초록 ▼

A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holde

A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.

대표청구항 ▼

[ What is claimed is:] [14.] A substrate processing apparatus, comprising:a substrate transfer chamber;a plurality of substrate processing chambers disposed on a side wall of said substrate transfer chamber, said plurality of substrate processing chambers being stacked in the vertical direction, bei

[ What is claimed is:] [14.] A substrate processing apparatus, comprising:a substrate transfer chamber;a plurality of substrate processing chambers disposed on a side wall of said substrate transfer chamber, said plurality of substrate processing chambers being stacked in the vertical direction, being separated from one another to form spaces respectively between adjacent ones of said substrate processing chambers and being disposed outside said substrate transfer chamber.