$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Substrate processing apparatus having regulated power consumption and method therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H05B-001/02
출원번호 US-0039141 (1998-03-13)
우선권정보 JP-0273060 (1997-10-06)
발명자 / 주소
  • Morita Akihiko,JPX
  • Ohtani Masami,JPX
  • Imanishi Yasuo,JPX
  • Tsuji Masao,JPX
  • Iwami Masaki,JPX
  • Nishimura Joichi,JPX
  • Nishimura Kazuhiro,JPX
  • Hamada Tetsuya,JPX
  • Yamamoto Satoshi,JPX
  • Kamei Ke
출원인 / 주소
  • Dainippon Screen Mfg. Co., Ltd., JPX
대리인 / 주소
    Ostrolenk, Faber, Gerb & Soffen, LLP
인용정보 피인용 횟수 : 36  인용 특허 : 6

초록

A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power s

대표청구항

[ We claim:] [1.] An apparatus for processing a substrate, comprising:a) a plurality of processing portions each for applying predetermined processing to a substrate;b) turn-on means which is connected to an external power source which is disposed outside said apparatus; andc) power supply controlli

이 특허에 인용된 특허 (6)

  1. Kotani Akio (Aichi JPX) Yoshida Keiji (Toyokawa JPX), Apparatus for detecting turn-on state of plural heat lamps of a thermal fixing unit of a copying machine.
  2. Mogi Fumio (Kanagawa JPX), Drying apparatus for use in photosensitive material processing system.
  3. Watanabe Tsutomu (Tokyo JPX) Yanagawa Nobuyuki (Chigasaki JPX) Hosaka Masao (Sagamihara JPX), Method of controlling fixing temperature of powder image in electrophotographic copying machine.
  4. Perl Reijo (HangonkylFIX) Kivimaa Antii (Kauniainen FIX), Method of controlling the supply of electric power to an electric sauna heater.
  5. Payne Thomas R. (Louisville KY) Baker Alfred L. (Longmount CO), Power control for appliance using multiple high inrush current elements.
  6. Yoshino Tatsuo (Kanagawa JPX), Temperature control method for distributing power to a plurality of heating elements.

이 특허를 인용한 특허 (36)

  1. Gaff, Keith William; Singh, Harmeet; Comendant, Keith; Vahedi, Vahid, Adjusting substrate temperature to improve CD uniformity.
  2. Gaff, Keith William; Singh, Harmeet; Comendant, Keith; Vahedi, Vahid, Adjusting substrate temperature to improve CD uniformity.
  3. Waldmann, Ole; Pape, Eric A.; Gaff, Keith William; Singh, Harmeet, Auto-correction of malfunctioning thermal control element in a temperature control plate of a semiconductor substrate support assembly that includes deactivating the malfunctioning thermal control element and modifying a power level of at least one functioning thermal control element.
  4. Englhardt, Eric A.; Rice, Michael R.; Hudgens, Jeffrey C.; Hongkham, Steve; Pinson, Jay D.; Salek, Mohsen; Carlson, Charles; Weaver, William T; Armer, Helen R., Cartesian cluster tool configuration for lithography type processes.
  5. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Cartesian robot cluster tool architecture.
  6. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.
  7. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.
  8. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.
  9. Ishikawa,Tetsuya; Roberts,Rick J.; Armer,Helen R.; Volfovski,Leon; Pinson,Jay D.; Rice,Michael; Quach,David H.; Salek,Mohsen S.; Lowrance,Robert; Backer,John A.; Weaver,William Tyler; Carlson,Charles; Wang,Chongyang; Hudgens,Jeffrey; Herchen,Harald; Lue,Brian, Cluster tool architecture for processing a substrate.
  10. Volfovski, Leon; Ishikawa, Tetsuya, Cluster tool substrate throughput optimization.
  11. Kawai, Wakahiro, Control device including power supply controller, control method of controlling power supply of machine, and recording medium in which program for controlling power supply of machine is stored.
  12. Kawai, Wakahiro, Control device, control method, program, and recording medium for line processing machines.
  13. Pease, John; Benjamin, Neil, Current peak spreading schemes for multiplexed heated array.
  14. Wang, Wenling; Sakamoto, Koichi; Park, Youngchul; Suzuki, Fujio, Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatus.
  15. Yamazaki, Shunpei, Heat treatment apparatus and method of manufacturing a semiconductor device.
  16. Gaff, Keith William; Comendant, Keith, Heating plate with diode planar heater zones for semiconductor processing.
  17. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Heating plate with heating zones for substrate processing and method of use thereof.
  18. Singh, Harmeet, Heating plate with planar heater zones for semiconductor processing.
  19. Singh, Harmeet, Heating plate with planar heater zones for semiconductor processing.
  20. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Heating plate with planar heater zones for semiconductor processing.
  21. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Heating plate with planar heater zones for semiconductor processing.
  22. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Heating plate with planar heating zones for semiconductor processing.
  23. Singh, Harmeet, Methods of fault detection for multiplexed heater array.
  24. Pease, John; Benjamin, Neil, Multiplexed heater array using AC drive for semiconductor processing.
  25. Pease, John; Benjamin, Nell, Multiplexed heater array using AC drive for semiconductor processing.
  26. Gaff, Keith William; Anderson, Tom; Comendant, Keith; Lu, Ralph Jan-Pin; Robertson, Paul; Pape, Eric A.; Benjamin, Neil, Power switching system for ESC with array of thermal control elements.
  27. Yamahira Yutaka,JPX, Substitute processing apparatus with power distribution control for reduced power consumption during apparatus start up.
  28. Nakamura, Yasunori; Nakagawa, Nobuhiko; Kawashima, Naohiko, Substrate processing apparatus, substrate processing system, control method for substrate processing apparatus and storage medium.
  29. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a Cartesian robot cluster tool.
  30. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.
  31. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.
  32. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Substrate supports with multi-layer structure including independent operated heater zones.
  33. Pease, John, System and method for monitoring temperatures of and controlling multiplexed heater array.
  34. Pease, John, System and method for monitoring temperatures of and controlling multiplexed heater array.
  35. Gaff, Keith William; Comendant, Keith; Ricci, Anthony, Thermal plate with planar thermal zones for semiconductor processing.
  36. Gaff, Keith William; Comendant, Keith; Ricci, Anthony, Thermal plate with planar thermal zones for semiconductor processing.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로