초록 ▼

A reticle cleaning apparatus for a wafer exposure system includes a chamber enclosing the reticle, a door opening and closing at least one side of the chamber, a door switching member opening and closing the door coupled to the chamber including the door, a gas injection nozzle at an upper portion o

A reticle cleaning apparatus for a wafer exposure system includes a chamber enclosing the reticle, a door opening and closing at least one side of the chamber, a door switching member opening and closing the door coupled to the chamber including the door, a gas injection nozzle at an upper portion of the chamber, a nozzle transport member moving the gas injection nozzle in a vertical direction, a gas supply member supplying a cleaning gas into the gas injection nozzle, an ion injection nozzle over the gas injection nozzle, an ion supply member supplying ions into the ion injection nozzle, and a drain member draining the cleaning gas outside the chamber.

대표청구항 ▼

[ What is claimed is:] [1.] A reticle cleaning apparatus for a wafer exposure system, comprising:a chamber enclosing the reticle;a door opening and closing at least one side of the chamber;a door switching member opening and closing the door coupled to the chamber including the door;a gas injection

[ What is claimed is:] [1.] A reticle cleaning apparatus for a wafer exposure system, comprising:a chamber enclosing the reticle;a door opening and closing at least one side of the chamber;a door switching member opening and closing the door coupled to the chamber including the door;a gas injection nozzle at an upper portion of the chamber;a nozzle transport member moving the gas injection nozzle in a vertical direction;a gas supply member supplying a cleaning gas into the gas injection nozzle;an ion injection nozzle over the gas injection nozzle;an ion supply member supplying ions into the ion injection nozzle; anda drain member draining the cleaning gas outside the chamber.