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Wafer handler for multi-station tool 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B25J-018/04
출원번호 US-0141180 (1998-08-27)
발명자 / 주소
  • Moslehi Mehrdad M.
출원인 / 주소
  • CVC Products, Inc.
대리인 / 주소
    Eugene Stephens & Associates
인용정보 피인용 횟수 : 32  인용 특허 : 13

초록

A robotic wafer handler is mounted on a central platform of a cluster tool for transporting wafers between loading and processing stations. The wafer handler includes a main arm that is rotatable around a vertical axis, translatable along the vertical axis, and translatable along a horizontal axis t

대표청구항

[ I claim:] [1.] A robotic handler mountable on a platform that interconnects loading and processing stations of a tool for processing wafers comprising:a main arm mountable on the platform and having a first end effector for supporting a first wafer;a first drive for rotating said main arm with res

이 특허에 인용된 특허 (13)

  1. Prentakis Antonios E. (Cambridge MA), Apparatus and method for loading and unloading wafers.
  2. Lamont ; Jr. Lawrence T. (Mountain View CA), Apparatus for thermal treatment of a wafer in an evacuated environment.
  3. Shiraiwa Hirotsugu (Hino JPX), Conveyor apparatus.
  4. Kazama Kouichi (Yamanashi-ken JPX) Komino Mitsuaki (Tokyo JPX) Ishikawa Kenji (Sagamihara JPX) Ueda Yoichi (Yokohama JPX), Method of controlling temperature of susceptor.
  5. Moslehi Mehrdad M. (Dallas TX), Multipurpose low-thermal-mass chuck for semiconductor processing equipment.
  6. Watanabe Katsuhide (Fujisawa JPX) Kanemitsu Yoichi (Chigasaki JPX) Shinozaki Hiroyuki (Fujisawa JPX) Hiraki Naoji (Iizuka JPX) Moriyama Shinichi (Iizuka JPX), Robot with dust-free and maintenance-free actuators.
  7. Taniguchi Takao (Fukuoka JPX) Sato Hiroshi (Fukuoka JPX), Semiconductor substrate transport arm for semiconductor substrate processing apparatus.
  8. Araki Shinichiro (Kumamoto JPX), Semiconductor treatment system and method for exchanging and treating substrate.
  9. Ishida Toshimichi (Hirakata JPX) Suzuki Masaki (Hirakata JPX), Substrate transfer apparatus.
  10. Lakios Emmanuel N. (Port Jefferson Station NY) McGraw Michael F. (East Setauket NY), Substrate transport and cooling apparatus and method for same.
  11. Davis ; Jr. James C. (Carlisle MA) Hofmeister Christopher A. (Hampstead NH), Substrate transport apparatus with dual substrate holders.
  12. Nishi Hironobu (Sagamihara JPX), Transfer device.
  13. Thompson Steven R. (Somers MT) LaBere Rikki S. (Kalispell MT), Wafer transfer apparatus.

이 특허를 인용한 특허 (32)

  1. Dennis Clixby ; Glenn Pocock, Acid etching machine.
  2. Lenz, Eric H., Airflow management for low particulate count in a process tool.
  3. Lenz, Eric H., Airflow management for low particulate count in a process tool.
  4. Tateyama, Kiyohisa; Takamori, Hideyuki, Apparatus for and method of transferring substrates.
  5. Tateyama, Kiyohisa; Takamori, Hideyuki, Apparatus for and method of transferring substrates.
  6. Meulen, Peter van der, Batch substrate handling.
  7. James A. Cameron ; Steven G. Reyling, Dual arm substrate handling robot with a batch loader.
  8. Vopat, Robert B.; Schaller, Jason M.; Blahnik, Jeffrey Charles; Daniel, Jr., Malcolm N., Dynamic pitch substrate lift.
  9. Ma Edmund L. ; Lada Christopher O. ; Langhans Donald H., End effector for substrate handling.
  10. Lero,Christophe; Astegno,Pierre; Gaudon,Alain, FOUP door transfer system.
  11. Lenz, Eric H., High throughput cleaner chamber.
  12. Meulen, Peter van der, Linear semiconductor processing facilities.
  13. van der Meulen, Peter, Linear semiconductor processing facilities.
  14. Cameron,James A.; Reyling,Steven G., Method of removing substrates from a storage site and a multiple substrate batch loader.
  15. van der Meulen,Peter, Methods and systems for handling a workpiece in vacuum-based material handling system.
  16. van der Meulen, Peter, Mid-entry load lock for semiconductor handling system.
  17. Lenz, Eric H., Reduction of particle contamination produced by moving mechanisms in a process tool.
  18. Wood, Eric R.; Crabb, Richard; Alexander, James A., Semiconductor handling robot with improved paddle-type end effector.
  19. Wood,Eric R.; Crabb,Richard; Alexander,James A., Semiconductor handling robot with improved paddle-type end effector.
  20. van der Meulen, Peter, Semiconductor manufacturing systems.
  21. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  22. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  23. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.
  24. Hunter, Reginald, Sensor device for non-intrusive diagnosis of a semiconductor processing system.
  25. Hunter,Reginald, Sensor device for non-intrusive diagnosis of a semiconductor processing system.
  26. Hunter,Reginald, Sensor device for non-intrusive diagnosis of a semiconductor processing system.
  27. van der Meulen, Peter, Stacked process modules for a semiconductor handling system.
  28. van der Meulen,Peter, Stacked process modules for a semiconductor handling system.
  29. Lenz, Eric H., Substrate load and unload mechanisms for high throughput.
  30. Yamagishi, Takayuki; Kobayashi, Tamihiro; Watanabe, Akira; Kaneuchi, Kunihiro, Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus.
  31. Ogawa Hironori,JPX ; Kamitani Masashi,JPX, Transfer robot.
  32. Ozawa, Jun; Hirose, Jun; Hirose, Eiji; Koizumi, Hiroshi, Vacuum treatment device.
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