초록 ▼

A vapor control apparatus including an endless rim, a stagnation plate and a cover having an exhaust port. The endless rim has a first edge engaging the cover, a second edge opposite the first edge, an interior region and an exterior region defined by the rim and the cover, and a flow passage from t

A vapor control apparatus including an endless rim, a stagnation plate and a cover having an exhaust port. The endless rim has a first edge engaging the cover, a second edge opposite the first edge, an interior region and an exterior region defined by the rim and the cover, and a flow passage from the interior region to the exterior region adjacent the cover. The exhaust port is in fluid communication with the interior region and the second edge is seatable on a wafer support. A stagnation plate is disposed in the interior region, defining a stagnant region intermediate the stagnation plate and the surface, and defining at least one flow path in fluid communication with the stagnant region and the interior region.

대표청구항 ▼

[ What is claimed is:] [1.] A vapor control apparatus comprising:a cover having an exhaust port;an endless rim having a first edge attached to said cover defining an interior and an exterior region, a second edge, and a plurality of flow holes from said interior region to said exterior region proxim

[ What is claimed is:] [1.] A vapor control apparatus comprising:a cover having an exhaust port;an endless rim having a first edge attached to said cover defining an interior and an exterior region, a second edge, and a plurality of flow holes from said interior region to said exterior region proximate to said cover, said exhaust port being in fluid communication with said interior region and said second edge being seated on a wafer support surface; anda stagnation plate having at least one flow path through said stagnation plate and being attached to said rim in said interior region between said flow holes and said second edge.