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Semiconductor thermal processor with recirculating heater exhaust cooling system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F27D-015/02
출원번호 US-0022057 (1998-02-10)
발명자 / 주소
  • Bolton Douglas A.
  • Wiesen Patrick W.
출원인 / 주소
  • Silicon Valley Group, Inc.
대리인 / 주소
    Wilson Sonsini Goodrich & Rosati
인용정보 피인용 횟수 : 14  인용 특허 : 39

초록

In summary, the vertical rapid cooling furnace of this invention for treating semiconductor wafers with self contained gas chilling and recycling comprises a hot wall reaction tube positioned within a cylindrical array of heating coils. Space between the hot wall reaction tube and said array of heat

대표청구항

[ The invention claimed is:] [1.] A vertical rapid cooling furnace for treating semiconductor wafers with self contained gas chilling and recycling comprising:a hot-wall reaction tube positioned within a cylindrical array of heating coils, spacing between the hot wall reaction tube and said array of

이 특허에 인용된 특허 (39)

  1. Ban Vladimir Sinisa (Hopewell NJ) Gilbert Stephen Lee (Concord VT), Apparatus for chemical vapor deposition.
  2. Sakai Takamasa (Kyoto JPX) Muraoka Yuusuke (Kyoto JPX), Apparatus for heat treating substrates.
  3. Iseki Izuru (Kyoto JPX) Higashi Akihiro (Kyoto JPX) Sasaki Seihiro (Kyoto JPX), Apparatus for heat treating substrates capable of quick cooling.
  4. Muraoka Yusuke (Hazukashi JPX) Tamada Atsushi (Hazukashi JPX) Sakai Takamasa (Tenjinkita JPX) Haibara Hitoshi (Hazukashi JPX) Nakagawa Keiji (Hazukashi JPX), Apparatus for heat-treating wafers.
  5. Nunotani Shinji (Kanagawa JPX) Takahashi Koichi (Kanagawa JPX) Miyashita Naoto (Kanagawa JPX), Device for thermal treatment and film forming process.
  6. Abell R. Bruce (Algonquin IL), Electric furnace insulation.
  7. Monoe Osamu (Sagamihara JPX), Forced cooling apparatus for heat treatment apparatus.
  8. Monoe Osamu (Sagamihara JPX), Forced cooling apparatus for heat treatment apparatus.
  9. Monoe Osamu (Sagamihara JPX), Forced cooling apparatus for heat treatment apparatus.
  10. Moller Craig A. (Roscoe IL), Gas cooling system for processing furnace.
  11. Uchida Yoshinobu (Hachioji JPX), Heat processing apparatus utilizing a plurality of stacked heater holders.
  12. Kitayama Hirofumi (Aiko-gun JPX) Shibata Toshimitu (Yokohama JPX) Miyaju Toshiaki (Tsukui-gun JPX) Miyagi Katsushin (Sagamihara JPX), Heat treating apparatus.
  13. Nakao Ken (Sagamihara JPX), Heat treating apparatus with cooling fluid nozzles.
  14. Nakao Ken (Sagamihara JPX), Heat treatment apparatus.
  15. Ohkase Wataru,JPX, Heat treatment apparatus and method.
  16. Monoe Osamu (Sagamihara JPX), Heat treatment apparatus and method thereof.
  17. Watanabe Shingo (Kanagawa JPX) Mizukami Mitsuo (Sagamihara JPX) Nishi Hironobu (Sagamihara JPX), Heat treatment boat support.
  18. Nakao Ken (Tokyo JPX) Sakurai Seiji (Yokohama JPX) Miyahara Yoshihisa (Yokohama JPX) Motoyoshi Yoshiyuki (Yokohama JPX), Heating apparatus.
  19. Taheri Ramtin (P.O. Box 4316 Santa Clara CA 95056), Heating chamber.
  20. McEntire William D. (Sonora CA) Erickson Ronald E. (Modesto CA), High temperature diffusion furnace.
  21. McEntire William D. (Sonora CA) Erickson Ronald E. (Modesto CA), High temperature diffusion furnace.
  22. Nishi Katsuo (Tokyo JPX) Terada Kazuo (Kumamoto-ken JPX) Ohkase Wataru (Sagamihara JPX) Yamaga Kenichi (Sagamihara JPX), Method and apparatus for controlling temperature in rapid heat treatment system.
  23. Hugues Jean B. (Tempe AZ) Weber Lynn (Saratoga CA) Herlinger James E. (Palo Alto CA) Nishikawa Katsuhito (San Jose CA) Schuman Donald L. (Saratoga CA) Yee Gary W. (Santa Clara CA), Method and apparatus for transferring wafers between cassettes and a boat.
  24. Arima Noburu (Kubiki JPX) Ogino Nobuyosi (Tokyo JPX) Kimura Hirosi (Takefu JPX), Method of forming thin film and apparatus therefor.
  25. Engelke Roger P. (Huntsville AL), Open-coil heater assembly and insulator therefor.
  26. Learn, Arthur J.; Du Bois, Dale R.; Miller, Nicholas E.; Seilheimer, Richard A., Primary flow CVD apparatus comprising gas preheater and means for substantially eddy-free gas flow.
  27. Miller Edward A. (Morrisville PA), RF Heating coil construction for stack of susceptors.
  28. Ban Vladimir S. (Hopewell NJ), Radiation heated reactor for chemical vapor deposition on substrates.
  29. Sibley Thomas (5439 McCommas Dallas TX 75206), Silicon carbide carrier for wafer processing in vertical furnaces.
  30. Cottrell Merlyn F. (Winneconne WI) Tegelman ; Jr. Harold (Winneconne WI) Holmes Ronald E. (Winneconne WI) Hofferber John R. (Weyauwega WI), Stand-off for resistance wires.
  31. Ueno Seiko (Mizusawa JPX) Nakao Ken (Sagamihara JPX) Yamabe Kikuo (Yokohama JPX) Imai Keitaro (Kawasaki JPX), Substrate heating method utilizing heating element control to achieve horizontal temperature gradient.
  32. Koble ; Jr. Terry A. (Lake Forest CA) Dip Anthony (Austin TX) Engdahl Erik H. (Anaheim CA) Oliver Ian R. (San Diego CA) Ratliff Christopher T. (Corona del Mar CA), Thermal processing apparatus and process.
  33. Porter Cole D. (San Jose CA) Sanchez Jessie R. (San Jose CA) Kowalski Jeffrey M. (Dove Canyon CA), Thermal processing apparatus and process.
  34. Porter Cole D. (San Jose CA) Sanchez Jessie R. (San Jose CA) Kowalski Jeffrey M. (San Jose CA), Thermal processing apparatus and process.
  35. Hidano Masaru (Yokohama JPX) Miura Yasuaki (Hachioji JPX) Yokokawa Osamu (Tsukui JPX), Thermal processing furnace and fabrication method thereof.
  36. Bailey Dane E. (Dallas TX) Tang Thomas E. (Dallas TX), Vertical LPCVD reactor.
  37. Mizushina Youichi (Kawasaki JPX), Vertical furnace for heat-treating semiconductor.
  38. Nakayama Junichi (Kanagawa-Ken JPX) Hidano Masaru (Kanagawa-Ken JPX), Vertical heat treatment apparatus.
  39. Koyama Mitsutoshi (Tokyo JPX) Takahashi Koichi (Kawasaki JPX) Sonobe Hironori (Tokyo JPX), Vertical heat-treatment apparatus for semiconductor parts.

