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Alloy target, its fabrication, and regeneration processes

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C22C-033/02
출원번호 US-0033173 (1998-03-02)
우선권정보 JP-0070612 (1997-03-07)
발명자 / 주소
  • Kawaguchi Yukio,JPX
출원인 / 주소
  • TDKCorporation, JPX
대리인 / 주소
    Laubscher & LaubscherLasker, Esq.
인용정보 피인용 횟수 : 53  인용 특허 : 11

초록

An alloy target comprises at least one rare earth metal element Tb, Dy, Gd, Sm, Nd, Ho, Tm, and Er with a substantial balance of a transition metal element such as Fe, Co and Ni, and has a substantially homogeneous sintered structure and a permeability of 3 or lower. The alloy target is fabricated b

대표청구항

[ What I claim is:] [1.] An alloy target used to form a magneto-optical recording layer by a magnetron sputtering technique, which comprises 20 to 30 at % of at least one rare earth metal element selected from the group consisting of terbium, dysprosium, gadolinium, samarium, neodymium, holmium, thu

이 특허에 인용된 특허 (11)

  1. Nate Tasuo (Ichikawa JPX) Morimoto Toshio (Ichikawa JPX) Oka Kouichi (Ichikawa JPX) Endo Shinobu (Komae JPX), Alloy target for magneto-optical recording.
  2. Morimoto Toshio (Ichikawa JPX) Kazama Keizo (Ichikawa JPX) Okajima Yasuhiro (Ichikawa JPX) Tsugita Yasuhiro (Ichikawa JPX) Endo Shinobu (Ichikawa JPX), Alloy target for manufacturing a magneto-optical recording medium.
  3. Morimoto Toshio (Ichikawa JPX) Nate Tatsuo (Ichikawa JPX), Alloy target for manufacturing a magneto-optical recording medium.
  4. Nate Tasuo (Ichikawa JPX) Morimoto Toshio (Ichikawa JPX) Endo Shinobu (Komae JPX), Alloy target used for manufacturing magneto-optical recording medium.
  5. Hijikata Kenichi (Omiya JPX) Komiyama Shozo (Omiya JPX) Maruyama Hitoshi (Omiya JPX), Low-permeability high-strength target material for the formation of thin magnetooptical recording films.
  6. Marx Daniel R. (West Caldwell NJ), Magneto-optical alloy sputter targets.
  7. Masuda Kaoru,JPX, Magneto-optical recording medium target and manufacture method of same.
  8. Kinoshita Makoto (Sanda JPX) Tamura Jun (Sanda JPX) Morikawa Masaki (Sanda JPX) Kishida Kunio (Tokyo JPX) Ishii Toshinori (Sanda JPX) Mishima Akifumi (Sanda JPX), Platinum-cobalt alloy sputtering target and method for manufacturing same.
  9. Matsumoto Shunichiro (Yasugi JPX) Inui Tsutomu (Yonago JPX) Ichiyasu Rokuo (Yonago JPX) Chiba Yoshitaka (Gyoda JPX), Rare earth metal-iron group metal target, alloy powder therefor and method of producing same.
  10. Masuda Kaoru (Yasugi CA JPX) Matsumoto Shunichiro (Fremont CA), Target for magneto-optical recording media and method for producing same.
  11. Masuda Kaoru (Yasugi JPX) Meguro Takashi (Yonago JPX), Target for magneto-optical recording medium and process for production thereof.

이 특허를 인용한 특허 (53)

