초록 ▼

A system for purification and generation of hydrofluoric acid on-site at a semiconductor device fabrication facility. An evaporation stage (optionally with arsenic oxidation) is followed by a fractionating column to remove most other impurities, an Ionic Purifier column to suppress contaminants not

A system for purification and generation of hydrofluoric acid on-site at a semiconductor device fabrication facility. An evaporation stage (optionally with arsenic oxidation) is followed by a fractionating column to remove most other impurities, an Ionic Purifier column to suppress contaminants not removed by the fractionating column, and finally the HF Supplier (HFS).

대표청구항 ▼

[ What is claimed is:] [1.] A method for purifying hydrogen fluoride, for use in the manufacture of an electronic component, comprising the steps of:(a) providing a flow of hydrogen fluoride vapor comprising a low concentration of arsenic; and(b) introducing said flow of hydrogen fluoride vapor comp

[ What is claimed is:] [1.] A method for purifying hydrogen fluoride, for use in the manufacture of an electronic component, comprising the steps of:(a) providing a flow of hydrogen fluoride vapor comprising a low concentration of arsenic; and(b) introducing said flow of hydrogen fluoride vapor comprising a low concentration of arsenic into an ionic purifier which provides a recirculating volume of high-purity water containing a high concentration of hydrogen fluoride, wherein said recirculating volume of high-purity water is in contact with said flow of hydrogen fluoride vapor, and wherein a flow of purified hydrogen fluoride vapor flows from said ionic purifier.