초록 ▼

A high purity titanium polycrystalline target with uniform grain size and near ideal (103) crystallographic orientation and a method of making. Uniform grain size from 10 .mu.m-500 .mu.m is achieved by using a fine grain five inch diameter titanium billet produced by hot working an electron beam cas

A high purity titanium polycrystalline target with uniform grain size and near ideal (103) crystallographic orientation and a method of making. Uniform grain size from 10 .mu.m-500 .mu.m is achieved by using a fine grain five inch diameter titanium billet produced by hot working an electron beam cast billet. Greater than 80% (103) crystallographic orientation is achieved while maintaining uniform and optimal grain size in the target. The result is a higher collimated deposition rate with increased efficiency of bottom coverage of vias and a highly (002) oriented titanium film.

대표청구항 ▼

[ Having described the invention, what is claimed is:] [1.] A method of making a titanium sputtering target comprisingsubjecting a titanium billet having the following crystollographic orientation of grains: 0-25% (100), <5% (002) 15-20% (101), <10% (102),20-70% (110), <5% (103) and 5-30% (112), to

[ Having described the invention, what is claimed is:] [1.] A method of making a titanium sputtering target comprisingsubjecting a titanium billet having the following crystollographic orientation of grains: 0-25% (100), <5% (002) 15-20% (101), <10% (102),20-70% (110), <5% (103) and 5-30% (112), to a controlled deformation and a heat treatment to obtain a fine grain titanium body;hot forging said body to form a pancake;cold working said pancake to form a blank; andheat treating said blank.