  1. Demaray,Richard E.; Wang,Kai An; Mullapudi,Ravi B.; Zhu,Qing; Zhang,Hongmei; Ackler,Harold D.; Egermeier,John C.; Pethe,Rajiv, As-deposited planar optical waveguides with low scattering loss and methods for their manufacture.
  2. Zhang, Hongmei; Narasimhan, Mukundan; Mullapudi, Ravi B.; Demaray, Richard E., Biased pulse DC reactive sputtering of oxide films.
  3. Zhang, Hongmei; Narasimhan, Mukundan; Mullapudi, Ravi B.; Demaray, Richard E., Biased pulse DC reactive sputtering of oxide films.
  4. Zhang,Hongmei; Narasimhan,Mukundan; Mullapudi,Ravi B.; Demaray,Richard E., Biased pulse DC reactive sputtering of oxide films.
  5. Zhang,Hongmei; Narasimhan,Mukundan; Mullapudi,Ravi B.; Demaray,Richard E., Biased pulse DC reactive sputtering of oxide films.
  6. Zhang,Hongmei; Narasimhan,Mukundan; Mullapudi,Ravi B.; Demaray,Richard E., Biased pulse DC reactive sputtering of oxide films.
  7. Zhang, Hongmei; Demaray, Richard E., Deposition of LiCoO2.
  8. Zhang, Hongmei; Demaray, Richard E., Deposition of perovskite and other compound ceramic films for dielectric applications.
  9. Narasimhan,Mukundan; Brooks,Peter; Demaray,Richard E., Dielectric barrier layer films.
  10. Narasimhan,Mukundan; Brooks,Peter; Demaray,Richard E., Dielectric barrier layer films.
  11. Miller, Steven A.; Gaydos, Mark; Shekhter, Leonid N.; Gulsoy, Gokce, Dynamic dehydriding of refractory metal powders.
  12. Snyder, Shawn W.; Neudecker, Bernd J., Electrochemical apparatus with barrier layer protected substrate.
  13. Snyder, Shawn W.; Neudecker, Bernd J., Electrochemical apparatus with barrier layer protected substrate.
  14. Snyder, Shawn W.; Neudecker, Bernd J., Electrochemical apparatus with barrier layer protected substrate.
  15. Snyder, Shawn W.; Neudecker, Bernd J., Electrochemical apparatus with barrier layer protected substrate.
  16. Demaray,Richard E.; Zhang,Hong Mei; Narasimhan,Mukundan; Milonopoulou,Vassiliki, Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides.
  17. Brantner, Paul C., Energy device with integral collector surface for electromagnetic energy harvesting and method thereof.
  18. Brantner, Paul C., Energy device with integral conductive surface for data communication via electromagnetic energy and method thereof.
  19. Keating, Joseph A.; Bradow, Timothy N.; Johnson, Raymond R.; Narayan, Prativadi B., Environmentally-powered wireless sensor module.
  20. Sato, Atsushi; Ogino, Shin-ichi, Fe-Pt-based sputtering target with dispersed C grains.
  21. Miller, Steven A.; Kumar, Prabhat; Wu, Richard; Sun, Shuwei; Zimmermann, Stefan; Schmidt-Park, Olaf, Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom.
  22. Neudecker, Bernd J.; Snyder, Shawn W., Hybrid thin-film battery.
  23. Neudecker, Bernd J.; Snyder, Shawn W., Hybrid thin-film battery.
  24. Dary, Francois-Charles; Gaydos, Mark; Loewenthal, William; Miller, Steven A.; Rozak, Gary; Volchko, Scott Jeffrey; Zimmermann, Stefan; Stawovy, Michael Thomas, Large-area sputtering targets.
  25. Demaray,Richard E.; Milonopoulou,Vassiliki, Low temperature zirconia based thermal barrier layer by PVD.
  26. Snyder, Shawn W.; Brantner, Paul C.; Zoetewey, Henry L., Masking of and material constraint for depositing battery layers on flexible substrates.
  27. Snyder, Shawn W.; Neudecker, Bernd J.; Brantner, Paul C., Metal film encapsulation.
  28. Snyder, Shawn W.; Neudecker, Bernd J.; Brantner, Paul C., Metal film encapsulation.
  29. Neudecker, Bernd J.; Whitacre, Jay F., Method for sputter targets for electrolyte films.
  30. Wen, Jyh-Chung; Lai, Ming-Shyong; Li, Bean-Jon, Method of regenerating a phase-change sputtering target for optical storage media.
  31. Yi, Wuwen; Heckman, William; Kunkel, Bernd; Derrington, Carl; Griffin, Patrick, Methodology for recycling Ru and Ru-alloy deposition targets and targets made of recycled Ru and Ru-based alloy powders.
  32. Miller, Steven A.; Shekhter, Leonid N.; Zimmermann, Stefan, Methods of joining metallic protective layers.
  33. Loewenthal, William; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets.
  34. Volchko, Scott Jeffrey; Loewenthal, William; Zimmermann, Stefan; Gaydos, Mark; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets using interlocking joints.
  35. Volchko, Scott Jeffrey; Loewenthal, William; Zimmermann, Stefan; Gaydos, Mark; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets using interlocking joints.
  36. Pan, Tao; Demaray, Richard E.; Chen, Yu; Xie, Yong Jin; Pethe, Rajiv, Mode size converter for a planar waveguide.
  37. Dawes, David, Optically coupling into highly uniform waveguides.
  38. Brantner, Paul C.; Keating, Joseph A.; Johnson, Raymond R.; Bradow, Timothy N.; Narayan, Prativadi B.; Neudecker, Bernd J., Passive over/under voltage control and protection for energy storage devices associated with energy harvesting.
  39. Demaray, Richard E.; Wang, Kai-An; Mullapudi, Ravi B.; Stadtler, Douglas P.; Zhang, Hongmei; Pethe, Rajiv, Planar optical devices and methods for their manufacture.
  40. Neudecker, Bernd J.; Keating, Joseph A., Printed circuit board with integrated thin film battery.
  41. Neudecker, Bernd J.; Keating, Joseph A., Printed circuit board with integrated thin film battery.
  42. Scheible, Kathleen; Flanigan, Michael Allen; Yoshidome, Goichi; Allen, Adolph Miller; Pavloff, Cristopher M., Process kit and target for substrate processing chamber.
  43. Doan,Trung T.; Ngan,Kenny King Tai, Refurbishment of sputtering targets.
  44. Snyder, Shawn W.; Brantner, Paul C.; Keating, Joseph A.; Bradow, Timothy N.; Narayan, Prativadi B.; Neudecker, Bernd J., Robust metal film encapsulation.
  45. Takahiro Nagata JP; Manabu Sasaki JP; Hitoshi Kimura JP; Norio Yokoyama JP, Sputtering target and its manufacturing method.
  46. Allen, Adolph Miller; Yoon, Ki Hwan; Guo, Ted; Yang, Hong S.; Yu, Sang-Ho, Sputtering target having increased life and sputtering uniformity.
  47. Neudecker, Bernd J.; Milonopoulou, Vassiliki, Sputtering target of Li3PO4 and method for producing same.
  48. Ritchie, Alan Alexander; Young, Donny; Hong, Ilyoung (Richard); Scheible, Kathleen A.; Kelkar, Umesh, Target for sputtering chamber.
  49. Johnson, Raymond R.; Snyder, Shawn W.; Brantner, Paul C.; Bradow, Timothy J.; Neudecker, Bernd J., Thin film battery on an integrated circuit or circuit board and method thereof.
  50. Neudecker, Bernd J., Thin film electrolyte for thin film batteries.
  51. Neudecker, Bernd J.; Snyder, Shawn W., Thin film encapsulation for thin film batteries and other devices.
  52. Neudecker, Bernd J.; Snyder, Shawn W., Thin film encapsulation for thin film batteries and other devices.
  53. Demaray, Richard E.; Narasimhan, Mukundan, Transparent conductive oxides.
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