초록 ▼

Ultraviolet and vacuum ultraviolet radiators for use in the manufacture of semiconductors are provided which have improved lifetimes, improved distribution of radiation generation, improved distribution of emitted radiation, increased efficiency of radiation emission, and improved means for cooling.

Ultraviolet and vacuum ultraviolet radiators for use in the manufacture of semiconductors are provided which have improved lifetimes, improved distribution of radiation generation, improved distribution of emitted radiation, increased efficiency of radiation emission, and improved means for cooling. The radiators have novel electrodes, novel electrode configurations, novel means for distributing plasmas between electrodes, and have novel cooling means. These features enable the miniaturization of the radiators permitting high-intensity and uniform radiation exposure of planar surfaces. The radiators are used in the pre-treatment of semiconductor surfaces, the deposition of semiconductor thin films, and the post-deposition processing of semiconductor thin films.

대표청구항 ▼

[ What is claimed is:] [1.] A silent discharge radiator comprising:at least two electrodes;walls delimiting a discharge space containing said electrodes, said discharge space being adapted to be filled with a gas capable of emitting radiation under dielectric discharge conditions, at least one wall

[ What is claimed is:] [1.] A silent discharge radiator comprising:at least two electrodes;walls delimiting a discharge space containing said electrodes, said discharge space being adapted to be filled with a gas capable of emitting radiation under dielectric discharge conditions, at least one wall of said discharge space being substantially transparent to a wavelength of the emitted radiation;wherein at least one of said electrodes comprises a conducting element imbedded within a dielectric materialhaving physical discontinuities.