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Pressure vessel door operating apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65D-051/04
  • F16J-013/16
출원번호 US-0131570 (1998-08-10)
발명자 / 주소
  • Malchow Gregory L.
  • Harris Stephen L.
  • Kegler Andrew
출원인 / 주소
  • Alliance Laundry Systems LLC
대리인 / 주소
    Leydig, Voit & Mayer, Ltd.
인용정보 피인용 횟수 : 44  인용 특허 : 4

초록

A pressure vessel which includes a door operating apparatus which enables a door to the pressure vessel to be moved between open and closed positions quickly and easily is provided. The door operating apparatus includes a translation rod supported on the pressure vessel for sliding movement relative

대표청구항

[ What is claimed is:] [1.] A pressure vessel comprising:a wall structure which defines an interior space of said pressure vessel, said wall structure having an access opening,a removable door for closing said access opening, said door being mounted for movement in a first direction perpendicular to

이 특허에 인용된 특허 (4)

  1. Purer Edna M. (Los Angeles CA) Wilkerson Angela Y. (Los Angeles CA) Townsend Carl W. (Los Angeles CA) Chao Sidney C. (Manhattan Beach CA), Dry-cleaning of garments using gas-jet agitation.
  2. Chao Sidney C. (Manhattan Beach CA) Stanford Thomas B. (San Pedro CA) Purer Edna M. (Los Angeles CA) Wilkerson Angela Y. (Inglewood CA), Dry-cleaning of garments using liquid carbon dioxide under agitation as cleaning medium.
  3. Maccise Adiv Y. (Cerrada de Recursos Hidraulicos #20 Tlalnepantla MXX), Portable modular food container.
  4. Betlejewski Frank W. (Elgin IL) Klein Robert A. (Mount Prospect IL), Rotatable carrying handle arrangement.

이 특허를 인용한 특허 (44)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  4. McGuire,Douglas J., Closure for a pressure vessel and method.
  5. Barenghi, Alfredo; Colaut, Dario; Lattanzio, Ettore, Container for dangerous environments.
  6. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  7. Blue, Mark, Filter housing with liftable lid.
  8. Blue, Mark, Filter housing with liftable lid.
  9. Blue, Mark, Filter housing with liftable lid.
  10. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  11. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
  12. Jones, William D., High pressure fourier transform infrared cell.
  13. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  14. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  15. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  16. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  17. Tseronis, James A.; Mortiz, Heiko D.; Chandra, Mohan; Farmer, Robert B.; Jafri, Ijaz H.; Talbott, Jonathan, Inverted pressure vessel with horizontal through loading.
  18. Robert B Farmer ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Heiko D. Moritz, Inverted pressure vessel with shielded closure mechanism.
  19. Yang, Yunlan; Zou, Feng; Li, Meng; Li, Wenyong, Lift and rotation mechanism for quick door-opening device.
  20. Mabry, Michael D.; McAllister, Donald R., Manhole device.
  21. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  22. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  23. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  24. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  25. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  26. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  27. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  28. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  29. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  30. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  31. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  32. McLaughlin, Richard; LaFrenz, Cliff; Gramling, Chris, Pressure vessel safety lock apparatus.
  33. McLaughlin, Richard; LaFrenz, Cliff; Gramling, Chris, Pressure vessel safety lock apparatus.
  34. Schmidt, William L., Pressurized closure assembly.
  35. Wuester,Christopher D., Process flow thermocouple.
  36. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  37. Mabry, Michael D.; McAllister, Donald R., Sealable lid for vacuum distillation apparatus.
  38. Costantini, Michael A.; Chandra, Mohan; Moritz, Heiko D.; Jafri, Ijaz H.; Mount, David J.; Heathwaite, Rick M., Supercritical fluid delivery and recovery system for semiconductor wafer processing.
  39. Heiko D Moritz ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Ijaz Jafri, Supercritical fluid drying system and method of use.
  40. Smith, Brian, Support device and method for a rotary closure assembly.
  41. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  42. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  43. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  44. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
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