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System for rejuvenating pressurized fluid solvents used in cleaning substrates 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • D06F-043/08
  • B08B-013/00
출원번호 US-0364402 (1999-07-30)
발명자 / 주소
  • Stucker John F.
출원인 / 주소
  • R.R. Street & Co. Inc.
대리인 / 주소
    Mayer, Brown & Platt
인용정보 피인용 횟수 : 45  인용 특허 : 24

초록

Method and system of rejuvenating pressurized fluid solvents used for cleaning a substrate in a pressurized vessel. A primary flow of the pressurized fluid solvent is continuously cycled from the pressurized vessel through a series of filters to remove insoluble and soluble contaminants, and then re

대표청구항

[ What is claimed is:] [1.] A system for cleaning a substrate using a pressurized fluid solvent, the system comprising:a pressurized vessel capable of withstanding pressures of at least about 800 pounds per square inch and having a chamber for containing the substrate to be cleaned and a volume of t

이 특허에 인용된 특허 (24)

  1. Prisco ; Jr. Anthony J. (Beverly NJ) Sewter Bruce R. (Pernherton Township ; Burlington County NJ) Briggs William E. (Beverly NJ) Archer Gary L. (Mount Holly NJ), Apparatus for recovering solvent.
  2. Chao Sidney C. (Manhattan Beach CA) Purer Edna M. (Los Angeles CA) Stanford Thomas B. (San Pedro CA) Townsend Carl W. (Los Angeles CA), Cleaning by cavitation in liquefied gas.
  3. Heffernan Mary B. (Encinitas CA), Cleaning of polyurethane foam reservoir.
  4. Jackson David P. (608 Ruberta Glendale CA 91201), Cleaning process using microwave energy and centrifugation in combination with dense fluids.
  5. Jackson David P. (Saugus CA) Buck Orval F. (Santa Monica CA), Cleaning process using phase shifting of dense phase gases.
  6. Jackson David P. (Saugus CA) Buck Orval F. (Santa Monica CA), Coating process using dense phase gas.
  7. Fine Max (Tamarac FL), Combination filter apparatus for use with a dry cleaning machine.
  8. Palen Edward J. (Los Angeles CA), Continuous operation supercritical fluid treatment process and system.
  9. Jackson David P. (608 Ruberta Glendale CA 91201), Dense fluid microwave centrifuge.
  10. Jackson David P. (Saugus CA), Dense fluid photochemical process for liquid substrate treatment.
  11. Jackson David P. (Saugus CA), Dense phase gas photochemical process for substrate treatment.
  12. Firth John R. (5256 SW. Humphrey Blvd. Portland OR 97221) Perez Anthony R. (1133 New Ave. Alhambra CA 91801) Meyer Ronald A. (947 Bayfield Ave. San Dimas CA 91773), Disposable self-shielding hypodermic syringe.
  13. Winston Anthony E. (East Brunswick NJ), Evaporative treatment of inorganic saponifier wash water.
  14. Maffei Raymond L. (639 Front St. San Francisco CA 94111), Extraction and cleaning processes.
  15. Dewees Thomas G. (Pleasanton CA) Knafelc Frank M. (Lafayette CA) Mitchell James D. (Alamo CA) Taylor R. Gregory (Pleasanton CA) Iliff Robert J. (Oakley CA) Carty Daniel T. (Danville CA) Latham James , Liquid/supercritical carbon dioxide dry cleaning system.
  16. Iliff Robert J. (Oakley CA) Mitchell James D. (Alamo CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA) Kong Stephen B. (Alameda CA), Liquid/supercritical carbon dioxide/dry cleaning system.
  17. Stanford,Jr. Thomas B. (San Pedro CA) Chao Sidney C. (Manhattan Beach CA), Low cost equipment for cleaning using liquefiable gases.
  18. Mitchell James D. (Alamo CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA), Method and composition using densified carbon dioxide and cleaning adjunct to clean fabrics.
  19. Al-Ghatta Hussain A. (Fiuggi ITX), Method for recycling polyethylene terephthalate (PET) beverage bottles by treating with carbon dioxide.
  20. Starov Vladimir (Redwood City CA), Method for removing photoresist and other adherent materials from substrates.
  21. Jackson David P. (Saugus CA), Method of removing organic flux using peroxide composition.
  22. Hoy Kenneth L. (St. Albans WV) Nielsen Kenneth A. (Charleston WV), Methods for cleaning apparatus using compressed fluids.
  23. Jackson David P. (22328 W. Barcotta Dr. Santa Clarita CA 91350) Lepp Michael A. (22334 W. Barcotta Dr. Santa Clarita CA 91350), Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids.
  24. Capella Joseph A. (Crystal River FL) Fowler David E. (Gainesville FL), Tool decontamination apparatus.

이 특허를 인용한 특허 (45)

  1. De Vroome, Clemens Johannes Maria, Apparatus and method for remoistening a product web.
  2. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  3. Brainard, David E.; McClain, James B.; Cole, Michael E.; Worm, Steve L., Apparatus and methods for conserving vapor in a carbon dioxide dry cleaning system.
  4. Brainard, David E.; McClain, James B.; Cole, Michael E.; Worm, Steve L., Apparatus for conserving vapor in a carbon dioxide dry cleaning system.
  5. Brainard, David E.; McClain, James B.; Cole, Michael E.; Worm, Steve L., Apparatus for conserving vapor in a carbon dioxide dry cleaning system.
  6. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  7. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  8. Leitch, Kelly; Hartigan, Gavin; D'Orazio, Robert, CO2 recovery process for supercritical extraction.
  9. Worm,Steve Lee; McClain,James B., Cleaning apparatus having multiple wash tanks for carbon dioxide dry cleaning and methods of using same.
  10. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  11. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  12. Leitch, Kelly; Silveira, Danny, High pressure CO2 purification and supply system.
  13. Leitch,Kelly; Silveira,Danny, High pressure COpurification and supply system.
  14. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
  15. Jones, William D., High pressure fourier transform infrared cell.
  16. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  17. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  18. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  19. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  20. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  21. DeSimone, Joseph M.; DeYoung, James P.; McClain, James B., Method and apparatus for cleaning substrates using liquid carbon dioxide.
  22. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  23. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  24. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  25. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  26. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  27. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  28. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  29. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  30. Worm, Steve Lee; McClain, James B., Methods of coating articles using a densified coating system.
  31. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  32. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  33. Wuester,Christopher D., Process flow thermocouple.
  34. McClain, James B.; Cole, Michael E., Pumpless carbon dioxide dry cleaning system.
  35. Harley J. Pattee, Recycling system for laundry wash water.
  36. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  37. Doley, Allan; Goodwin, Dennis; O'Neill, Kenneth; Vrijburg, Gerben; Rodriguez, David; Aggarwal, Ravinder, Substrate handling chamber.
  38. Arai,Kunio; Inomata,Hiroshi; Smith, Jr.,Richard Lee, System and device for processing supercritical and subcritical fluid.
  39. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  40. Doley Allan ; Goodwin Dennis ; O'Neill Kenneth ; Vrijburg Gerben ; Rodriguez David, System and method for reducing particles in epitaxial reactors.
  41. Siewers, Ernst-Jan, System and method for washing articles employing a densified cleaning solution, and use of a fluid displacement device therein.
  42. McClain James B. ; Brainard David E. ; Cole Michael E. ; Worm Steve L., System for the control of a carbon dioxide cleaning apparatus.
  43. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  44. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  45. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
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