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Substrate processing apparatus with small batch load lock 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-001/10
출원번호 US-0049314 (1998-03-27)
발명자 / 주소
  • Adams Douglas R.
출원인 / 주소
  • Brooks Automation, Inc.
대리인 / 주소
    Perman & Green, LLP
인용정보 피인용 횟수 : 72  인용 특허 : 14

초록

A substrate load lock comprising a frame and a substrate support movably mounted to the frame. The frame forms at least three chambers. The substrate support has at least two separate support areas. The first one of the support areas is movable between the first one of the chambers. A second one of

대표청구항

[ What is claimed is:] [1.] A substrate load lock comprising:a frame forming at least three chambers; anda substrate support movably mounted to the frame to move relative to the frame from an initial position toa final position, the substrate support having at least two separate support areas, a fir

이 특허에 인용된 특허 (14)

  1. Trillwood Richard E. (Histon GB2), Apparatus for transferring work through a region of reduced pressure for the performance of an operation thereon.
  2. Muka Richard S. (Topsfield MA) Pippins Michael W. (Hamilton MA) Drew Mitchell A. (Portsmouth NH), Batchloader for substrate carrier on load lock.
  3. Bonora Anthony C. (Menlo Park CA) Oen Joshua T. (Newark CA), Direct loadlock interface.
  4. Bonora Anthony C. ; Neads Michael A. ; Oen Joshua T., Method and apparatus for vertical transfer of a semiconductor wafer cassette.
  5. Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Hawkins Mark R. (Mesa AZ) Goodwin Dennis L. (Tempe AZ) Ferro Armand P. (Scottsdale AZ), Method for loading a substrate into a GVD apparatus.
  6. Saeki Hiroaki,JPX, Positioning apparatus and process system having the same.
  7. Maher Joseph A. (South Hamilton MA) Vowles E. John (Goffstown NH) Napoli Joseph D. (Winham NH) Zafiropoulo Arthur W. (Manchester MA) Miller Mark W. (Burlington MA), Quad processor.
  8. Bell ; Jr. Harold S. (Madison NJ), Solids feeder apparatus.
  9. Iwai Hiroyuki (Sagamihara JPX) Tanifuji Tamotsu (Yamato JPX) Asano Takanobu (Yokohama JPX) Okura Ryoichi (Kanagawa-ken JPX), Treatment apparatus.
  10. Maydan Dan ; Somekh Sasson ; Sinha Ashok ; Fairbairn Kevin ; Lane Christopher ; Colborne Kelly ; Ponnekanti Hari K. ; Taylor W. N.(Nick), Ultra high throughput wafer vacuum processing system.
  11. Kato Shigekazu (Kudamatsu JPX) Nishihata Kouji (Tokuyama JPX) Tsubone Tsunehiko (Hikari JPX) Itou Atsushi (Kudamatsu JPX), Vacuum processing apparatus and operating method therefor.
  12. Turner Norman L. (Mountain View CA) White John M. (Hayward CA), Vacuum processing apparatus having improved throughput.
  13. Blum Rick ; Fairbairn Kevin ; Lane Christopher, Vertical dual loadlock chamber.
  14. Turner Frederick T. (Sunnyvale CA) Hutchinson Martin A. (Santa Clara CA) Shaw R. H. (Palo Alto CA) Lamont ; Jr. Lawrence T. (Mountain View CA), Wafer coating system.

이 특허를 인용한 특허 (72)