이 특허를 인용한 특허 (14)

  1. Martin, Yves C.; Van Kessel, Theodore G., Air/fluid cooling system.
  2. Watanabe, Akito; Sano, Mituru; Muku, Toshinobu, Combustion apparatus, method for combustion control, board, combustion control system and water heater.
  3. Yamazaki, Shunpei; Ohtani, Hisashi; Arai, Yasuyuki, Heat treatment apparatus and heat treatment method.
  4. Yamazaki, Shunpei; Ohtani, Hisashi; Arai, Yasuyuki, Heat treatment apparatus and heat treatment method.
  5. Starner, Alan L., Inertial temperature control system and method.
  6. Dickinson, Colin John, Reagent delivery system freeze prevention heat exchanger.
  7. Porter, Cole; Starner, Alan L., System and method to control radial delta temperature.
  8. Erickson, Mark R.; Dingus, Aaron L.; Custer, III, Arthur W.; Poole, Henry J.; Jamshidi, Nader, Thermal diffusion chamber control device and method.
  9. Kusakabe, Yoshinori; Yamaga, Kenichi, Thermal processing apparatus and cooling method.
  10. Yamazaki, Shunpei, Thermal treatment equipment and method for heat-treating.
  11. Yamazaki, Shunpei, Thermal treatment equipment and method for heat-treating.
  12. Kato, Shigekazu; Nishihata, Kouji; Tsubone, Tsunehiko; Itou, Atsushi, Vacuum processing apparatus and operating method therefor.
  13. Kobayashi, Makoto, Vertical heat treatment apparatus and method for cooling the apparatus.
  14. Binnard, Michael; Hazelton, Andrew J., Wafer stage chamber.
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