.; Eudy,Steve L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and method for processing a microelectronic workpiece using metrology.
  4. Hanson,Kyle M., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  5. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  6. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  7. Pang, Ben; Cheung, David; Taylor, Jr., William N.; Raoux, Sebastien; Fodor, Mark, Apparatus for cleaning an exhaust line in a semiconductor processing system.
  8. Lau, Wesley George, Cleaning process residues from substrate processing chamber components.
  9. Chen, Lee; Funk, Merritt, DC and RF hybrid processing system.
  10. Hosch, Jimmy W.; Goeckner, Matthew J.; Whelan, Mike; Kueny, Andrew Weeks; Harvey, Kenneth C.; Thamban, P.L. Stephan, Electron beam exciter for use in chemical analysis in processing systems.
  11. Cheung, David; Fang, Haoquan; Kuo, Jack; Kalinovski, Ilia; Li, Ted; Yao, Andrew, Enhanced passivation process to protect silicon prior to high dose implant strip.
  12. Huseinovic, Armin; Berry, Ivan L., Fluid distribution members and/or assemblies.
  13. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  14. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  15. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  16. Carlson, David K., In situ cleaning of CVD System exhaust.
  17. Powell, Gary, Inductively coupled plasma spectrometer for process diagnostics and control.
  18. Cheung, David; Li, Ted; Guha, Anirban; Ostrowski, Kirk, Low damage photoresist strip method for low-K dielectrics.
  19. Powell,Gary B.; Litvak,Herbert E., Method and apparatus for chemical monitoring.
  20. Pang, Ben; Cheung, David; Taylor, Jr., William N.; Raoux, Sebastion; Fodor, Mark, Method and apparatus for cleaning an exhaust line in a semiconductor processing system.
  21. Gore, Dhananjay Ashok; Ji, Tingfang; Kadous, Tamer, Method and apparatus for pilot communication in a multi-antenna wireless communication system.
  22. Cheung, David; Raoux, Sebastien; Huang, Judy H.; Taylor, Jr., William N.; Fodor, Mark; Fairbairn, Kevin, Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions.
  23. Powell, Gary; Hazard, Richard L., Method and device utilizing plasma source for real-time gas sampling.
  24. Powell,Gary; Hazard,Richard L., Method and device utilizing plasma source for real-time gas sampling.
  25. Powell, Gary, Method and device utilizing real-time gas sampling.
  26. Powell, Gary, Method and device utilizing real-time gas sampling.
  27. Chen, David L.; Su, Yuh-Jia; Chiu, Eddie Ka Ho; Pozzoli, Maria Paola; Li, Senzi; Colangelo, Giuseppe; Alba, Simone; Petroni, Simona, Method for post-etch cleans.
  28. Calvin Todd Gabriel, Method for reducing the amount of perfluorocompound gas contained in exhaust emissions from plasma processing.
  29. Yamamoto, Tetsuo; Kato, Tsutomu; Okada, Satoshi; Takebayashi, Yuji, Method of manufacturing semiconductor device.
  30. Namose, Isamu, Method of processing PFC and apparatus for processing PFC.
  31. Smith, James Robert; Seeley, Andrew James; Baker, Derek Martin; Radoiu, Marilena, Method of treating a gas stream.
  32. Ritzdorf,Thomas L.; Eudy,Steve L.; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Aegerter,Brian; Dundas,Curt; Peace,Steven L., Methods and apparatus for processing microelectronic workpieces using metrology.
  33. Chen, David; Goto, Haruhiro Harry; Martina, Martina; Greer, Frank; Alokozai, Shamsuddin, Methods for stripping photoresist and/or cleaning metal regions.
  34. Chen, David; Goto, Haruhiro Harry; Su, Martina; Greer, Frank; Alokozai, Shamsuddin, Methods for stripping photoresist and/or cleaning metal regions.
  35. Slingerland, Hendrik Nicolaas; Knowles, William Ralph, Particle optical apparatus with a predetermined final vacuum pressure.
  36. Thedjoisworo, Bayu Atmaja; Jacobs, Bradley Jon; Berry, Ivan; Cheung, David, Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films.
  37. Goto, Haruhiro Harry; Kalinovski, Ilia; Mohamed, Khalid, Photoresist strip method for low-k dielectrics.
  38. Shaviv, Roey; Ostrowski, Kirk; Cheung, David; Park, Joon; Thedjoisworo, Bayu; Lord, Patrick J., Photoresist strip processes for improved device integrity.
  39. Becknell, Alan Frederick; Buckley, Thomas James; Ferris, David; Pingree, Jr., Richard E.; Sakthivel, Palanikumaran; Srivastava, Aseem Kumar; Waldfried, Carlo, Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith.
  40. Srivastava, Aseem Kumar; Sakthivel, Palanikumaran; Buckley, Thomas James, Plasma ashing apparatus and endpoint detection process.
  41. Cheung, David; Ostrowski, Kirk J, Plasma based photoresist removal system for cleaning post ash residue.
  42. Cheung, David; Ostrowski, Kirk J., Plasma based photoresist removal system for cleaning post ash residue.
  43. Kitani, Ryouta; Nunomura, Nobuhide; Morioka, Yasukiyo; Yoshigai, Motohiko, Plasma processing apparatus.
  44. Radoiu, Marilena, Plasma treatment device.
  45. Kholodenko, Arnold V.; Katz, Dan; Cheng, Wing L., Process chamber having multiple gas distributors and method.
  46. Srivastava, Aseem K.; DiVergilio, William F., RF coupled plasma abatement system comprising an integrated power oscillator.
  47. Shen, Meihua; Jiang, Wei-nan; Yauw, Oranna; Chinn, Jeffrey, Self-cleaning process for etching silicon-containing material.
  48. Shamouilian, Shamouil; Lai, Canfeng; Cox, Michael Santiago; Krishnaraj, Padmanabhan; Tanaka, Tsutomu; Raoux, Sebastien; Porshnev, Peter I.; Nowak, Thomas, Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas.
  49. Goto, Haruhiro Harry; Cheung, David, Simultaneous front side ash and backside clean.
  50. Långström, Bengt; Sjöberg, Carl-Olof, System for controlling environment in a reaction box.
  51. Wilson, Gregory J.; McHugh, Paul R.; Hanson, Kyle M., System for electrochemically processing a workpiece.
  52. Alexei Ermakov ; Barbara Jane Hinch, Three coil apparatus for inductive measurements of conductance.
  53. Norihiko Nomura JP; Nobuharu Noji JP, Trap apparatus.
  54. Cheung, David; Fang, Haoquan; Kuo, Jack; Kalinovski, Ilia; Li, Zhao; Yao, Guhua; Guha, Anirban; Ostrowski, Kirk J., Ultra low silicon loss high dose implant strip.
  55. Wilson,Gregory J.; McHugh,Paul R.; Hanson,Kyle M., Workpiece processor having processing chamber with improved processing fluid flow.
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