  1. Malin, Cosmas G., Air-conditioned storage cupboard.
  2. Malin, Cosmas, Automated substance storage.
  3. Malin,Cosmas G., Automatic storage device and climate controlled cabinet with such a device.
  4. Meulen, Peter van der, Batch substrate handling.
  5. van der Meulen, Peter, Batch wafer alignment.
  6. van der Meulen, Peter, Bypass thermal adjuster for vacuum semiconductor processing.
  7. Lee,Jae Chull; Berkstresser,David, Curved slit valve door with flexible coupling.
  8. Lee, Jae-Chull; Kurita, Shinichi; White, John M.; Anwar, Suhail, Decoupled chamber body.
  9. Kurita, Shinichi; Blonigan, Wendell T., Double dual slot load lock chamber.
  10. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  11. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  12. Talmer, Mark A., Fast swap dual substrate transport for load lock.
  13. Talmer, Mark A., Fast swap dual substrate transport for load lock.
  14. Talmer, Mark A., Fast swap dual substrate transport for load lock.
  15. Talmer,Mark A., Fast swap dual substrate transport for load lock.
  16. DiPerna, Paul M, Flow regulating stopcocks and related methods.
  17. DiPerna, Paul M.; Brown, David; Rosinko, Mike; Kincade, Dan; Michaud, Michael; Nadworny, John; Kruse, Geoffrey A.; Ulrich, Thomas R., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  18. DiPerna, Paul M.; Brown, David; Rosinko, Mike; Kincade, Dan; Michaud, Michael; Nadworny, John; Kruse, Geoffrey A.; Ulrich, Thomas R., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  19. Michaud, Michael; Kruse, Geoffrey A., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  20. Michaud, Michael; Kruse, Geoffrey A., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
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  22. Kurita, Shinichi; Blonigan, Wendell T.; Tanase, Yoshiaki, Large area substrate transferring method for aligning with horizontal actuation of lever arm.
  23. Meulen, Peter van der, Linear semiconductor processing facilities.
  24. van der Meulen, Peter, Linear semiconductor processing facilities.
  25. Klomp,Albert Jan Hendrik; Hoogkamp,Jan Frederik; Vugts,Josephus Cornelius Johannes Antonius; Livesey,Robert Gordon; Franssen,Johannes Hendrikus Gertrudis, Lithographic projection assembly, load lock and method for transferring objects.
  26. Klomp, Albert Jan Hendrik; Hoogkamp, Jan Frederik; Vugts, Josephus Cornelius Johannes Antonius; Livesey, Robert Gordon; Franssen, Johannes Hendrikus Gertrudis, Load lock and method for transferring objects.
  27. Kurita,Shinichi; Blonigan,Wendell T.; Tanase,Yoshiaki, Load lock chamber for large area substrate processing system.
  28. Kurita,Shinichi; Blonigan,Wendell T., Load lock chamber having two dual slot regions.
  29. Lee, Jae-Chull; Anwar, Suhail; Kurita, Shinichi, Load lock chamber with decoupled slit valve door seal compartment.
  30. Aggarwal, Ravinder K.; Stoutjesdijk, Jeroen; Hill, Eric R.; Davis, Loring G.; DiSanto, John T., Load lock having secondary isolation chamber.
  31. Aggarwal, Ravinder; Stoutjesdijk, Jeroen; Hill, Eric; Davis, Loring G.; DiSanto, John T., Load lock having secondary isolation chamber.
  32. Hofmeister Christopher A., Load lock with vertically movable support.
  33. Hiroaki Saeki JP, Load-lock mechanism and processing apparatus.
  34. Malin, Cosmas G., Low-temperature storage device with rotating lock chamber.
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  42. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
  43. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
  44. Sundar, Satish; Matthews, Ned G., Pneumatically actuated flexure gripper for wafer handling robots.
  45. Hirano, Shinichi, Processing apparatus with conveyer and controller to output request signal and stop instruction signal.
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  49. Miller, Mark C., Sample introduction and transfer system and method.
  50. Kyogoku, Mitsusuke; Yamagishi, Takayuki, Sealing mechanism of multi-chamber load-locking device.
  51. van der Meulen, Peter, Semiconductor manufacturing systems.
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  56. Theriault, Victor J.; Ives, Mark, Single substrate load lock with offset cool module and buffer chamber.
  57. DiPerna, Paul M., Slideable flow metering devices and related methods.
  58. Brown, David, Solute concentration measurement device and related methods.
  59. Borden, Peter G., Stacked load-lock apparatus and method for high throughput solar cell manufacturing.
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  61. van der Meulen,Peter, Stacked process modules for a semiconductor handling system.
  62. Masayuki Toda JP; Masaki Kusuhara JP; Masaru Umeda JP; Michio Yagai JP, Substrate body transfer apparatus.
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  65. Kaji, Tetsunori; Uchimaki, Yoichi; Egawa, Yuko, System for producing wafers.
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  67. Kroeker Tony R., Three chamber load lock apparatus.
  68. Tony R. Kroeker, Three chamber load lock apparatus.
  69. Kuroda, Osamu; Ogami, Takayuki, Transferring apparatus and substrate processing apparatus.
  70. DiPerna, Paul M., Two chamber pumps and related methods.
  71. Bertram, Jr., Ronald Thomas; Arena, Chantal; Werkhoven, Christiaan J.; Tischler, Michael Albert; Vorsa, Vasil; Johnson, Andrew D., UV absorption based monitor and control of chloride gas stream.
  72. Kim, Sam Hyungsam; Lee, Jae-Chull; Sterling, William N.; Brown, Paul, Valve door with ball coupling.
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