초록 ▼

A semiconductor manufacture apparatus extending chemical life and reducing chemical replenishing amounts, continuously removes excessive moisture content generated by reaction within the apparatus and can perform cleaning and stripping with stable cleaning performance and stripping performance as a

A semiconductor manufacture apparatus extending chemical life and reducing chemical replenishing amounts, continuously removes excessive moisture content generated by reaction within the apparatus and can perform cleaning and stripping with stable cleaning performance and stripping performance as a result of removing moisture content in the chemicals. The semiconductor manufacture apparatus is adapted for cleaning a semiconductor substrate or stripping a photoresist applied on the surface of the semiconductor substrate by chemicals, with a moisture separating device preferentially separating moisture content from the chemicals being provided within a passage for recirculating the chemicals within the apparatus.

대표청구항 ▼

[ What is claimed is:] [1.] A semiconductor manufacture apparatus adapted for cleaning a semiconductor substrate and stripping a photoresist applied on the surface of said semiconductor substrate by a sulfuric acid and hydrogen peroxide chemical mixture in a first bath, comprising:a moisture separat

[ What is claimed is:] [1.] A semiconductor manufacture apparatus adapted for cleaning a semiconductor substrate and stripping a photoresist applied on the surface of said semiconductor substrate by a sulfuric acid and hydrogen peroxide chemical mixture in a first bath, comprising:a moisture separating device preferentially separating a moisture content from said sulfuric acid and hydrogen peroxide chemical mixture, provided within a passage for recirculating said chemical mixture within the apparatus to the first bath.