초록 ▼

A method for fabricating a monolithic micro-optical component. The construction of the micro-optical components is accomplished by using standard semiconductor fabrication techniques. The method comprises the steps of depositing an etch stop layer (44) onto a semiconductor substrate (42); depositing

A method for fabricating a monolithic micro-optical component. The construction of the micro-optical components is accomplished by using standard semiconductor fabrication techniques. The method comprises the steps of depositing an etch stop layer (44) onto a semiconductor substrate (42); depositing an optical component layer (46) onto the etch stop layer (44); coating the entire surface of the optical component layer with a photoresist material; applying a photoresist mask (50) to the photoresist material on the optical component layer (46); selectively etching away the optical component layer (46) to form at least one optical column (52); forming a pedestal (54) for each of the optical columns (52) by selectively etching away the etch stop layer (44); and finally polishing each of the optical columns (52), thereby forming monolithic optical components (56). The method may optionally include the step of removing the photoresist mask from each of the optical columns prior to polishing the optical columns, as well as the step of depositing an antireflectivity coating onto each of the optical components.

대표청구항 ▼

[ What is claimed is:] [1.] A method for fabricating a micro-optical component, comprising the steps of:depositing an etch stop layer onto a semiconductor substrate;depositing an optical component layer onto said etch stop layer;coating said optical component layer with a photoresist material;applyi

[ What is claimed is:] [1.] A method for fabricating a micro-optical component, comprising the steps of:depositing an etch stop layer onto a semiconductor substrate;depositing an optical component layer onto said etch stop layer;coating said optical component layer with a photoresist material;applying a mask to said photoresist material on said optical component layer;selectively etching away said optical component layer to form at least one optical column;forming a pedestal for each of said optical columns by selectively etching away said etch stop layer; andpolishing each of said optical columns, thereby forming monolithic optical components.